DE69106612D1 - Verfahren und Einrichtung zur Ablagerung von Antireflektionsschichten und zur Kontrolle ihrer Dicke. - Google Patents

Verfahren und Einrichtung zur Ablagerung von Antireflektionsschichten und zur Kontrolle ihrer Dicke.

Info

Publication number
DE69106612D1
DE69106612D1 DE69106612T DE69106612T DE69106612D1 DE 69106612 D1 DE69106612 D1 DE 69106612D1 DE 69106612 T DE69106612 T DE 69106612T DE 69106612 T DE69106612 T DE 69106612T DE 69106612 D1 DE69106612 D1 DE 69106612D1
Authority
DE
Germany
Prior art keywords
thickness
controlling
reflective layers
depositing anti
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69106612T
Other languages
English (en)
Other versions
DE69106612T2 (de
Inventor
Jean Landreau
Hisao Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orange SA
Original Assignee
France Telecom SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by France Telecom SA filed Critical France Telecom SA
Application granted granted Critical
Publication of DE69106612D1 publication Critical patent/DE69106612D1/de
Publication of DE69106612T2 publication Critical patent/DE69106612T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/0014—Measuring characteristics or properties thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Lasers (AREA)
  • Semiconductor Lasers (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69106612T 1990-07-13 1991-07-11 Verfahren und Einrichtung zur Ablagerung von Antireflektionsschichten und zur Kontrolle ihrer Dicke. Expired - Fee Related DE69106612T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9008947A FR2664710B1 (fr) 1990-07-13 1990-07-13 Procede et installation de depot de couches antireflet et de controle de leur epaisseur.

Publications (2)

Publication Number Publication Date
DE69106612D1 true DE69106612D1 (de) 1995-02-23
DE69106612T2 DE69106612T2 (de) 1995-07-27

Family

ID=9398688

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69106612T Expired - Fee Related DE69106612T2 (de) 1990-07-13 1991-07-11 Verfahren und Einrichtung zur Ablagerung von Antireflektionsschichten und zur Kontrolle ihrer Dicke.

Country Status (5)

Country Link
US (1) US5221636A (de)
EP (1) EP0466598B1 (de)
JP (1) JPH0730201A (de)
DE (1) DE69106612T2 (de)
FR (1) FR2664710B1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2837677B2 (ja) * 1987-11-05 1998-12-16 三井化学株式会社 射出成形品
JP2674807B2 (ja) * 1987-11-05 1997-11-12 三井石油化学工業株式会社 摺動材
FR2694457B1 (fr) * 1992-07-31 1994-09-30 Chebbi Brahim Laser à semi-conducteur pour la détection d'un rayonnement lumineux, procédé pour l'obtention d'un détecteur photosensible, et application d'un tel laser à la détection d'un rayonnement lumineux.
US5911856A (en) * 1993-09-03 1999-06-15 Canon Kabushiki Kaisha Method for forming thin film
JPH08220304A (ja) 1995-02-13 1996-08-30 Tadahiro Omi 光学物品及びそれを用いた露光装置又は光学系並びにその製造方法
DE19812562A1 (de) * 1998-03-21 1999-09-23 Joachim Sacher Beschichtungs-Verfahren und -Vorrichtung
US6485565B1 (en) 1998-05-28 2002-11-26 The Regents Of The University Of California Process and apparatus for making oriented crystal layers
US6132805A (en) * 1998-10-20 2000-10-17 Cvc Products, Inc. Shutter for thin-film processing equipment
US20030015139A1 (en) * 2001-07-17 2003-01-23 3M Innovative Properties Company Protective packaging
US7824730B2 (en) * 2007-08-31 2010-11-02 United Technologies Corporation Method and apparatus for measuring coating thickness with a laser
RU2466207C2 (ru) * 2010-12-23 2012-11-10 Государственное образовательное учреждение высшего профессионального образования "Тамбовский государственный технический университет" ГОУ ВПО ТГТУ Способ синтеза наноструктурной пленки на изделии и устройство для его реализации

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3846165A (en) * 1972-08-21 1974-11-05 Rca Corp Method of applying an anti-reflective coating on a semiconductor laser
US4563368A (en) * 1983-02-14 1986-01-07 Xerox Corporation Passivation for surfaces and interfaces of semiconductor laser facets or the like
US4843031A (en) * 1987-03-17 1989-06-27 Matsushita Electric Industrial Co., Ltd. Method of fabricating compound semiconductor laser using selective irradiation

Also Published As

Publication number Publication date
FR2664710B1 (fr) 1993-06-18
JPH0730201A (ja) 1995-01-31
DE69106612T2 (de) 1995-07-27
EP0466598A1 (de) 1992-01-15
EP0466598B1 (de) 1995-01-11
US5221636A (en) 1993-06-22
FR2664710A1 (fr) 1992-01-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee