DE69231288T2 - Verfahren zur Herstellung einer Verbindungshalbleiter-Dünnschicht - Google Patents

Verfahren zur Herstellung einer Verbindungshalbleiter-Dünnschicht

Info

Publication number
DE69231288T2
DE69231288T2 DE1992631288 DE69231288T DE69231288T2 DE 69231288 T2 DE69231288 T2 DE 69231288T2 DE 1992631288 DE1992631288 DE 1992631288 DE 69231288 T DE69231288 T DE 69231288T DE 69231288 T2 DE69231288 T2 DE 69231288T2
Authority
DE
Germany
Prior art keywords
producing
thin film
compound semiconductor
semiconductor thin
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE1992631288
Other languages
English (en)
Other versions
DE69231288D1 (de
Inventor
Shigemi Kohiki
Takayuki Negami
Mikihiko Nishitani
Takahiro Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4136571A external-priority patent/JPH05262504A/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69231288D1 publication Critical patent/DE69231288D1/de
Application granted granted Critical
Publication of DE69231288T2 publication Critical patent/DE69231288T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/032Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/032Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • H01L31/0322Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/032Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • H01L31/0322Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
    • H01L31/0323Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2 characterised by the doping material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
DE1992631288 1991-09-27 1992-09-25 Verfahren zur Herstellung einer Verbindungshalbleiter-Dünnschicht Expired - Lifetime DE69231288T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24902291 1991-09-27
JP4136571A JPH05262504A (ja) 1991-09-27 1992-05-28 化合物半導体、その薄膜製造方法及びそれを用いた半導体装置

Publications (2)

Publication Number Publication Date
DE69231288D1 DE69231288D1 (de) 2000-08-31
DE69231288T2 true DE69231288T2 (de) 2000-11-30

Family

ID=26470107

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1992631288 Expired - Lifetime DE69231288T2 (de) 1991-09-27 1992-09-25 Verfahren zur Herstellung einer Verbindungshalbleiter-Dünnschicht

Country Status (2)

Country Link
EP (1) EP0534459B1 (de)
DE (1) DE69231288T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05262504A (ja) * 1991-09-27 1993-10-12 Matsushita Electric Ind Co Ltd 化合物半導体、その薄膜製造方法及びそれを用いた半導体装置
JP3337255B2 (ja) * 1993-02-15 2002-10-21 松下電器産業株式会社 カルコパイライト構造半導体薄膜とその製造方法、薄膜太陽電池の製造方法、および発光装置の製造方法
US5918111A (en) * 1995-03-15 1999-06-29 Matsushita Electric Industrial Co., Ltd. Method and apparatus for manufacturing chalcopyrite semiconductor thin films
DE19902908B4 (de) * 1999-01-26 2005-12-01 Solarion Gmbh Verfahren zur Herstellung von Chalkogenidschichten durch chemische Umsetzung von Schichten aus Metallen oder Metallverbindungen im niederenergetischen Chalkogen-Ionenstrahl
DE19921514A1 (de) * 1999-05-10 2000-11-30 Ist Inst Fuer Solartechnologie Dünnschichtsolarzelle auf der Basis der Ia/IIIb/VIa- Verbindungshalbleiter mit Potentialbarriere innerhalb der photoaktiven polykristallinen Absorberschicht und Verfahren zu ihrer Herstellung
EP2058864A1 (de) * 2007-11-06 2009-05-13 Advanced Surface Technology B.V. Solarzelle auf Chaolcogenidbasis und Herstellungsverfahren für eine solche Zelle
EP2462150A2 (de) * 2009-08-04 2012-06-13 Precursor Energetics, Inc. Polymere vorläufer für silberhaltige caigs- und aigs-photovoltaikelemente
KR20120047282A (ko) 2009-08-04 2012-05-11 프리커서 에너제틱스, 인코퍼레이티드. 제어되는 화학량론을 가지는 광기전 흡수제를 위한 방법
JP2013501054A (ja) 2009-08-04 2013-01-10 プリカーサー エナジェティクス, インコーポレイテッド Caigasアルミニウム含有光起電性装置用のポリマー前駆体
JP2013501128A (ja) 2009-08-04 2013-01-10 プリカーサー エナジェティクス, インコーポレイテッド Cisおよびcigs光起電性装置のためのポリマー前駆体
WO2011084171A1 (en) 2009-12-17 2011-07-14 Precursor Energetics, Inc. Molecular precursors for optoelectronics
WO2012037389A2 (en) 2010-09-15 2012-03-22 Precursor Energetics, Inc. Inks with alkali metals for thin film solar cell processes

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4004342A (en) * 1976-02-23 1977-01-25 The United States Of America As Represented By The Secretary Of The Air Force Fabrication of ion implanted P-N junction devices

Also Published As

Publication number Publication date
DE69231288D1 (de) 2000-08-31
EP0534459A3 (en) 1993-05-05
EP0534459B1 (de) 2000-07-26
EP0534459A2 (de) 1993-03-31

Similar Documents

Publication Publication Date Title
DE69738608D1 (de) Verfahren zur Herstellung einer Halbleiter-Dünnschicht
DE69024246D1 (de) Verfahren zur Herstellung einer Dünnschichthalbleiterlegierung
DE69131570T2 (de) Verfahren zur Herstellung einer Dünnfilm-Halbleiteranordnung
DE69332511D1 (de) Verfahren zur Herstellung eines Halbleitersubstrats
DE69333282D1 (de) Verfahren zur Herstellung eines Halbleitersubstrats
DE69216914D1 (de) Verfahren zur Herstellung einer porösen Polytetrafluoroethylenfolie
DE69232432T2 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE69231803D1 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE69434695D1 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE69410137D1 (de) Verfahren zur Herstellung einer chalkopyrit-Halbleiterschicht
DE69127237T2 (de) Verfahren zur Herstellung einer Stoffverbindung
DE69231288D1 (de) Verfahren zur Herstellung einer Verbindungshalbleiter-Dünnschicht
DE69520538T2 (de) Verfahren zur Herstellung einer dünnen polykristallinen Halbleiterschicht
DE69032340T2 (de) Verfahren zur Herstellung einer Halbleiterdünnschicht
DE59205665D1 (de) Verfahren zur Herstellung einer Grabenstruktur in einem Substrat
DE59209856D1 (de) VERFAHREN ZUR HERSTELLUNG EINER Si/FeSi2-HETEROSTRUKTUR
DE69205911T2 (de) Verfahren zur Herstellung einer supraleitenden Dünnschicht aus Oxydverbindungen.
DE59309045D1 (de) Verfahren zur herstellung einer halbleiterstruktur
DE69328537D1 (de) Verfahren zur Herstellung einer supraleitenden Dünnschicht aus hoch-temperatur-supraleitenden-Oxid
DE69119705T2 (de) Verfahren zur Herstellung einer supraleitenden Oxyd-Dünnschicht
DE69023718T2 (de) Verfahren zur Herstellung einer Verbindungshalbleiterschicht.
DE68912686T2 (de) Verfahren zur Herstellung eines Einkristalls aus einer Halbleiter-Verbindung.
DE69210429T2 (de) Verfahren zur Herstellung einer magnetischen Überzugsschicht
DE69203294D1 (de) Verfahren zur Herstellung einer supraleitenden Dünnschicht aus einer oxidverbindung.
DE69108957D1 (de) Verfahren zur Herstellung einer Halbleitervorrichtung.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP

R071 Expiry of right

Ref document number: 534459

Country of ref document: EP