DE69009078T2 - System und Methode zur Ablagerung von dünnen Filmen im Vakuum. - Google Patents

System und Methode zur Ablagerung von dünnen Filmen im Vakuum.

Info

Publication number
DE69009078T2
DE69009078T2 DE69009078T DE69009078T DE69009078T2 DE 69009078 T2 DE69009078 T2 DE 69009078T2 DE 69009078 T DE69009078 T DE 69009078T DE 69009078 T DE69009078 T DE 69009078T DE 69009078 T2 DE69009078 T2 DE 69009078T2
Authority
DE
Germany
Prior art keywords
deposition
vacuum
thin films
films
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69009078T
Other languages
English (en)
Other versions
DE69009078D1 (de
Inventor
Michael D Temple
Richard I Seddon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optical Coating Laboratory Inc
Original Assignee
Optical Coating Laboratory Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Optical Coating Laboratory Inc filed Critical Optical Coating Laboratory Inc
Publication of DE69009078D1 publication Critical patent/DE69009078D1/de
Application granted granted Critical
Publication of DE69009078T2 publication Critical patent/DE69009078T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
DE69009078T 1989-02-17 1990-02-08 System und Methode zur Ablagerung von dünnen Filmen im Vakuum. Expired - Fee Related DE69009078T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/312,527 US4951604A (en) 1989-02-17 1989-02-17 System and method for vacuum deposition of thin films

Publications (2)

Publication Number Publication Date
DE69009078D1 DE69009078D1 (de) 1994-06-30
DE69009078T2 true DE69009078T2 (de) 1994-09-08

Family

ID=23211862

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69009078T Expired - Fee Related DE69009078T2 (de) 1989-02-17 1990-02-08 System und Methode zur Ablagerung von dünnen Filmen im Vakuum.

Country Status (4)

Country Link
US (1) US4951604A (de)
EP (1) EP0384617B1 (de)
JP (1) JPH02290965A (de)
DE (1) DE69009078T2 (de)

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DE4026367A1 (de) * 1990-06-25 1992-03-12 Leybold Ag Vorrichtung zum beschichten von substraten
DE4025659A1 (de) * 1990-08-14 1992-02-20 Leybold Ag Umlaufraedergetriebe mit einem raedersatz, insbesondere fuer vorrichtungen zum beschichten von substraten
US5182567A (en) * 1990-10-12 1993-01-26 Custom Metallizing Services, Inc. Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means
JPH0521670A (ja) * 1991-07-12 1993-01-29 Sumitomo Electric Ind Ltd ヒートシンク、ヒートシンクの製造方法および製造装置
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
JP2547296B2 (ja) * 1992-03-18 1996-10-23 公利 間藤 ディスクの表面被膜形成方法および装置
US5421889A (en) * 1993-06-29 1995-06-06 Tokyo Electron Limited Method and apparatus for inverting samples in a process
DE4336681C2 (de) * 1993-10-27 1996-10-02 Fraunhofer Ges Forschung Verfahren und Einrichtung zum plasmaaktivierten Elektronenstrahlverdampfen
DE69611804D1 (de) * 1995-04-17 2001-03-29 Read Rite Corp Bildung eines isolierenden dünnen Filmes durch eine Vielzahl von Ionenstrahlen
ES2166873T3 (es) * 1996-01-10 2002-05-01 Alcan Tech & Man Ag Procedimiento y dispositivo para revestir la superficie de un substrato.
US5776256A (en) * 1996-10-01 1998-07-07 The United States Of America As Represented By The Secretary Of The Air Force Coating chamber planetary gear mirror rotating system
JPH10204625A (ja) * 1997-01-14 1998-08-04 Sumitomo Heavy Ind Ltd ＭｇＯ膜成膜方法及び成膜装置
JPH11200017A (ja) * 1998-01-20 1999-07-27 Nikon Corp 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子
KR100280883B1 (ko) * 1998-04-27 2001-02-01 구자홍 플라즈마표시장치용유전체후막및형광체막의제조방법
US7997227B2 (en) * 2007-03-13 2011-08-16 General Electric Company Vacuum coater device and mechanism for supporting and manipulating workpieces in same
TWI400996B (zh) * 2008-02-14 2013-07-01 Applied Materials Inc 基板處理裝置
US9412569B2 (en) * 2012-09-14 2016-08-09 Vapor Technologies, Inc. Remote arc discharge plasma assisted processes
US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US20140134849A1 (en) * 2012-11-09 2014-05-15 Intermolecular Inc. Combinatorial Site Isolated Plasma Assisted Deposition
JP6054249B2 (ja) * 2013-05-27 2016-12-27 住友重機械工業株式会社 成膜装置
US20150152543A1 (en) * 2013-10-30 2015-06-04 Skyworks Solutions, Inc. Systems, devices and methods related to reactive evaporation of refractory materials
EP3366804B1 (de) * 2017-02-22 2022-05-11 Satisloh AG Vakuumbeschichtungsvorrichtung zur vakuumbeschichtung von substraten, insbesondere von brillenlinsen

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US3984581A (en) * 1973-02-28 1976-10-05 Carl Zeiss-Stiftung Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers
JPS50106879A (de) * 1974-01-30 1975-08-22
US4217855A (en) * 1974-10-23 1980-08-19 Futaba Denshi Kogyo K.K. Vaporized-metal cluster ion source and ionized-cluster beam deposition device
JPS5181790A (de) * 1975-01-14 1976-07-17 Yoichi Murayama
DE2624005C2 (de) * 1976-05-28 1982-04-08 Siemens AG, 1000 Berlin und 8000 München Verfahren und Vorrichtung zum Aufbringen von dünnen Schichten auf ein Substrat nach dem "Ion-plating"-Verfahren.
JPS5399762A (en) * 1977-02-12 1978-08-31 Futaba Denshi Kogyo Kk Device for producing compound semiconductor film
JPS53123659A (en) * 1977-04-05 1978-10-28 Futaba Denshi Kogyo Kk Method of producing compound semiconductor wafer
GB1601427A (en) * 1977-06-20 1981-10-28 Siemens Ag Deposition of a layer of electrically-conductive material on a graphite body
DD135216A1 (de) * 1977-10-21 1979-04-18 Dietmar Schulze Verfahren zum ionenplattieren
JPS54100988A (en) * 1978-01-27 1979-08-09 Agency Of Ind Science & Technol Ion plating device
JPS5511127A (en) * 1978-07-10 1980-01-25 Ricoh Co Ltd Forming method for oxidation film
DD140057A1 (de) * 1978-11-30 1980-02-06 Adelheid Seifert Verfahren und einrichtung zur reaktiven bedampfung
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
CH645137A5 (de) * 1981-03-13 1984-09-14 Balzers Hochvakuum Verfahren und vorrichtung zum verdampfen von material unter vakuum.
AU8288282A (en) * 1981-05-04 1982-11-11 Optical Coating Laboratory, Inc. Production and utilization of activated molecular beams
JPS58110030A (ja) * 1981-12-23 1983-06-30 Konishiroku Photo Ind Co Ltd 蒸着装置
US4526132A (en) * 1982-11-24 1985-07-02 Konishiroku Photo Industry Co., Ltd. Evaporator
JPS60141869A (ja) * 1983-12-29 1985-07-26 Nissin Electric Co Ltd 膜形成方法および膜形成装置
JPS60221566A (ja) * 1984-04-18 1985-11-06 Agency Of Ind Science & Technol 薄膜形成装置
JPS60262964A (ja) * 1984-06-06 1985-12-26 Mitsubishi Electric Corp 化合物薄膜蒸着装置
JPS6124214A (ja) * 1984-07-12 1986-02-01 Taiyo Yuden Co Ltd Ｃｏ−Ｏ系薄膜型垂直磁気記録媒体の製造方法
JPS6137960A (ja) * 1984-07-28 1986-02-22 Tadanobu Okubo 金属表面加工方法
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
CN1019513B (zh) * 1986-10-29 1992-12-16 三菱电机株式会社 化合物薄膜形成装置
US4777908A (en) * 1986-11-26 1988-10-18 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films
JPS63137158A (ja) * 1986-11-27 1988-06-09 Nissin Electric Co Ltd アルミ薄膜の作製方法

Also Published As

Publication number Publication date
JPH02290965A (ja) 1990-11-30
EP0384617B1 (de) 1994-05-25
DE69009078D1 (de) 1994-06-30
EP0384617A1 (de) 1990-08-29
US4951604A (en) 1990-08-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee