DE69126959T2 - Wasserdampfversorgungseinrichtung - Google Patents
WasserdampfversorgungseinrichtungInfo
- Publication number
- DE69126959T2 DE69126959T2 DE69126959T DE69126959T DE69126959T2 DE 69126959 T2 DE69126959 T2 DE 69126959T2 DE 69126959 T DE69126959 T DE 69126959T DE 69126959 T DE69126959 T DE 69126959T DE 69126959 T2 DE69126959 T2 DE 69126959T2
- Authority
- DE
- Germany
- Prior art keywords
- supply device
- steam supply
- steam
- supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2267985A JPH04144226A (ja) | 1990-10-05 | 1990-10-05 | 半導体製造装置およびその制御方法 |
JP2267986A JP2972313B2 (ja) | 1990-10-05 | 1990-10-05 | 水蒸気供給方法及び水蒸気供給装置 |
PCT/JP1991/001361 WO1992006488A1 (en) | 1990-10-05 | 1991-10-05 | Vapor supplier and its control method |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69126959D1 DE69126959D1 (de) | 1997-08-28 |
DE69126959T2 true DE69126959T2 (de) | 1997-11-27 |
Family
ID=26548116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69126959T Expired - Fee Related DE69126959T2 (de) | 1990-10-05 | 1991-10-05 | Wasserdampfversorgungseinrichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US6115538A (de) |
EP (1) | EP0504420B1 (de) |
KR (1) | KR950007197B1 (de) |
DE (1) | DE69126959T2 (de) |
WO (1) | WO1992006488A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5653813A (en) * | 1995-04-03 | 1997-08-05 | Novellus Systems, Inc. | Cyclone evaporator |
EP0832992A1 (de) * | 1996-09-13 | 1998-04-01 | Novellus Systems, Inc. | Zyklonverdampfer |
WO2016048526A1 (en) * | 2014-09-25 | 2016-03-31 | Applied Materials, Inc. | Vacuum foreline reagent addition for fluorine abatement |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US756242A (en) * | 1902-10-07 | 1904-04-05 | United Electric Heating Co | Electric heater. |
US1715035A (en) * | 1927-12-21 | 1929-05-28 | Wireless Specialty Apparatus | Apparatus for manufacturing electrical condensers |
US2279000A (en) * | 1941-04-07 | 1942-04-07 | Leon H Larson | Art of cooking |
US2437963A (en) * | 1943-03-24 | 1948-03-16 | Gen Electric | Method and apparatus for producing aerosols |
DE1224279B (de) * | 1964-01-03 | 1966-09-08 | Siemens Ag | Verfahren zur Herstellung kristalliner, insbesondere einkristalliner, aus Halbleiter-material bestehender, dotierter Schichten auf kristallinen Grundkoerpern aus Halbleitermaterial |
FR1530914A (fr) * | 1967-07-10 | 1968-06-28 | Texas Instruments Inc | Métaux renforcés par dispersion et leur procédé de préparation |
US3603767A (en) * | 1969-09-03 | 1971-09-07 | Dynatherm Corp | Isothermal cooking or heating device |
US3744474A (en) * | 1971-03-01 | 1973-07-10 | Beatrice Foods Co | Steam cooking apparatus and method |
US3734168A (en) * | 1971-12-03 | 1973-05-22 | United Aircraft Prod | Water or like boiler |
US3760773A (en) * | 1972-03-06 | 1973-09-25 | Envirotech Corp | Gas generating and metering device and method |
US3818819A (en) * | 1972-05-15 | 1974-06-25 | Innovative Process Equipment | Pressure cooking system |
US4088023A (en) * | 1974-03-18 | 1978-05-09 | Corning Glass Works | Liquid level gauge |
US4049863A (en) * | 1975-07-31 | 1977-09-20 | E. I. Du Pont De Nemours And Company | Fluoropolymer primer having improved scratch resistance |
US4116016A (en) * | 1977-03-08 | 1978-09-26 | Fischer & Porter Co. | Corrosion-resistant liquified gas evaporator |
NL8402636A (nl) * | 1984-08-30 | 1986-03-17 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij een halfgeleidersubstraat wordt onderworpen aan een behandeling in een reaktiegas. |
US4646630A (en) * | 1985-03-25 | 1987-03-03 | The Lucks Company | Humidifier assembly |
US4668854A (en) * | 1985-08-13 | 1987-05-26 | Napco Scientific Company | Humidification system |
US4640221A (en) * | 1985-10-30 | 1987-02-03 | International Business Machines Corporation | Vacuum deposition system with improved mass flow control |
US4761269A (en) * | 1986-06-12 | 1988-08-02 | Crystal Specialties, Inc. | Apparatus for depositing material on a substrate |
JPH0748489B2 (ja) * | 1987-07-27 | 1995-05-24 | 富士通株式会社 | プラズマ処理装置 |
US4883686A (en) * | 1988-05-26 | 1989-11-28 | Energy Conversion Devices, Inc. | Method for the high rate plasma deposition of high quality material |
-
1991
- 1991-10-05 DE DE69126959T patent/DE69126959T2/de not_active Expired - Fee Related
- 1991-10-05 WO PCT/JP1991/001361 patent/WO1992006488A1/ja active IP Right Grant
- 1991-10-05 KR KR1019920701351A patent/KR950007197B1/ko not_active IP Right Cessation
- 1991-10-05 EP EP91917070A patent/EP0504420B1/de not_active Expired - Lifetime
-
1995
- 1995-06-05 US US08/462,561 patent/US6115538A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0504420A1 (de) | 1992-09-23 |
EP0504420A4 (en) | 1993-04-21 |
KR950007197B1 (ko) | 1995-07-03 |
EP0504420B1 (de) | 1997-07-23 |
US6115538A (en) | 2000-09-05 |
WO1992006488A1 (en) | 1992-04-16 |
DE69126959D1 (de) | 1997-08-28 |
KR927004336A (ko) | 1992-12-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |