DE68908646D1 - Halbleiterlaser. - Google Patents
Halbleiterlaser.Info
- Publication number
- DE68908646D1 DE68908646D1 DE89309284T DE68908646T DE68908646D1 DE 68908646 D1 DE68908646 D1 DE 68908646D1 DE 89309284 T DE89309284 T DE 89309284T DE 68908646 T DE68908646 T DE 68908646T DE 68908646 D1 DE68908646 D1 DE 68908646D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- laser
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63230990A JPH0279486A (ja) | 1988-09-14 | 1988-09-14 | 半導体レーザ素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68908646D1 true DE68908646D1 (de) | 1993-09-30 |
DE68908646T2 DE68908646T2 (de) | 1994-01-05 |
Family
ID=16916507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE89309284T Expired - Fee Related DE68908646T2 (de) | 1988-09-14 | 1989-09-13 | Halbleiterlaser. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4984244A (de) |
EP (1) | EP0359542B1 (de) |
JP (1) | JPH0279486A (de) |
DE (1) | DE68908646T2 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2827326B2 (ja) * | 1989-09-27 | 1998-11-25 | 住友電気工業株式会社 | 半導体レーザの製造方法 |
JPH03256386A (ja) * | 1990-03-06 | 1991-11-15 | Hitachi Ltd | 半導体レーザ、その製造方法及び光通信システム |
JP2547464B2 (ja) * | 1990-04-13 | 1996-10-23 | シャープ株式会社 | 半導体レーザ素子の製造方法 |
US5202285A (en) * | 1990-04-26 | 1993-04-13 | Fujitsu Limited | Semiconductor laser having double heterostructure and method of producing same |
US5255281A (en) * | 1990-04-26 | 1993-10-19 | Fujitsu Limited | Semiconductor laser having double heterostructure |
JPH0427185A (ja) * | 1990-05-22 | 1992-01-30 | Victor Co Of Japan Ltd | 屈折率導波型半導体レーザ装置 |
JPH0474488A (ja) * | 1990-07-16 | 1992-03-09 | Mitsubishi Electric Corp | 半導体レーザ装置およびその製造方法 |
US5179040A (en) * | 1990-07-16 | 1993-01-12 | Mitsubishi Denki Kabushiki Kaisha | Method of making a semiconductor laser device |
US5227015A (en) * | 1990-07-30 | 1993-07-13 | Matsushita Electric Industrial Co., Ltd. | Method of fabricating semiconductor laser |
FR2672740B1 (fr) * | 1991-02-08 | 1995-03-31 | Alcatel Nv | Procede de realisation d'un laser semiconducteur planaire a ruban enterre. |
JPH04317384A (ja) * | 1991-04-16 | 1992-11-09 | Mitsubishi Electric Corp | 半導体発光装置 |
JPH05167191A (ja) * | 1991-12-18 | 1993-07-02 | Furukawa Electric Co Ltd:The | 埋め込み型半導体レーザ素子 |
US5362675A (en) * | 1991-12-24 | 1994-11-08 | Samsung Electronics Co., Ltd. | Manufacturing method of laser diode and laser diode array |
JP3424941B2 (ja) * | 1992-04-01 | 2003-07-07 | 浜松ホトニクス株式会社 | パルス光源装置 |
JP2823476B2 (ja) * | 1992-05-14 | 1998-11-11 | 三菱電機株式会社 | 半導体レーザおよびその製造方法 |
US5416790A (en) * | 1992-11-06 | 1995-05-16 | Sanyo Electric Co., Ltd. | Semiconductor laser with a self-sustained pulsation |
JP2833952B2 (ja) * | 1992-12-21 | 1998-12-09 | 三菱電機株式会社 | 半導体レーザ |
US5441912A (en) * | 1993-07-28 | 1995-08-15 | The Furukawa Electric Co., Ltd. | Method of manufacturing a laser diode |
JP2000244059A (ja) * | 1999-02-23 | 2000-09-08 | Matsushita Electric Ind Co Ltd | 半導体レーザ装置 |
EP1134858A1 (de) * | 2000-03-06 | 2001-09-19 | Agilent Technologies Inc. a Delaware Corporation | Halbleitervorrichtung mit vergrabener Mesa |
GB2407434A (en) * | 2003-10-24 | 2005-04-27 | Sharp Kk | Vcsel |
JP6551678B2 (ja) * | 2015-10-29 | 2019-07-31 | セイコーエプソン株式会社 | 発光装置およびプロジェクター |
JP6897928B2 (ja) * | 2016-01-14 | 2021-07-07 | 住友電工デバイス・イノベーション株式会社 | 光半導体素子の製造方法および光半導体素子 |
WO2019193679A1 (ja) * | 2018-04-04 | 2019-10-10 | 三菱電機株式会社 | 半導体レーザおよびその製造方法 |
US20210273414A1 (en) * | 2018-07-31 | 2021-09-02 | Mitsubishi Electric Corporation | Method for manufacturing semiconductor laser device, and semiconductor laser device |
WO2020105095A1 (ja) * | 2018-11-19 | 2020-05-28 | 三菱電機株式会社 | 光半導体装置および光半導体装置の製造方法 |
JP6942261B1 (ja) * | 2020-01-28 | 2021-09-29 | 三菱電機株式会社 | 光半導体装置の製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5948976A (ja) * | 1982-09-14 | 1984-03-21 | Nec Corp | 半導体レ−ザ |
US4566171A (en) * | 1983-06-20 | 1986-01-28 | At&T Bell Laboratories | Elimination of mask undercutting in the fabrication of InP/InGaAsP BH devices |
JPH0766994B2 (ja) * | 1985-02-19 | 1995-07-19 | シャープ株式会社 | 半導体レーザ素子 |
JPS61284987A (ja) * | 1985-06-10 | 1986-12-15 | Sharp Corp | 半導体レ−ザ素子 |
JPS62142387A (ja) * | 1985-12-17 | 1987-06-25 | Furukawa Electric Co Ltd:The | 半導体レ−ザ |
US4792958A (en) * | 1986-02-28 | 1988-12-20 | Kabushiki Kaisha Toshiba | Semiconductor laser with mesa stripe waveguide structure |
EP0264225B1 (de) * | 1986-10-07 | 1994-01-19 | Sharp Kabushiki Kaisha | Halbleiterlaservorrichtung und Verfahren zur Herstellung derselben |
JPS63150985A (ja) * | 1986-12-15 | 1988-06-23 | Sharp Corp | 半導体レ−ザ |
JPS63164484A (ja) * | 1986-12-26 | 1988-07-07 | Sharp Corp | 半導体レ−ザ素子 |
-
1988
- 1988-09-14 JP JP63230990A patent/JPH0279486A/ja active Pending
-
1989
- 1989-09-13 EP EP19890309284 patent/EP0359542B1/de not_active Expired - Lifetime
- 1989-09-13 US US07/406,903 patent/US4984244A/en not_active Expired - Fee Related
- 1989-09-13 DE DE89309284T patent/DE68908646T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0359542A2 (de) | 1990-03-21 |
JPH0279486A (ja) | 1990-03-20 |
EP0359542A3 (en) | 1990-08-16 |
EP0359542B1 (de) | 1993-08-25 |
DE68908646T2 (de) | 1994-01-05 |
US4984244A (en) | 1991-01-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8381 | Inventor (new situation) |
Free format text: YAMAMOTO, SABURO, UDA-GUN NARA-KEN, JP MORIMOTO, TAIJI, NARA-SHI NARA-KEN, JP SASAKI, KAZUAKI, YAO-SHI OSAKA, JP KONDO, MASAKI, NARA-SHI NARA-KEN, JP SUYAMA, TAKAHIRO, TENRI-SHI NARA-KEN, JP KONDO, MASAFUMI, NARA-SHI NARA-KEN, JP |
|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |