DE60139008D1 - CVD-Verfahren - Google Patents

CVD-Verfahren

Info

Publication number
DE60139008D1
DE60139008D1 DE60139008T DE60139008T DE60139008D1 DE 60139008 D1 DE60139008 D1 DE 60139008D1 DE 60139008 T DE60139008 T DE 60139008T DE 60139008 T DE60139008 T DE 60139008T DE 60139008 D1 DE60139008 D1 DE 60139008D1
Authority
DE
Germany
Prior art keywords
cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60139008T
Other languages
English (en)
Inventor
Robert W Standley
Charles C Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SunEdison Inc
Original Assignee
SunEdison Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SunEdison Inc filed Critical SunEdison Inc
Application granted granted Critical
Publication of DE60139008D1 publication Critical patent/DE60139008D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/12—Substrate holders or susceptors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE60139008T 2000-05-08 2001-04-19 CVD-Verfahren Expired - Lifetime DE60139008D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/566,890 US6444027B1 (en) 2000-05-08 2000-05-08 Modified susceptor for use in chemical vapor deposition process
PCT/US2001/012668 WO2001086034A2 (en) 2000-05-08 2001-04-19 Modified susceptor for use in chemical vapor deposition process

Publications (1)

Publication Number Publication Date
DE60139008D1 true DE60139008D1 (de) 2009-07-30

Family

ID=24264828

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60139008T Expired - Lifetime DE60139008D1 (de) 2000-05-08 2001-04-19 CVD-Verfahren

Country Status (8)

Country Link
US (3) US6444027B1 (de)
EP (1) EP1287187B1 (de)
JP (1) JP4492840B2 (de)
KR (1) KR100784001B1 (de)
CN (1) CN1223709C (de)
DE (1) DE60139008D1 (de)
TW (1) TWI285936B (de)
WO (1) WO2001086034A2 (de)

Families Citing this family (121)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6113702A (en) * 1995-09-01 2000-09-05 Asm America, Inc. Wafer support system
US6183565B1 (en) * 1997-07-08 2001-02-06 Asm International N.V Method and apparatus for supporting a semiconductor wafer during processing
US6444027B1 (en) * 2000-05-08 2002-09-03 Memc Electronic Materials, Inc. Modified susceptor for use in chemical vapor deposition process
DE10027931C1 (de) * 2000-05-31 2002-01-10 Infineon Technologies Ag Verfahren zur rückseitigen elektrischen Kontaktierung eines Halbleitersubstrats während seiner Bearbeitung
US6599815B1 (en) * 2000-06-30 2003-07-29 Memc Electronic Materials, Inc. Method and apparatus for forming a silicon wafer with a denuded zone
US6822945B2 (en) 2000-11-08 2004-11-23 Genesys Telecommunications Laboratories, Inc. Method and apparatus for anticipating and planning communication-center resources based on evaluation of events waiting in a communication center master queue
US6576572B2 (en) * 2000-12-28 2003-06-10 Schott Lithotec Ag Method of heating a substrate using a variable surface hot plate for improved bake uniformity
DE10111761A1 (de) * 2001-03-12 2002-10-02 Infineon Technologies Ag Anordnung und Verfahren zum rückseitigen Kontaktieren eines Halbleitersubstrats
WO2003046966A1 (fr) * 2001-11-30 2003-06-05 Shin-Etsu Handotai Co., Ltd. Suscepteur, dispositif de croissance de phase gazeuse, dispositif et procede de fabrication de plaquette epitaxiale, et plaquette epitaxiale
JP2003229370A (ja) * 2001-11-30 2003-08-15 Shin Etsu Handotai Co Ltd サセプタ、気相成長装置、エピタキシャルウェーハの製造方法およびエピタキシャルウェーハ
JP4061062B2 (ja) * 2001-12-13 2008-03-12 ローム株式会社 半導体発光素子の製法および酸化炉
US20050000449A1 (en) * 2001-12-21 2005-01-06 Masayuki Ishibashi Susceptor for epitaxial growth and epitaxial growth method
JP2003197532A (ja) * 2001-12-21 2003-07-11 Sumitomo Mitsubishi Silicon Corp エピタキシャル成長方法及びエピタキシャル成長用サセプター
DE10211312A1 (de) 2002-03-14 2003-10-02 Wacker Siltronic Halbleitermat Verfahren und Vorrichtung zur epitaktischen Beschichtung einer Halbleiterscheibe sowie epitaktisch beschichtete Halbleiterscheibe
JP4089354B2 (ja) * 2002-08-30 2008-05-28 株式会社Ｓｕｍｃｏ エピタキシャルウェーハとその製造方法
JP4016823B2 (ja) * 2002-12-06 2007-12-05 信越半導体株式会社 シリコンエピタキシャルウェーハの製造方法
DE10261362B8 (de) * 2002-12-30 2008-08-28 Osram Opto Semiconductors Gmbh Substrat-Halter
US20060225642A1 (en) * 2003-03-31 2006-10-12 Yoshihiko Kanzawa Method of forming semiconductor crystal
US7064073B1 (en) * 2003-05-09 2006-06-20 Newport Fab, Llc Technique for reducing contaminants in fabrication of semiconductor wafers
JP4066881B2 (ja) * 2003-05-21 2008-03-26 信越半導体株式会社 表面処理方法、シリコンエピタキシャルウェーハの製造方法及びシリコンエピタキシャルウェーハ
DE10328842B4 (de) * 2003-06-26 2007-03-01 Siltronic Ag Suszeptor für eine chemische Gasphasenabscheidung, Verfahren zur Bearbeitung einer Halbleiterscheibe durch chemische Gasphasenabscheidung und nach dem Verfahren bearbeitete Halbleiterscheibe
JP4839836B2 (ja) * 2003-06-26 2011-12-21 信越半導体株式会社 シリコンエピタキシャルウェーハの製造方法
US7285483B2 (en) * 2003-06-26 2007-10-23 Silitronic Ag Coated semiconductor wafer, and process and apparatus for producing the semiconductor wafer
DE102004060625A1 (de) * 2004-12-16 2006-06-29 Siltronic Ag Beschichtete Halbleiterscheibe und Verfahren und Vorrichtung zur Herstellung der Halbleiterscheibe
KR20060060735A (ko) * 2003-10-01 2006-06-05 신에츠 한도타이 가부시키가이샤 실리콘 에피택셜 웨이퍼의 제조방법 및 실리콘 에피택셜웨이퍼
US7323058B2 (en) * 2004-01-26 2008-01-29 Applied Materials, Inc. Apparatus for electroless deposition of metals onto semiconductor substrates
US7654221B2 (en) * 2003-10-06 2010-02-02 Applied Materials, Inc. Apparatus for electroless deposition of metals onto semiconductor substrates
US7827930B2 (en) * 2004-01-26 2010-11-09 Applied Materials, Inc. Apparatus for electroless deposition of metals onto semiconductor substrates
US7166528B2 (en) 2003-10-10 2007-01-23 Applied Materials, Inc. Methods of selective deposition of heavily doped epitaxial SiGe
US7235139B2 (en) * 2003-10-28 2007-06-26 Veeco Instruments Inc. Wafer carrier for growing GaN wafers
DE10357698A1 (de) * 2003-12-09 2005-07-14 Schunk Kohlenstofftechnik Gmbh Träger für zu behandelnde Gegenstände sowie Verfahren zur Herstellung eines solchen
EP1719167B1 (de) * 2004-02-13 2011-10-26 ASM America, Inc. Substrathaltesystem zur reduzierten autodotierung und rückseiten-ablagerung
US20050193951A1 (en) * 2004-03-08 2005-09-08 Muneo Furuse Plasma processing apparatus
JP4636807B2 (ja) * 2004-03-18 2011-02-23 キヤノン株式会社 基板保持装置およびそれを用いた露光装置
WO2005093136A1 (ja) * 2004-03-29 2005-10-06 Cxe Japan Co., Ltd. 支持体並びに半導体基板の処理方法
US20050217585A1 (en) * 2004-04-01 2005-10-06 Blomiley Eric R Substrate susceptor for receiving a substrate to be deposited upon
US20050217569A1 (en) * 2004-04-01 2005-10-06 Nirmal Ramaswamy Methods of depositing an elemental silicon-comprising material over a semiconductor substrate and methods of cleaning an internal wall of a chamber
US20050223985A1 (en) * 2004-04-08 2005-10-13 Blomiley Eric R Deposition apparatuses, methods of assessing the temperature of semiconductor wafer substrates within deposition apparatuses, and methods for deposition of epitaxial semiconductive material
US20050223993A1 (en) * 2004-04-08 2005-10-13 Blomiley Eric R Deposition apparatuses; methods for assessing alignments of substrates within deposition apparatuses; and methods for assessing thicknesses of deposited layers within deposition apparatuses
JP2005333090A (ja) * 2004-05-21 2005-12-02 Sumco Corp Ｐ型シリコンウェーハおよびその熱処理方法
JP2006040972A (ja) * 2004-07-22 2006-02-09 Shin Etsu Handotai Co Ltd シリコンエピタキシャルウェーハおよびその製造方法
JP4304720B2 (ja) * 2004-07-30 2009-07-29 信越半導体株式会社 サセプタ、気相成長装置、エピタキシャルウェーハの製造方法およびエピタキシャルウェーハ
US7250358B2 (en) * 2004-08-06 2007-07-31 Globitech Incorporated Wafer for preventing the formation of silicon nodules and method for preventing the formation of silicon nodules
KR100678468B1 (ko) * 2005-01-14 2007-02-02 삼성전자주식회사 반도체 기판의 인-시츄 세정방법 및 이를 채택하는 반도체소자의 제조방법
US7198677B2 (en) * 2005-03-09 2007-04-03 Wafermasters, Inc. Low temperature wafer backside cleaning
US7462246B2 (en) * 2005-04-15 2008-12-09 Memc Electronic Materials, Inc. Modified susceptor for barrel reactor
US7474114B2 (en) * 2005-09-08 2009-01-06 Sitronic Corporation System and method for characterizing silicon wafers
KR100794719B1 (ko) * 2005-11-02 2008-01-15 주식회사 실트론 화학 기상 증착 장치용 서셉터
US7485928B2 (en) * 2005-11-09 2009-02-03 Memc Electronic Materials, Inc. Arsenic and phosphorus doped silicon wafer substrates having intrinsic gettering
TWI354320B (en) * 2006-02-21 2011-12-11 Nuflare Technology Inc Vopor phase deposition apparatus and support table
US7566951B2 (en) 2006-04-21 2009-07-28 Memc Electronic Materials, Inc. Silicon structures with improved resistance to radiation events
US20070282471A1 (en) * 2006-06-01 2007-12-06 Integrated System Solution Corp. Bluetooth audio chip with multiple input/output sources
CN100392815C (zh) * 2006-06-02 2008-06-04 河北工业大学 能消除硅气相外延层中滑移线与高应力区的装置
US8951351B2 (en) * 2006-09-15 2015-02-10 Applied Materials, Inc. Wafer processing hardware for epitaxial deposition with reduced backside deposition and defects
US8852349B2 (en) * 2006-09-15 2014-10-07 Applied Materials, Inc. Wafer processing hardware for epitaxial deposition with reduced auto-doping and backside defects
DE102006055038B4 (de) * 2006-11-22 2012-12-27 Siltronic Ag Epitaxierte Halbleiterscheibe sowie Vorrichtung und Verfahren zur Herstellung einer epitaxierten Halbleiterscheibe
CN101241854B (zh) * 2007-02-06 2011-06-01 中芯国际集成电路制造(上海)有限公司 一种晶圆生产工艺
US8083963B2 (en) * 2007-02-08 2011-12-27 Applied Materials, Inc. Removal of process residues on the backside of a substrate
US7605054B2 (en) * 2007-04-18 2009-10-20 S.O.I.Tec Silicon On Insulator Technologies Method of forming a device wafer with recyclable support
US20080314319A1 (en) * 2007-06-19 2008-12-25 Memc Electronic Materials, Inc. Susceptor for improving throughput and reducing wafer damage
DE102008010041A1 (de) * 2007-09-28 2009-04-02 Osram Opto Semiconductors Gmbh Schichtabscheidevorrichtung und Verfahren zu deren Betrieb
US20090165721A1 (en) * 2007-12-27 2009-07-02 Memc Electronic Materials, Inc. Susceptor with Support Bosses
US8404049B2 (en) * 2007-12-27 2013-03-26 Memc Electronic Materials, Inc. Epitaxial barrel susceptor having improved thickness uniformity
JP5396737B2 (ja) * 2008-04-04 2014-01-22 株式会社Ｓｕｍｃｏ エピタキシャルシリコンウェーハ及びその製造方法
US20090280248A1 (en) * 2008-05-06 2009-11-12 Asm America, Inc. Porous substrate holder with thinned portions
DE102008023054B4 (de) * 2008-05-09 2011-12-22 Siltronic Ag Verfahren zur Herstellung einer epitaxierten Halbleiterscheibe
JP5380912B2 (ja) * 2008-06-10 2014-01-08 株式会社Ｓｕｍｃｏ 膜厚測定方法、エピタキシャルウェーハの製造方法、および、エピタキシャルウェーハ
CN103787336B (zh) 2008-09-16 2016-09-14 储晞 生产高纯颗粒硅的方法
JP2010098284A (ja) * 2008-09-19 2010-04-30 Covalent Materials Corp エピタキシャル基板用シリコンウェハの製造方法及びエピタキシャル基板の製造方法
JP5271648B2 (ja) * 2008-09-22 2013-08-21 株式会社ニューフレアテクノロジー 半導体製造方法および半導体製造装置
US20100098519A1 (en) * 2008-10-17 2010-04-22 Memc Electronic Materials, Inc. Support for a semiconductor wafer in a high temperature environment
KR101543273B1 (ko) 2008-10-27 2015-08-12 주성엔지니어링(주) 기판처리장치
US8151852B2 (en) 2009-06-30 2012-04-10 Twin Creeks Technologies, Inc. Bonding apparatus and method
JP5795461B2 (ja) * 2009-08-19 2015-10-14 株式会社Sumco エピタキシャルシリコンウェーハの製造方法
US9127364B2 (en) * 2009-10-28 2015-09-08 Alta Devices, Inc. Reactor clean
JP5544859B2 (ja) * 2009-12-15 2014-07-09 信越半導体株式会社 シリコンエピタキシャルウェーハの製造方法
KR101125739B1 (ko) * 2010-02-03 2012-03-27 주식회사 엘지실트론 반도체 제조용 서셉터
US9650726B2 (en) 2010-02-26 2017-05-16 Applied Materials, Inc. Methods and apparatus for deposition processes
US9181619B2 (en) * 2010-02-26 2015-11-10 Fujifilm Corporation Physical vapor deposition with heat diffuser
US20110239933A1 (en) * 2010-04-01 2011-10-06 Bernhard Freudenberg Device and method for the production of silicon blocks
US9570328B2 (en) 2010-06-30 2017-02-14 Applied Materials, Inc. Substrate support for use with multi-zonal heating sources
US8535445B2 (en) * 2010-08-13 2013-09-17 Veeco Instruments Inc. Enhanced wafer carrier
KR20120071695A (ko) * 2010-12-23 2012-07-03 삼성엘이디 주식회사 화학 기상 증착 장치용 서셉터, 화학 기상 증착 장치 및 화학 기상 증착 장치를 이용한 기판의 가열 방법
US10167554B2 (en) * 2010-12-30 2019-01-01 Veeco Instruments Inc. Wafer processing with carrier extension
KR101238841B1 (ko) * 2011-01-04 2013-03-04 주식회사 엘지실트론 화학 기상 증착 장치용 서셉터 및 이를 갖는 화학 기상 증착 장치
WO2012102755A1 (en) * 2011-01-28 2012-08-02 Applied Materials, Inc. Carbon addition for low resistivity in situ doped silicon epitaxy
CN102851735B (zh) * 2011-06-28 2015-08-19 上海华虹宏力半导体制造有限公司 化学气相淀积硅外延生长方法
JP5780062B2 (ja) * 2011-08-30 2015-09-16 東京エレクトロン株式会社 基板処理装置及び成膜装置
CN102412271A (zh) * 2011-09-15 2012-04-11 上海晶盟硅材料有限公司 外延片衬底、外延片及半导体器件
US8940094B2 (en) 2012-04-10 2015-01-27 Sunedison Semiconductor Limited Methods for fabricating a semiconductor wafer processing device
US9401271B2 (en) 2012-04-19 2016-07-26 Sunedison Semiconductor Limited (Uen201334164H) Susceptor assemblies for supporting wafers in a reactor apparatus
US9870919B2 (en) 2012-04-25 2018-01-16 Applied Materials, Inc. Process chamber having separate process gas and purge gas regions
JP5845143B2 (ja) * 2012-06-29 2016-01-20 株式会社Sumco エピタキシャルシリコンウェーハの製造方法、および、エピタキシャルシリコンウェーハ
US11326255B2 (en) * 2013-02-07 2022-05-10 Uchicago Argonne, Llc ALD reactor for coating porous substrates
CN105164309B (zh) * 2013-05-01 2019-04-12 应用材料公司 用于控制外延沉积腔室流量的注入及排放设计
SG11201606084RA (en) 2014-01-27 2016-08-30 Veeco Instr Inc Wafer carrier having retention pockets with compound radii for chemical vapor deposition systems
CN204434500U (zh) * 2015-03-05 2015-07-01 京东方科技集团股份有限公司 一种蒸镀载板及蒸镀装置
WO2016154052A1 (en) 2015-03-25 2016-09-29 Applied Materials, Inc. Chamber components for epitaxial growth apparatus
JP6447351B2 (ja) * 2015-05-08 2019-01-09 株式会社Sumco シリコンエピタキシャルウェーハの製造方法およびシリコンエピタキシャルウェーハ
US10184193B2 (en) 2015-05-18 2019-01-22 Globalwafers Co., Ltd. Epitaxy reactor and susceptor system for improved epitaxial wafer flatness
US20160342147A1 (en) 2015-05-19 2016-11-24 Applied Materials, Inc. Methods and systems for applying run-to-run control and virtual metrology to reduce equipment recovery time
DE102016210203B3 (de) 2016-06-09 2017-08-31 Siltronic Ag Suszeptor zum Halten einer Halbleiterscheibe, Verfahren zum Abscheiden einer epitaktischen Schicht auf einer Vorderseite einer Halbleiterscheibe und Halbleiterscheibe mit epitaktischer Schicht
CN107546101A (zh) * 2016-06-23 2018-01-05 上海新昇半导体科技有限公司 一种外延生长方法
US20180102247A1 (en) * 2016-10-06 2018-04-12 Asm Ip Holding B.V. Substrate processing apparatus and method of manufacturing semiconductor device
CN108728898A (zh) * 2017-04-24 2018-11-02 上海新昇半导体科技有限公司 一种外延炉硅片基座
CN109811406B (zh) * 2017-11-20 2021-09-17 北京北方华创微电子装备有限公司 石英件、工艺腔室和半导体处理设备
US10991617B2 (en) * 2018-05-15 2021-04-27 Applied Materials, Inc. Methods and apparatus for cleaving of semiconductor substrates
JP7321768B2 (ja) * 2018-05-23 2023-08-07 信越化学工業株式会社 化学気相成長装置および被膜形成方法
JP6998839B2 (ja) * 2018-06-25 2022-01-18 グローバルウェーハズ・ジャパン株式会社 エピタキシャルシリコンウェーハの製造方法
KR102620219B1 (ko) * 2018-11-02 2024-01-02 삼성전자주식회사 기판 처리 방법 및 기판 처리 장치
CN111286723A (zh) * 2018-12-10 2020-06-16 昭和电工株式会社 基座和化学气相沉积装置
CN112309950B (zh) * 2019-07-26 2023-01-17 上海宏轶电子科技有限公司 一种晶圆清洗机用机台
US11111578B1 (en) 2020-02-13 2021-09-07 Uchicago Argonne, Llc Atomic layer deposition of fluoride thin films
CN111599746B (zh) * 2020-07-27 2020-10-30 西安奕斯伟硅片技术有限公司 一种用于晶片的外延生长的基座、装置及方法
US20220157602A1 (en) * 2020-11-18 2022-05-19 Applied Materials, Inc. Silicon oxide gap fill using capacitively coupled plasmas
KR102582346B1 (ko) * 2021-03-30 2023-09-25 에스케이실트론 주식회사 웨이퍼의 에피택셜층 성장 방법
US20220352006A1 (en) * 2021-04-30 2022-11-03 Asm Ip Holding B.V. Susceptors with film deposition control features
CN117256046A (zh) * 2021-05-12 2023-12-19 应用材料公司 低质量基板支撑件
CN113529165A (zh) * 2021-07-21 2021-10-22 青岛佳恩半导体有限公司 一种超薄衬底外延生长装置及制备方法
US11901169B2 (en) 2022-02-14 2024-02-13 Uchicago Argonne, Llc Barrier coatings
US20240145230A1 (en) * 2022-10-28 2024-05-02 Applied Materials, Inc. Semiconductor cleaning using plasma-free precursors

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4496609A (en) 1969-10-15 1985-01-29 Applied Materials, Inc. Chemical vapor deposition coating process employing radiant heat and a susceptor
US4322592A (en) 1980-08-22 1982-03-30 Rca Corporation Susceptor for heating semiconductor substrates
JPS58130518A (ja) 1982-01-29 1983-08-04 Toshiba Corp 気相成長方法
US5242501A (en) 1982-09-10 1993-09-07 Lam Research Corporation Susceptor in chemical vapor deposition reactors
NL8602357A (nl) 1985-10-07 1987-05-04 Epsilon Ltd Partnership Inrichting en werkwijze voor het chemisch uit damp neerslaan met gebruik van een axiaal symmetrische gasstroming.
US5200157A (en) 1986-02-17 1993-04-06 Toshiba Ceramics Co., Ltd. Susceptor for vapor-growth deposition
US5177878A (en) 1989-05-08 1993-01-12 U.S. Philips Corporation Apparatus and method for treating flat substrate under reduced pressure in the manufacture of electronic devices
DE3915039A1 (de) * 1989-05-08 1990-11-15 Balzers Hochvakuum Hubtisch
US5133284A (en) 1990-07-16 1992-07-28 National Semiconductor Corp. Gas-based backside protection during substrate processing
US5192371A (en) 1991-05-21 1993-03-09 Asm Japan K.K. Substrate supporting apparatus for a CVD apparatus
JP2921306B2 (ja) 1992-11-20 1999-07-19 株式会社村田製作所 コイル部品及びその製造方法
US5800686A (en) * 1993-04-05 1998-09-01 Applied Materials, Inc. Chemical vapor deposition chamber with substrate edge protection
JPH088198A (ja) 1994-06-21 1996-01-12 Sumitomo Sitix Corp 気相成長装置用サセプター
JPH0897159A (ja) 1994-09-29 1996-04-12 Handotai Process Kenkyusho:Kk エピタキシャル成長方法および成長装置
JPH08236462A (ja) 1995-03-01 1996-09-13 Shin Etsu Handotai Co Ltd 気相成長方法
JP3725598B2 (ja) 1996-01-12 2005-12-14 東芝セラミックス株式会社 エピタキシャルウェハの製造方法
JP3467960B2 (ja) 1996-02-29 2003-11-17 信越半導体株式会社 半導体単結晶薄膜の製造方法および装置
US5960555A (en) 1996-07-24 1999-10-05 Applied Materials, Inc. Method and apparatus for purging the back side of a substrate during chemical vapor processing
JPH10144697A (ja) 1996-11-06 1998-05-29 Toshiba Ceramics Co Ltd シリコンウエーハ及びその製造方法
JP3336897B2 (ja) 1997-02-07 2002-10-21 三菱住友シリコン株式会社 気相成長装置用サセプター
JPH1116844A (ja) 1997-06-23 1999-01-22 Sumitomo Metal Ind Ltd エピタキシャルシリコンウェーハの製造方法と素材用ウェーハ
JPH11116844A (ja) 1997-08-09 1999-04-27 Elegant:Kk アルミニウム及びアルミニウム合金用充填被覆材、これを用いたアルミニウム及びアルミニウム合金の被覆構造、接着構造及び成形体
JPH1187250A (ja) 1997-09-01 1999-03-30 Inotetsuku Kk 気相成長装置
US6596086B1 (en) 1998-04-28 2003-07-22 Shin-Etsu Handotai Co., Ltd. Apparatus for thin film growth
US6127286A (en) * 1998-05-11 2000-10-03 Lsi Logic Corporation Apparatus and process for deposition of thin film on semiconductor substrate while inhibiting particle formation and deposition
EP1125008B1 (de) 1998-10-14 2003-06-18 MEMC Electronic Materials, Inc. Wärmegetempertes einkristallines silizium mit niedriger fehlerdichte
JP3671418B2 (ja) 1998-10-29 2005-07-13 信越半導体株式会社 半導体ウェーハの製造方法
US6284384B1 (en) 1998-12-09 2001-09-04 Memc Electronic Materials, Inc. Epitaxial silicon wafer with intrinsic gettering
US6184154B1 (en) 1999-10-13 2001-02-06 Seh America, Inc. Method of processing the backside of a wafer within an epitaxial reactor chamber
US6444027B1 (en) * 2000-05-08 2002-09-03 Memc Electronic Materials, Inc. Modified susceptor for use in chemical vapor deposition process

Also Published As

Publication number Publication date
EP1287187A2 (de) 2003-03-05
CN1223709C (zh) 2005-10-19
TWI285936B (en) 2007-08-21
WO2001086034B1 (en) 2002-05-10
US6652650B2 (en) 2003-11-25
JP2004522294A (ja) 2004-07-22
US20010037761A1 (en) 2001-11-08
US6444027B1 (en) 2002-09-03
KR100784001B1 (ko) 2007-12-07
EP1287187B1 (de) 2009-06-17
WO2001086034A3 (en) 2002-02-21
US20030041799A1 (en) 2003-03-06
KR20030086220A (ko) 2003-11-07
US6596095B2 (en) 2003-07-22
JP4492840B2 (ja) 2010-06-30
WO2001086034A2 (en) 2001-11-15
CN1434884A (zh) 2003-08-06

Similar Documents

Publication Publication Date Title
DE60139008D1 (de) CVD-Verfahren
ATE290000T1 (de) Muscarinagonisten
ATE252099T1 (de) Biarylcarboxamide
DE10136334B8 (de) Hochgeschwindigkeitsvertikalresonatoroberflächenemissionslaser
ATE312098T1 (de) Thiazinoxazolidinon
ATA2932001A (de) Schneefräse
DE50102988D1 (de) Bodenwischer
DE50100710D1 (de) Wischblatt
ATE262530T1 (de) Indolochinazolinone
ATE298751T1 (de) 7-oxopyridoryrimidine
DE1274523T1 (de) Hochdruckumformspülanlage
DE10192638T1 (de) Bohrstangenladevorrichtung
DE60114073D1 (de) Durchblasgasabscheider
AR028336A1 (es) 4-hidroxi-tetrahidropiridonas fenilsubstituidas
ATE509008T1 (de) Sulfonylguanidine
DE10196064T1 (de) Halbleiterfotodektionsgerät
DE50100817D1 (de) Kugelgelenk
DE50011511D1 (de) Blowby-Heizung
AR028061A1 (es) 2-enamino-cetonitrilos fenil-substituidos
NO20014381D0 (no) Karotenoidestere
ATE476423T1 (de) Benzoylpyridazine
DE10052925B4 (de) Schaukelbett
DE10085445T1 (de) Drahterodierbearbeitungseinrichtung
DE10195909T1 (de) Viehfüttervorrichtung
AR027982A1 (es) Aril- y heteroarilsulfonatos

Legal Events

Date Code Title Description
8364 No opposition during term of opposition