DE602007014190D1 - Atomlagenabscheidungssystem und verfahren zur beschichtung von flexiblen substraten - Google Patents

Atomlagenabscheidungssystem und verfahren zur beschichtung von flexiblen substraten

Info

Publication number
DE602007014190D1
DE602007014190D1 DE602007014190T DE602007014190T DE602007014190D1 DE 602007014190 D1 DE602007014190 D1 DE 602007014190D1 DE 602007014190 T DE602007014190 T DE 602007014190T DE 602007014190 T DE602007014190 T DE 602007014190T DE 602007014190 D1 DE602007014190 D1 DE 602007014190D1
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DE
Germany
Prior art keywords
precursor
substrate
precursor zones
zones
atomic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007014190T
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English (en)
Inventor
Eric R Dickey
William A Barrow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lotus Applied Technology LLC
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Lotus Applied Technology LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lotus Applied Technology LLC filed Critical Lotus Applied Technology LLC
Publication of DE602007014190D1 publication Critical patent/DE602007014190D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
    • C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
DE602007014190T 2006-03-26 2007-03-26 Atomlagenabscheidungssystem und verfahren zur beschichtung von flexiblen substraten Active DE602007014190D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US74378606P 2006-03-26 2006-03-26
PCT/US2007/064961 WO2007112370A1 (en) 2006-03-26 2007-03-26 Atomic layer deposition system and method for coating flexible substrates

Publications (1)

Publication Number Publication Date
DE602007014190D1 true DE602007014190D1 (de) 2011-06-09

Family

ID=38541449

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007014190T Active DE602007014190D1 (de) 2006-03-26 2007-03-26 Atomlagenabscheidungssystem und verfahren zur beschichtung von flexiblen substraten

Country Status (9)

Country Link
US (4) US8137464B2 (de)
EP (1) EP2000008B1 (de)
KR (1) KR101314708B1 (de)
CN (1) CN101406108B (de)
AT (1) ATE507320T1 (de)
BR (1) BRPI0709199A2 (de)
DE (1) DE602007014190D1 (de)
ES (1) ES2361661T3 (de)
WO (1) WO2007112370A1 (de)

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US8137464B2 (en) 2012-03-20
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US9238868B2 (en) 2016-01-19
ATE507320T1 (de) 2011-05-15
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