DE3668188D1 - System und verfahren zur vakuumabscheidung. - Google Patents

System und verfahren zur vakuumabscheidung.

Info

Publication number
DE3668188D1
DE3668188D1 DE8686113869T DE3668188T DE3668188D1 DE 3668188 D1 DE3668188 D1 DE 3668188D1 DE 8686113869 T DE8686113869 T DE 8686113869T DE 3668188 T DE3668188 T DE 3668188T DE 3668188 D1 DE3668188 D1 DE 3668188D1
Authority
DE
Germany
Prior art keywords
separation system
vacuum separation
vacuum
separation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686113869T
Other languages
English (en)
Inventor
Steven George Barbee
Gregory Paul Devine
William John Patrick
Gerard Seeley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3668188D1 publication Critical patent/DE3668188D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE8686113869T 1985-10-30 1986-10-07 System und verfahren zur vakuumabscheidung. Expired - Fee Related DE3668188D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/792,729 US4640221A (en) 1985-10-30 1985-10-30 Vacuum deposition system with improved mass flow control

Publications (1)

Publication Number Publication Date
DE3668188D1 true DE3668188D1 (de) 1990-02-15

Family

ID=25157879

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686113869T Expired - Fee Related DE3668188D1 (de) 1985-10-30 1986-10-07 System und verfahren zur vakuumabscheidung.

Country Status (5)

Country Link
US (1) US4640221A (de)
EP (1) EP0220552B1 (de)
JP (1) JPS62107071A (de)
CA (1) CA1228268A (de)
DE (1) DE3668188D1 (de)

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US7229666B2 (en) * 2002-01-22 2007-06-12 Micron Technology, Inc. Chemical vapor deposition method
US6787185B2 (en) 2002-02-25 2004-09-07 Micron Technology, Inc. Deposition methods for improved delivery of metastable species
JP3828821B2 (ja) * 2002-03-13 2006-10-04 株式会社堀場エステック 液体材料気化供給装置
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US6887521B2 (en) * 2002-08-15 2005-05-03 Micron Technology, Inc. Gas delivery system for pulsed-type deposition processes used in the manufacturing of micro-devices
WO2004061888A2 (en) * 2002-12-20 2004-07-22 Tokyo Electron Limited Method and apparatus for determining consumable lifetime
US9725805B2 (en) 2003-06-27 2017-08-08 Spts Technologies Limited Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
US7150299B2 (en) 2003-09-12 2006-12-19 Air Products And Chemicals, Inc. Assembly and method for containing, receiving and storing fluids and for dispensing gas from a fluid control and gas delivery assembly having an integrated fluid flow restrictor
US20080073559A1 (en) * 2003-12-12 2008-03-27 Horsky Thomas N Controlling the flow of vapors sublimated from solids
US20080223409A1 (en) * 2003-12-12 2008-09-18 Horsky Thomas N Method and apparatus for extending equipment uptime in ion implantation
CN1894763B (zh) * 2003-12-12 2010-12-08 山米奎普公司 用于在离子植入中延长设备正常运行时间的方法及装置
US7628861B2 (en) * 2004-12-17 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
US7628860B2 (en) 2004-04-12 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
JP4911555B2 (ja) * 2005-04-07 2012-04-04 国立大学法人東北大学 成膜装置および成膜方法
FR2894165B1 (fr) 2005-12-01 2008-06-06 Sidel Sas Installation d'alimentation en gaz pour machines de depot d'une couche barriere sur recipients
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US7615061B2 (en) 2006-02-28 2009-11-10 Arthrocare Corporation Bone anchor suture-loading system, method and apparatus
DE102007011589A1 (de) * 2007-03-08 2008-09-11 Schott Ag Fördereinrichtung für Precursor
DE102007020852A1 (de) * 2007-05-02 2008-11-06 Stein, Ralf Gasversorgungssystem und Verfahren zur Bereitstellung eines gasförmigen Abscheidungsmediums
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JP5372353B2 (ja) * 2007-09-25 2013-12-18 株式会社フジキン 半導体製造装置用ガス供給装置
JP4941514B2 (ja) * 2009-06-30 2012-05-30 東京エレクトロン株式会社 処理ガス供給装置及び成膜装置
JP5083285B2 (ja) * 2009-08-24 2012-11-28 東京エレクトロン株式会社 疎水化処理装置、疎水化処理方法及び記憶媒体
US8628618B2 (en) 2009-09-29 2014-01-14 Novellus Systems Inc. Precursor vapor generation and delivery system with filters and filter monitoring system
JP5589519B2 (ja) * 2010-04-09 2014-09-17 住友電気工業株式会社 化合物半導体結晶の製造方法
US20130118609A1 (en) * 2011-11-12 2013-05-16 Thomas Neil Horsky Gas flow device
DE102012203212A1 (de) * 2012-03-01 2013-09-05 Osram Opto Semiconductors Gmbh Beschichtungsanlage und verfahren zur durchführung eines aufwachsprozesses
DE102012210332A1 (de) * 2012-06-19 2013-12-19 Osram Opto Semiconductors Gmbh Ald-beschichtungsanlage
CN103691459B (zh) * 2012-09-27 2016-06-29 陈怀超 水蒸汽裂解催化剂及其制法和水蒸汽裂解氢燃烧方法
US20140299059A1 (en) * 2013-04-03 2014-10-09 Ofs Fitel, Llc Vapor delivery system
DE102013109210A1 (de) * 2013-08-20 2015-02-26 Aixtron Se Evakuierbare Kammer, insbesondere mit einem Spülgas spülbare Beladeschleuse
PL239633B1 (pl) * 2018-02-14 2021-12-20 Politechnika Lodzka Układ do zasilania w pary prekursora reaktorów do nakładania powłok metodami próżniowymi
JP7281285B2 (ja) * 2019-01-28 2023-05-25 株式会社堀場エステック 濃度制御装置、及び、ゼロ点調整方法、濃度制御装置用プログラム
CN110397093A (zh) * 2019-07-08 2019-11-01 天津大学 一种可调节筒型基础沉放速率的负压控制装置及其使用方法
DE102020122800A1 (de) * 2020-09-01 2022-03-03 Apeva Se Vorrichtung zum Abscheiden von OLED-Schichten mit einer Run-/Vent-Leitung
CN115328226B (zh) * 2022-08-31 2024-10-11 湖南顶立科技股份有限公司 一种应用于气相沉积设备的压力调控装置及其方法

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Also Published As

Publication number Publication date
EP0220552A2 (de) 1987-05-06
US4640221A (en) 1987-02-03
EP0220552B1 (de) 1990-01-10
CA1228268A (en) 1987-10-20
JPH0468391B2 (de) 1992-11-02
JPS62107071A (ja) 1987-05-18
EP0220552A3 (en) 1987-08-19

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee