DE60144355D1 - Quelle für thermische PVD-Beschichtung für organische elektrolumineszente Schichten - Google Patents

Quelle für thermische PVD-Beschichtung für organische elektrolumineszente Schichten

Info

Publication number
DE60144355D1
DE60144355D1 DE60144355T DE60144355T DE60144355D1 DE 60144355 D1 DE60144355 D1 DE 60144355D1 DE 60144355 T DE60144355 T DE 60144355T DE 60144355 T DE60144355 T DE 60144355T DE 60144355 D1 DE60144355 D1 DE 60144355D1
Authority
DE
Germany
Prior art keywords
source
organic electroluminescent
pvd coating
electroluminescent layers
thermal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60144355T
Other languages
English (en)
Inventor
Robert G Spahn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Global OLED Technology LLC
Original Assignee
Global OLED Technology LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Global OLED Technology LLC filed Critical Global OLED Technology LLC
Application granted granted Critical
Publication of DE60144355D1 publication Critical patent/DE60144355D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
DE60144355T 2000-03-03 2001-02-19 Quelle für thermische PVD-Beschichtung für organische elektrolumineszente Schichten Expired - Lifetime DE60144355D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/518,600 US6237529B1 (en) 2000-03-03 2000-03-03 Source for thermal physical vapor deposition of organic electroluminescent layers

Publications (1)

Publication Number Publication Date
DE60144355D1 true DE60144355D1 (de) 2011-05-19

Family

ID=24064650

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60144355T Expired - Lifetime DE60144355D1 (de) 2000-03-03 2001-02-19 Quelle für thermische PVD-Beschichtung für organische elektrolumineszente Schichten

Country Status (4)

Country Link
US (1) US6237529B1 (de)
EP (1) EP1130129B1 (de)
JP (1) JP4520059B2 (de)
DE (1) DE60144355D1 (de)

Families Citing this family (169)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW490714B (en) 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
KR100721656B1 (ko) * 2005-11-01 2007-05-23 주식회사 엘지화학 유기 전기 소자
US20020011205A1 (en) 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
KR20010104215A (ko) * 2000-05-12 2001-11-24 야마자끼 순페이 발광장치 제작방법
US7517551B2 (en) * 2000-05-12 2009-04-14 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light-emitting device
JP2002146516A (ja) * 2000-11-07 2002-05-22 Sony Corp 有機薄膜の蒸着方法
TW545080B (en) * 2000-12-28 2003-08-01 Semiconductor Energy Lab Light emitting device and method of manufacturing the same
SG148030A1 (en) 2000-12-28 2008-12-31 Semiconductor Energy Lab Luminescent device
TW518909B (en) * 2001-01-17 2003-01-21 Semiconductor Energy Lab Luminescent device and method of manufacturing same
TW519770B (en) * 2001-01-18 2003-02-01 Semiconductor Energy Lab Light emitting device and manufacturing method thereof
SG118110A1 (en) * 2001-02-01 2006-01-27 Semiconductor Energy Lab Organic light emitting element and display device using the element
US20020139303A1 (en) * 2001-02-01 2002-10-03 Shunpei Yamazaki Deposition apparatus and deposition method
TWI225312B (en) * 2001-02-08 2004-12-11 Semiconductor Energy Lab Light emitting device
US20030010288A1 (en) * 2001-02-08 2003-01-16 Shunpei Yamazaki Film formation apparatus and film formation method
US7432116B2 (en) * 2001-02-21 2008-10-07 Semiconductor Energy Laboratory Co., Ltd. Method and apparatus for film deposition
SG118118A1 (en) * 2001-02-22 2006-01-27 Semiconductor Energy Lab Organic light emitting device and display using the same
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
US6513451B2 (en) * 2001-04-20 2003-02-04 Eastman Kodak Company Controlling the thickness of an organic layer in an organic light-emiting device
DE10128091C1 (de) 2001-06-11 2002-10-02 Applied Films Gmbh & Co Kg Vorrichtung für die Beschichtung eines flächigen Substrats
US20030026601A1 (en) * 2001-07-31 2003-02-06 The Arizona Board Of Regents On Behalf Of The University Of Arizona Vapor deposition and in-situ purification of organic molecules
US6641730B2 (en) * 2001-10-03 2003-11-04 B. J. Services Company, Integrated debris management system
US20030101937A1 (en) * 2001-11-28 2003-06-05 Eastman Kodak Company Thermal physical vapor deposition source for making an organic light-emitting device
US20030111014A1 (en) * 2001-12-18 2003-06-19 Donatucci Matthew B. Vaporizer/delivery vessel for volatile/thermally sensitive solid and liquid compounds
US6872472B2 (en) * 2002-02-15 2005-03-29 Eastman Kodak Company Providing an organic electroluminescent device having stacked electroluminescent units
FR2836601A1 (fr) * 2002-02-22 2003-08-29 Thales Sa Antenne monopolaire ou dipolaire a large bande
US6787185B2 (en) * 2002-02-25 2004-09-07 Micron Technology, Inc. Deposition methods for improved delivery of metastable species
SG113448A1 (en) * 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
US20050211172A1 (en) * 2002-03-08 2005-09-29 Freeman Dennis R Elongated thermal physical vapor deposition source with plural apertures
US20030168013A1 (en) * 2002-03-08 2003-09-11 Eastman Kodak Company Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device
EP1490895A4 (de) * 2002-03-19 2007-10-10 Innovex Inc Verdampfungsquelle für einen ablagerungsprozess und isolationsfixierplatte und heizdrahtwickelplatte und verfahren zum fixieren eines heizdrahts
KR100473485B1 (ko) * 2002-03-19 2005-03-09 주식회사 이노벡스 유기 반도체 소자 박막 제작을 위한 선형 증발원
US6770502B2 (en) * 2002-04-04 2004-08-03 Eastman Kodak Company Method of manufacturing a top-emitting OLED display device with desiccant structures
EP1369499A3 (de) 2002-04-15 2004-10-20 Semiconductor Energy Laboratory Co., Ltd. Verfahren und Vorrichtung zur Herstellung eines lichtemittierenden Bauteils
US6861094B2 (en) * 2002-04-25 2005-03-01 Micron Technology, Inc. Methods for forming thin layers of materials on micro-device workpieces
US6749906B2 (en) * 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
US6931132B2 (en) * 2002-05-10 2005-08-16 Harris Corporation Secure wireless local or metropolitan area network and related methods
TWI336905B (en) * 2002-05-17 2011-02-01 Semiconductor Energy Lab Evaporation method, evaporation device and method of fabricating light emitting device
US20040035360A1 (en) 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
US6838114B2 (en) * 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
US7118783B2 (en) * 2002-06-26 2006-10-10 Micron Technology, Inc. Methods and apparatus for vapor processing of micro-device workpieces
US20040000379A1 (en) * 2002-06-27 2004-01-01 Ulvac, Inc. Evaporation container and evaporation source
US6821347B2 (en) * 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US20040007183A1 (en) * 2002-07-11 2004-01-15 Ulvac, Inc. Apparatus and method for the formation of thin films
EP1382713B1 (de) * 2002-07-19 2006-05-17 Lg Electronics Inc. Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten
TW200402012A (en) * 2002-07-23 2004-02-01 Eastman Kodak Co OLED displays with fiber-optic faceplates
KR100490537B1 (ko) 2002-07-23 2005-05-17 삼성에스디아이 주식회사 가열용기와 이를 이용한 증착장치
US7300038B2 (en) * 2002-07-23 2007-11-27 Advanced Technology Materials, Inc. Method and apparatus to help promote contact of gas with vaporized material
US6921062B2 (en) 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US20040040504A1 (en) * 2002-08-01 2004-03-04 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
US6887521B2 (en) * 2002-08-15 2005-05-03 Micron Technology, Inc. Gas delivery system for pulsed-type deposition processes used in the manufacturing of micro-devices
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US6747618B2 (en) 2002-08-20 2004-06-08 Eastman Kodak Company Color organic light emitting diode display with improved lifetime
US20040043140A1 (en) * 2002-08-21 2004-03-04 Ramesh Jagannathan Solid state lighting using compressed fluid coatings
US20040043138A1 (en) * 2002-08-21 2004-03-04 Ramesh Jagannathan Solid state lighting using compressed fluid coatings
US6719936B2 (en) * 2002-08-23 2004-04-13 Eastman Kodak Company Method of making a solid compacted pellet of organic material for vacuum deposition of OLED displays
TWI277363B (en) * 2002-08-30 2007-03-21 Semiconductor Energy Lab Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
US20040123804A1 (en) 2002-09-20 2004-07-01 Semiconductor Energy Laboratory Co., Ltd. Fabrication system and manufacturing method of light emitting device
US6831407B2 (en) * 2002-10-15 2004-12-14 Eastman Kodak Company Oled device having improved light output
KR20020089288A (ko) * 2002-11-07 2002-11-29 정세영 유기물 증착용 소스
US7230594B2 (en) 2002-12-16 2007-06-12 Eastman Kodak Company Color OLED display with improved power efficiency
US20040144321A1 (en) * 2003-01-28 2004-07-29 Eastman Kodak Company Method of designing a thermal physical vapor deposition system
US7211461B2 (en) * 2003-02-14 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
US7238383B2 (en) * 2003-03-07 2007-07-03 Eastman Kodak Company Making and using compacted pellets for OLED displays
US7942971B2 (en) * 2003-04-04 2011-05-17 Panasonic Corporation Method of manufacturing plasma display panels
JP4463492B2 (ja) * 2003-04-10 2010-05-19 株式会社半導体エネルギー研究所 製造装置
JP4493926B2 (ja) 2003-04-25 2010-06-30 株式会社半導体エネルギー研究所 製造装置
JP2004353084A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置の固定部材
JP2004353085A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置
JP2004353083A (ja) 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置
US7092206B2 (en) * 2003-06-25 2006-08-15 Hitachi Global Storage Technologies Netherlands B.V. Magnetic head with magnetic layers of differing widths and third pole with reduced thickness
EP1496133A1 (de) * 2003-07-04 2005-01-12 Agfa-Gevaert Anordnung für Tiegel zur Verdampfung von Rohstoffen
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
JP2005029896A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 原材料の蒸発のために使用されるるつぼのための改良されたアセンブリ
JP2005029839A (ja) * 2003-07-11 2005-02-03 Ulvac Japan Ltd 蒸発容器、蒸発源および真空蒸着方法
US6837939B1 (en) 2003-07-22 2005-01-04 Eastman Kodak Company Thermal physical vapor deposition source using pellets of organic material for making OLED displays
US7211454B2 (en) * 2003-07-25 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate
US8123862B2 (en) 2003-08-15 2012-02-28 Semiconductor Energy Laboratory Co., Ltd. Deposition apparatus and manufacturing apparatus
US20050051097A1 (en) * 2003-09-08 2005-03-10 Jan Koninckx Covering assembly for crucible used for evaporation of raw materials
US7282239B2 (en) * 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
JP4312555B2 (ja) * 2003-09-18 2009-08-12 富士フイルム株式会社 真空蒸着用ルツボおよび蛍光体シート製造装置
US7647886B2 (en) * 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
US7258892B2 (en) 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
KR20050060345A (ko) * 2003-12-16 2005-06-22 삼성전자주식회사 패터닝된 증착원 및 이를 이용한 증착방법
US7221332B2 (en) * 2003-12-19 2007-05-22 Eastman Kodak Company 3D stereo OLED display
US7906393B2 (en) 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
US6893939B1 (en) * 2004-02-25 2005-05-17 Eastman Kodak Company Thermal physical vapor deposition source with minimized internal condensation effects
US7364772B2 (en) * 2004-03-22 2008-04-29 Eastman Kodak Company Method for coating an organic layer onto a substrate in a vacuum chamber
US20050244580A1 (en) * 2004-04-30 2005-11-03 Eastman Kodak Company Deposition apparatus for temperature sensitive materials
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
JP4545504B2 (ja) * 2004-07-15 2010-09-15 株式会社半導体エネルギー研究所 膜形成方法、発光装置の作製方法
US20060017055A1 (en) * 2004-07-23 2006-01-26 Eastman Kodak Company Method for manufacturing a display device with low temperature diamond coatings
US7316756B2 (en) 2004-07-27 2008-01-08 Eastman Kodak Company Desiccant for top-emitting OLED
US9040170B2 (en) * 2004-09-20 2015-05-26 Global Oled Technology Llc Electroluminescent device with quinazoline complex emitter
JP2006089816A (ja) * 2004-09-24 2006-04-06 Konica Minolta Medical & Graphic Inc 蒸着装置及び放射線画像変換パネル
US7465475B2 (en) * 2004-11-09 2008-12-16 Eastman Kodak Company Method for controlling the deposition of vaporized organic material
US20060099344A1 (en) * 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
US7252859B2 (en) * 2004-11-19 2007-08-07 Eastman Kodak Company Organic materials for an evaporation source
US7166169B2 (en) * 2005-01-11 2007-01-23 Eastman Kodak Company Vaporization source with baffle
US7649197B2 (en) * 2005-03-23 2010-01-19 Semiconductor Energy Laboratory Co., Ltd. Composite material, and light emitting element and light emitting device using the composite material
US8057916B2 (en) * 2005-04-20 2011-11-15 Global Oled Technology, Llc. OLED device with improved performance
US20060240281A1 (en) * 2005-04-21 2006-10-26 Eastman Kodak Company Contaminant-scavenging layer on OLED anodes
US7989021B2 (en) * 2005-07-27 2011-08-02 Global Oled Technology Llc Vaporizing material at a uniform rate
US20070048545A1 (en) * 2005-08-31 2007-03-01 Eastman Kodak Company Electron-transporting layer for white OLED device
US8956738B2 (en) * 2005-10-26 2015-02-17 Global Oled Technology Llc Organic element for low voltage electroluminescent devices
US9666826B2 (en) * 2005-11-30 2017-05-30 Global Oled Technology Llc Electroluminescent device including an anthracene derivative
US20070122657A1 (en) * 2005-11-30 2007-05-31 Eastman Kodak Company Electroluminescent device containing a phenanthroline derivative
US8454748B2 (en) * 2005-12-27 2013-06-04 Semiconductor Energy Laboratory Co., Ltd. Method of calculating carrier mobility
KR100729097B1 (ko) * 2005-12-28 2007-06-14 삼성에스디아이 주식회사 증발원 및 이를 이용한 박막 증착방법
CN101371619B (zh) * 2006-01-18 2013-11-13 Lg化学株式会社 具有堆叠式有机发光单元的oled
US20070207345A1 (en) * 2006-03-01 2007-09-06 Eastman Kodak Company Electroluminescent device including gallium complexes
US9118020B2 (en) * 2006-04-27 2015-08-25 Global Oled Technology Llc Electroluminescent devices including organic eil layer
WO2007130047A1 (en) 2006-05-08 2007-11-15 Eastman Kodak Company Oled electron-injecting layer
US20080241805A1 (en) * 2006-08-31 2008-10-02 Q-Track Corporation System and method for simulated dosimetry using a real time locating system
JP5063969B2 (ja) * 2006-09-29 2012-10-31 東京エレクトロン株式会社 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法
KR101263005B1 (ko) * 2006-12-19 2013-05-08 비코 인스트루먼츠 인코포레이티드 증착 장치 및 방법
JP2008174816A (ja) * 2007-01-22 2008-07-31 Sony Corp 蒸着装置、蒸着方法および有機電界発光素子ならびに表示装置
US8795855B2 (en) * 2007-01-30 2014-08-05 Global Oled Technology Llc OLEDs having high efficiency and excellent lifetime
JP2008285719A (ja) * 2007-05-17 2008-11-27 Fujifilm Corp 真空蒸着方法
US20080284317A1 (en) * 2007-05-17 2008-11-20 Liang-Sheng Liao Hybrid oled having improved efficiency
US20080284318A1 (en) * 2007-05-17 2008-11-20 Deaton Joseph C Hybrid fluorescent/phosphorescent oleds
US8034465B2 (en) * 2007-06-20 2011-10-11 Global Oled Technology Llc Phosphorescent oled having double exciton-blocking layers
US20090004485A1 (en) * 2007-06-27 2009-01-01 Shiying Zheng 6-member ring structure used in electroluminescent devices
US20090091242A1 (en) * 2007-10-05 2009-04-09 Liang-Sheng Liao Hole-injecting layer in oleds
US8431242B2 (en) * 2007-10-26 2013-04-30 Global Oled Technology, Llc. OLED device with certain fluoranthene host
US8076009B2 (en) * 2007-10-26 2011-12-13 Global Oled Technology, Llc. OLED device with fluoranthene electron transport materials
US20090110956A1 (en) * 2007-10-26 2009-04-30 Begley William J Oled device with electron transport material combination
US8420229B2 (en) 2007-10-26 2013-04-16 Global OLED Technologies LLC OLED device with certain fluoranthene light-emitting dopants
US8129039B2 (en) 2007-10-26 2012-03-06 Global Oled Technology, Llc Phosphorescent OLED device with certain fluoranthene host
KR100928136B1 (ko) 2007-11-09 2009-11-25 삼성모바일디스플레이주식회사 유기물 선형 증착 장치
US8900722B2 (en) 2007-11-29 2014-12-02 Global Oled Technology Llc OLED device employing alkali metal cluster compounds
US20090162612A1 (en) * 2007-12-19 2009-06-25 Hatwar Tukaram K Oled device having two electron-transport layers
US20090191427A1 (en) * 2008-01-30 2009-07-30 Liang-Sheng Liao Phosphorescent oled having double hole-blocking layers
US7947974B2 (en) * 2008-03-25 2011-05-24 Global Oled Technology Llc OLED device with hole-transport and electron-transport materials
US8324800B2 (en) * 2008-06-12 2012-12-04 Global Oled Technology Llc Phosphorescent OLED device with mixed hosts
US8247088B2 (en) * 2008-08-28 2012-08-21 Global Oled Technology Llc Emitting complex for electroluminescent devices
US7931975B2 (en) * 2008-11-07 2011-04-26 Global Oled Technology Llc Electroluminescent device containing a flouranthene compound
US8088500B2 (en) * 2008-11-12 2012-01-03 Global Oled Technology Llc OLED device with fluoranthene electron injection materials
US7968215B2 (en) * 2008-12-09 2011-06-28 Global Oled Technology Llc OLED device with cyclobutene electron injection materials
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
US20100282167A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
WO2010080109A1 (en) * 2008-12-18 2010-07-15 Veeco Instruments Inc. Vacuum deposition sources having heated effusion orifices
KR100994118B1 (ko) * 2009-01-13 2010-11-15 삼성모바일디스플레이주식회사 유기 발광 소자 및 그 제조 방법
US8216697B2 (en) * 2009-02-13 2012-07-10 Global Oled Technology Llc OLED with fluoranthene-macrocyclic materials
US8147989B2 (en) * 2009-02-27 2012-04-03 Global Oled Technology Llc OLED device with stabilized green light-emitting layer
US9062369B2 (en) * 2009-03-25 2015-06-23 Veeco Instruments, Inc. Deposition of high vapor pressure materials
US20100244677A1 (en) * 2009-03-31 2010-09-30 Begley William J Oled device containing a silyl-fluoranthene derivative
US8206842B2 (en) 2009-04-06 2012-06-26 Global Oled Technology Llc Organic element for electroluminescent devices
JP4782219B2 (ja) * 2009-07-02 2011-09-28 三菱重工業株式会社 真空蒸着装置
JP5497765B2 (ja) * 2009-08-04 2014-05-21 キヤノンアネルバ株式会社 加熱処理装置および半導体デバイスの製造方法
US20110104398A1 (en) * 2009-10-29 2011-05-05 General Electric Company Method and system for depositing multiple materials on a substrate
TW201200614A (en) * 2010-06-29 2012-01-01 Hon Hai Prec Ind Co Ltd Coating device
TW201202454A (en) * 2010-07-07 2012-01-16 Hon Hai Prec Ind Co Ltd Processing apparatus for smoothing film material and evaporation deposition device with same
TW201204845A (en) * 2010-07-16 2012-02-01 Hon Hai Prec Ind Co Ltd Processing apparatus for smoothing film material and evaporation deposition device with same
CN102337502A (zh) * 2010-07-19 2012-02-01 鸿富锦精密工业（深圳）有限公司 膜料加工装置及具有该膜料加工装置的蒸镀设备
US9449858B2 (en) * 2010-08-09 2016-09-20 Applied Materials, Inc. Transparent reflector plate for rapid thermal processing chamber
US8673082B2 (en) 2011-01-20 2014-03-18 Sharp Kabushiki Kaisha Crucible and deposition apparatus
DE102011016814B4 (de) * 2011-04-12 2017-03-23 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verdampferzellen-Verschlusseinrichtung für eine Beschichtungsanlage
US10385452B2 (en) 2012-05-31 2019-08-20 Entegris, Inc. Source reagent-based delivery of fluid with high material flux for batch deposition
KR101480141B1 (ko) 2013-04-26 2015-01-08 지제이엠 주식회사 유기재료 사용효율 증대를 위한 증발원
JP5798171B2 (ja) * 2013-04-26 2015-10-21 ジージェイエム カンパニー リミテッド 量産用蒸発装置および方法
WO2015136859A1 (ja) * 2014-03-11 2015-09-17 株式会社Ｊｏｌｅｄ 蒸着装置及び蒸着装置を用いた蒸着方法、及びデバイスの製造方法
DE112014006989B4 (de) * 2014-09-25 2022-12-22 Mitsubishi Electric Corporation Ionenimplantierungsvorrichtung
CN106191785B (zh) * 2016-09-27 2018-09-18 京东方科技集团股份有限公司 坩埚、蒸镀装置及蒸镀系统
JP7011521B2 (ja) * 2018-04-17 2022-01-26 株式会社アルバック 真空蒸着装置用の蒸着源
CN109321883B (zh) * 2018-10-15 2020-10-27 武汉华星光电半导体显示技术有限公司 一种蒸镀机
JP7409799B2 (ja) * 2019-07-29 2024-01-09 キヤノントッキ株式会社 ノズルユニット，坩堝，蒸発源及び蒸着装置
US20220033958A1 (en) * 2020-07-31 2022-02-03 Applied Materials, Inc. Evaporation source, vapor deposition apparatus, and method for coating a substrate in a vacuum chamber

