ES2166873T3 - Procedimiento y dispositivo para revestir la superficie de un substrato. - Google Patents

Procedimiento y dispositivo para revestir la superficie de un substrato.

Info

Publication number
ES2166873T3
ES2166873T3 ES96810020T ES96810020T ES2166873T3 ES 2166873 T3 ES2166873 T3 ES 2166873T3 ES 96810020 T ES96810020 T ES 96810020T ES 96810020 T ES96810020 T ES 96810020T ES 2166873 T3 ES2166873 T3 ES 2166873T3
Authority
ES
Spain
Prior art keywords
substrate
inorganic material
procedure
cover
evaporated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96810020T
Other languages
English (en)
Inventor
Wolfgang Lohwasser
Andre Wisard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3A Composites International AG
Original Assignee
Alcan Technology and Management Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcan Technology and Management Ltd filed Critical Alcan Technology and Management Ltd
Application granted granted Critical
Publication of ES2166873T3 publication Critical patent/ES2166873T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating
    • H01J2237/3137—Plasma-assisted co-operation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Secondary Cells (AREA)

Abstract

EN UN PROCEDIMIENTO PARA RECUBRIR LA SUPERFICIE DE UN SUSTRATO CON UNA CAPA DE MATERIAL INORGANICO (38), SE EVAPORA EL MATERIAL INORGANICO EN UNA CAMARA DE VACIO CON AL MENOS 10{SUP,-3} MBAR MEDIANTE IMPULSION CON UN HAZ DE ELECTRONES A PARTIR DE UN CAÑON DE HAZ DE ELECTRONES DE ALTA TENSION, Y SE DEPOSITA SOBRE LA SUPERFICIE DEL SUSTRATO. ENTRE EL PUNTO DE IMPACTO (A) DEL HAZ DE ELECTRONES (16) SOBRE EL MATERIAL INORGANICO EVAPORADO (38) Y UN ANODO (20) SE PRODUCE UNA DESCARGA DE GASES, QUE PROVOCA LA EXPANSION POR EL ANODO DE LAS CARGAS ELECTRICAS PRODUCIDAS POR EL CAÑON DE HAZ DE ELECTRONES DE ALTA TENSION (10). DE ESTA MANERA SE EVITAN DAÑOS EN EL SUSTRATO, QUE PUEDEN APARECER COMO CONSECUENCIA DE LOS FENOMENOS DE SOBREALIMENTACION.
ES96810020T 1996-01-10 1996-01-10 Procedimiento y dispositivo para revestir la superficie de un substrato. Expired - Lifetime ES2166873T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96810020A EP0784102B1 (de) 1996-01-10 1996-01-10 Verfahren und Vorrichtung zum Beschichten einer Substratfläche

Publications (1)

Publication Number Publication Date
ES2166873T3 true ES2166873T3 (es) 2002-05-01

Family

ID=8225531

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96810020T Expired - Lifetime ES2166873T3 (es) 1996-01-10 1996-01-10 Procedimiento y dispositivo para revestir la superficie de un substrato.

Country Status (5)

Country Link
US (2) US5804258A (es)
EP (1) EP0784102B1 (es)
CA (1) CA2194742C (es)
DE (1) DE59608441D1 (es)
ES (1) ES2166873T3 (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6431175B1 (en) 1997-12-30 2002-08-13 Remon Medical Technologies Ltd. System and method for directing and monitoring radiation
US20030036746A1 (en) 2001-08-16 2003-02-20 Avi Penner Devices for intrabody delivery of molecules and systems and methods utilizing same
GB2339800B (en) * 1998-07-24 2003-04-09 Gen Vacuum Equipment Ltd A vacuum process for depositing zinc sulphide and other coatings on flexible moving web
US20060064133A1 (en) 2004-09-17 2006-03-23 Cardiac Pacemakers, Inc. System and method for deriving relative physiologic measurements using an external computing device
US7813808B1 (en) 2004-11-24 2010-10-12 Remon Medical Technologies Ltd Implanted sensor system with optimized operational and sensing parameters
US7955268B2 (en) 2006-07-21 2011-06-07 Cardiac Pacemakers, Inc. Multiple sensor deployment
JP2011506773A (ja) * 2007-12-19 2011-03-03 タリアニ， カルロ 金属酸化物膜を堆積させるための方法
US20100189929A1 (en) * 2009-01-28 2010-07-29 Neal James W Coating device and deposition apparatus

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3791852A (en) * 1972-06-16 1974-02-12 Univ California High rate deposition of carbides by activated reactive evaporation
JPS55104328A (en) * 1979-02-06 1980-08-09 Seiko Epson Corp Macromolecular material having clear conducting film and production thereof
US4526132A (en) * 1982-11-24 1985-07-02 Konishiroku Photo Industry Co., Ltd. Evaporator
US4514437A (en) * 1984-05-02 1985-04-30 Energy Conversion Devices, Inc. Apparatus for plasma assisted evaporation of thin films and corresponding method of deposition
JPS61926A (ja) * 1984-06-13 1986-01-06 Taiyo Yuden Co Ltd 鉄系薄膜型磁気記録媒体の製造方法
JPS6115967A (ja) * 1984-06-29 1986-01-24 Sumitomo Electric Ind Ltd 表面処理方法
US4620913A (en) * 1985-11-15 1986-11-04 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition method and apparatus
DE3634598C2 (de) * 1986-10-10 1994-06-16 Leybold Ag Verfahren und Vorrichtung zum reaktiven Aufdampfen von Metallverbindungen
US4816291A (en) * 1987-08-19 1989-03-28 The Regents Of The University Of California Process for making diamond, doped diamond, diamond-cubic boron nitride composite films
US4951604A (en) * 1989-02-17 1990-08-28 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films
WO1990013683A1 (en) * 1989-05-10 1990-11-15 Institut Elektrosvarki Imeni E.O.Patona Akademii Nauk Ukrainskoi Ssr Method of obtaining carbon-containing materials
US5055319A (en) * 1990-04-02 1991-10-08 The Regents Of The University Of California Controlled high rate deposition of metal oxide films
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
DE4236264C1 (es) * 1992-10-27 1993-09-02 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 80636 Muenchen, De
DE4239511A1 (de) * 1992-11-25 1994-05-26 Leybold Ag Verfahren und Vorrichtung zum Beschichten von Substraten

Also Published As

Publication number Publication date
US5804258A (en) 1998-09-08
CA2194742C (en) 2001-08-14
EP0784102B1 (de) 2001-12-12
EP0784102A1 (de) 1997-07-16
US5885357A (en) 1999-03-23
CA2194742A1 (en) 1997-07-11
DE59608441D1 (de) 2002-01-24

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