DE69416963T2 - Vorrichtung zur Bogenbeschichtung im Vakuum - Google Patents

Vorrichtung zur Bogenbeschichtung im Vakuum

Info

Publication number
DE69416963T2
DE69416963T2 DE69416963T DE69416963T DE69416963T2 DE 69416963 T2 DE69416963 T2 DE 69416963T2 DE 69416963 T DE69416963 T DE 69416963T DE 69416963 T DE69416963 T DE 69416963T DE 69416963 T2 DE69416963 T2 DE 69416963T2
Authority
DE
Germany
Prior art keywords
vacuum
coating sheets
sheets
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69416963T
Other languages
English (en)
Other versions
DE69416963D1 (de
Inventor
Hiroshi Tamagaki
Hiroshi Kawaguchi
Hirofumi Fujii
Katsuhiko Shimojima
Takeshi C O Takasago Wo Suzuki
Koji C O Takasago Wor Hanaguri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31860393A external-priority patent/JP3199543B2/ja
Priority claimed from JP32276393A external-priority patent/JP3243357B2/ja
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Application granted granted Critical
Publication of DE69416963D1 publication Critical patent/DE69416963D1/de
Publication of DE69416963T2 publication Critical patent/DE69416963T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE69416963T 1993-12-17 1994-12-16 Vorrichtung zur Bogenbeschichtung im Vakuum Expired - Lifetime DE69416963T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP31860393A JP3199543B2 (ja) 1993-12-17 1993-12-17 真空アーク蒸着装置
JP32037993 1993-12-20
JP32276393A JP3243357B2 (ja) 1993-12-21 1993-12-21 真空アーク蒸着装置

Publications (2)

Publication Number Publication Date
DE69416963D1 DE69416963D1 (de) 1999-04-15
DE69416963T2 true DE69416963T2 (de) 1999-09-16

Family

ID=27339666

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69416963T Expired - Lifetime DE69416963T2 (de) 1993-12-17 1994-12-16 Vorrichtung zur Bogenbeschichtung im Vakuum

Country Status (4)

Country Link
US (1) US5744017A (de)
EP (1) EP0658634B1 (de)
KR (1) KR0162921B1 (de)
DE (1) DE69416963T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
GB9722648D0 (en) 1997-10-24 1997-12-24 Univ Nanyang ARC monitoring
WO2003057939A2 (en) * 2002-01-14 2003-07-17 Varco Ltd. Cathode for vacuum arc evaporators
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
JP4014982B2 (ja) * 2002-09-19 2007-11-28 株式会社神戸製鋼所 アーク蒸発源用のロッドターゲット、その製造方法及びアーク蒸着装置
GB2410255A (en) * 2004-01-21 2005-07-27 Nanofilm Technologies Int Arc deposition method and apparatus
US7867366B1 (en) * 2004-04-28 2011-01-11 Alameda Applied Sciences Corp. Coaxial plasma arc vapor deposition apparatus and method
PT1996744E (pt) * 2006-01-27 2011-03-03 Nanosurface Technologies Llc Métodos de revestimento antimicrobiano
JP4110175B2 (ja) * 2006-03-22 2008-07-02 株式会社神戸製鋼所 アークイオンプレーティング方法
TWI411696B (zh) * 2006-07-19 2013-10-11 Oerlikon Trading Ag 沉積電絕緣層之方法
US7857948B2 (en) 2006-07-19 2010-12-28 Oerlikon Trading Ag, Trubbach Method for manufacturing poorly conductive layers
US8940140B2 (en) * 2007-09-05 2015-01-27 Uchicago Argonne, Llc Thin film application device and method for coating small aperture vacuum vessels
WO2009150997A1 (ja) * 2008-06-11 2009-12-17 株式会社アルバック スパッタリング装置
US11345991B2 (en) * 2018-09-27 2022-05-31 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device, method and machine of manufacture
RU192230U1 (ru) * 2019-01-31 2019-09-09 Федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В.И. Ульянова (Ленина) Устройство для вакуумно-плазменого нанесения покрытий
US20230197425A1 (en) * 2021-12-17 2023-06-22 Vapor Technologies, Inc. Multi racetrack cathodic arc

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
GB2106545B (en) * 1981-02-23 1985-06-26 Rimma Ivanovna Stupak Consumable cathode for electric-arc evaporator of metal
US4430184A (en) * 1983-05-09 1984-02-07 Vac-Tec Systems, Inc. Evaporation arc stabilization
US4600489A (en) * 1984-01-19 1986-07-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for non-permeable targets utilizing permeable stop ring
US4486287A (en) * 1984-02-06 1984-12-04 Fournier Paul R Cross-field diode sputtering target assembly
EP0298157B1 (de) * 1987-06-29 1992-09-02 Hauzer Holding B.V. Verfahren und Vorrichtung zur Beschichtung von Aushöhlungen von Gegenständen
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
US5037522B1 (en) * 1990-07-24 1996-07-02 Vergason Technology Inc Electric arc vapor deposition device
US5200049A (en) * 1990-08-10 1993-04-06 Viratec Thin Films, Inc. Cantilever mount for rotating cylindrical magnetrons
DE4038497C1 (de) * 1990-12-03 1992-02-20 Leybold Ag, 6450 Hanau, De
DE4042286C1 (de) * 1990-12-31 1992-02-06 Leybold Ag, 6450 Hanau, De
US5269898A (en) * 1991-03-20 1993-12-14 Vapor Technologies, Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
US5380421A (en) * 1992-11-04 1995-01-10 Gorokhovsky; Vladimir I. Vacuum-arc plasma source
US5527439A (en) * 1995-01-23 1996-06-18 The Boc Group, Inc. Cylindrical magnetron shield structure

Also Published As

Publication number Publication date
KR950018627A (ko) 1995-07-22
KR0162921B1 (ko) 1999-01-15
EP0658634B1 (de) 1999-03-10
US5744017A (en) 1998-04-28
DE69416963D1 (de) 1999-04-15
EP0658634A1 (de) 1995-06-21

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Legal Events

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