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2447789A (en) 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
NL85130C (de) 1953-01-26
GB1052595A (de) 1964-06-30
DE1521504B1 (de) * 1966-07-13 1969-12-04 Siemens Ag Verdampfer
US3466424A (en) 1967-08-31 1969-09-09 Nasa Evaporant source for vapor deposition
US4401052A (en) 1979-05-29 1983-08-30 The University Of Delaware Apparatus for continuous deposition by vacuum evaporation
JPS5825473A (ja) * 1981-08-05 1983-02-15 Hitachi Ltd ガス膜の蒸着方法
JPS5967368A (ja) * 1982-10-09 1984-04-17 Fuji Electric Co Ltd 蒸発源構造
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
JPS62142759A (ja) * 1985-12-16 1987-06-26 Sumitomo Electric Ind Ltd 円筒長尺体への真空蒸着方法及び装置
JPS63171866A (ja) * 1987-01-09 1988-07-15 Fuji Electric Co Ltd 電子写真用感光体製造装置
US4849606A (en) * 1987-12-23 1989-07-18 S. C. Johnson & Son, Inc. Tamper-resistant container utilizing a flexible seal
JPH03170660A (ja) * 1989-11-29 1991-07-24 Mitsubishi Heavy Ind Ltd 昇華性物質真空蒸着装置
JPH04341564A (ja) * 1991-05-19 1992-11-27 Ulvac Japan Ltd 真空蒸着装置
US5377429A (en) * 1993-04-19 1995-01-03 Micron Semiconductor, Inc. Method and appartus for subliming precursors
US5803976A (en) * 1993-11-09 1998-09-08 Imperial Chemical Industries Plc Vacuum web coating
US5596673A (en) * 1994-11-18 1997-01-21 Xerox Corporation Evaporation crucible assembly

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US6237529B1 (en) 2001-05-29

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