DE3886067D1 - Spiegel für Excimer-Laser und Excimer-Laservorrichtung unter Verwendung des Spiegels. - Google Patents
Spiegel für Excimer-Laser und Excimer-Laservorrichtung unter Verwendung des Spiegels.Info
- Publication number
- DE3886067D1 DE3886067D1 DE88102823T DE3886067T DE3886067D1 DE 3886067 D1 DE3886067 D1 DE 3886067D1 DE 88102823 T DE88102823 T DE 88102823T DE 3886067 T DE3886067 T DE 3886067T DE 3886067 D1 DE3886067 D1 DE 3886067D1
- Authority
- DE
- Germany
- Prior art keywords
- mirror
- excimer laser
- laser device
- excimer
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
- G02B5/0858—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62043328A JP2629693B2 (ja) | 1987-02-26 | 1987-02-26 | エキシマレーザ用ミラー |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3886067D1 true DE3886067D1 (de) | 1994-01-20 |
DE3886067T2 DE3886067T2 (de) | 1994-06-30 |
Family
ID=12660757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3886067T Expired - Fee Related DE3886067T2 (de) | 1987-02-26 | 1988-02-25 | Spiegel für Excimer-Laser und Excimer-Laservorrichtung unter Verwendung des Spiegels. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4856019A (de) |
EP (1) | EP0280299B1 (de) |
JP (1) | JP2629693B2 (de) |
DE (1) | DE3886067T2 (de) |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2719367B2 (ja) * | 1988-10-31 | 1998-02-25 | ホーヤ株式会社 | 多層膜表面反射鏡 |
JP2620712B2 (ja) * | 1988-11-08 | 1997-06-18 | 株式会社 トプコン | 2波長反射防止多層膜 |
US4960310A (en) * | 1989-08-04 | 1990-10-02 | Optical Corporation Of America | Broad band nonreflective neutral density filter |
US5127018A (en) * | 1989-08-08 | 1992-06-30 | Nec Corporation | Helium-neon laser tube with multilayer dielectric coating mirrors |
FR2661784B1 (fr) * | 1990-05-02 | 1992-07-03 | Thomson Csf | Laser de puissance a miroir actif. |
JPH0416401U (de) * | 1990-05-28 | 1992-02-10 | ||
US5103454A (en) * | 1991-03-07 | 1992-04-07 | Lumonics Inc. | Light beam attenuation |
EP0635142A1 (de) * | 1992-04-09 | 1995-01-25 | Daimler-Benz Aerospace Aktiengesellschaft | Lasersystem mit mikromechanisch bewegten spiegel |
US5572543A (en) * | 1992-04-09 | 1996-11-05 | Deutsch Aerospace Ag | Laser system with a micro-mechanically moved mirror |
JPH0697570A (ja) * | 1992-09-14 | 1994-04-08 | Matsushita Electric Ind Co Ltd | 半導体レーザー素子端面の反射鏡およびその製造方法 |
US5274661A (en) * | 1992-12-07 | 1993-12-28 | Spectra Physics Lasers, Inc. | Thin film dielectric coating for laser resonator |
WO1994019709A1 (en) * | 1993-02-19 | 1994-09-01 | Photran Corporation | A light attenuating anti-reflection coating including electrically conductive layers |
US5408489A (en) * | 1993-03-19 | 1995-04-18 | Balzers Aktiengesellschaft | Optical layer for excimer laser |
US5323416A (en) * | 1993-08-20 | 1994-06-21 | Bell Communications Research, Inc. | Planarized interference mirror |
FR2712990B1 (fr) * | 1993-11-22 | 1996-04-05 | Commissariat Energie Atomique | Miroir à large bande et à haute réflectivité et procédé de réalisation d'un tel miroir. |
FR2712991B1 (fr) * | 1993-11-22 | 1996-01-12 | Commissariat Energie Atomique | Miroir à forte réflectivité et à large bande et procédé correspondant. |
JP3739107B2 (ja) * | 1995-04-26 | 2006-01-25 | シャープ株式会社 | 誘電体多層反射膜 |
CH690080A5 (de) * | 1995-09-12 | 2000-04-14 | Alusuisse Lonza Services Ag | Aluminium-Reflektor mit reflexionserhöhendem Schichtverbund. |
JPH09258006A (ja) * | 1996-03-22 | 1997-10-03 | Canon Inc | 反射防止膜及びそれを施した光学系 |
US5850309A (en) * | 1996-03-27 | 1998-12-15 | Nikon Corporation | Mirror for high-intensity ultraviolet light beam |
US5701326A (en) * | 1996-04-16 | 1997-12-23 | Loral Vought Systems Corporation | Laser scanning system with optical transmit/reflect mirror having reduced received signal loss |
FR2750216B1 (fr) * | 1996-06-21 | 1998-07-24 | Commissariat Energie Atomique | Empilement multicouche de materiaux fluorures, utilisable en optique et son procede de fabrication |
US6809421B1 (en) * | 1996-12-02 | 2004-10-26 | Kabushiki Kaisha Toshiba | Multichip semiconductor device, chip therefor and method of formation thereof |
US5967974A (en) * | 1997-05-02 | 1999-10-19 | United States Surgical Corporation | Surgical retractor |
US6124912A (en) * | 1997-06-09 | 2000-09-26 | National Semiconductor Corporation | Reflectance enhancing thin film stack in which pairs of dielectric layers are on a reflector and liquid crystal is on the dielectric layers |
JPH11311704A (ja) * | 1998-02-26 | 1999-11-09 | Nikon Corp | 紫外光用ミラー |
GB2352050A (en) * | 1999-07-13 | 2001-01-17 | Coherent Optics | Interference filters |
JP3751772B2 (ja) * | 1999-08-16 | 2006-03-01 | 日本電気株式会社 | 半導体薄膜製造装置 |
US7006546B2 (en) * | 2000-03-15 | 2006-02-28 | Komatsu Ltd. | Gas laser electrode, laser chamber employing the electrode, and gas laser device |
GB2371562A (en) * | 2001-01-26 | 2002-07-31 | Gen Electric Co Plc | Coated reflector for a lamp |
DE10136507A1 (de) | 2001-07-17 | 2003-04-03 | Zeiss Carl | Geometrischer Strahlteiler und Verfahren zu seiner Herstellung |
DE10240598A1 (de) * | 2002-08-27 | 2004-03-25 | Carl Zeiss Smt Ag | Optisches Abbildungssystem, insbesondere katadioptrisches Reduktionsobjektiv |
DE10248707A1 (de) * | 2002-10-18 | 2004-05-13 | Tuilaser Ag | Excimerlaser-Spiegel zur gezielten Reflexion unterschiedlicher Wellenlängen |
JP2005017543A (ja) * | 2003-06-25 | 2005-01-20 | Nikon Corp | 紫外線レーザ光用ミラー及び光学系及び投影露光装置 |
US7405808B2 (en) * | 2003-12-19 | 2008-07-29 | Carl Zeiss Smt Ag | Optical system, in particular illumination system, of a microlithographic projection exposure apparatus |
JP4785389B2 (ja) * | 2005-02-10 | 2011-10-05 | キヤノン株式会社 | 反射ミラー、露光装置及びデバイス製造方法 |
DE102006030757A1 (de) * | 2005-07-18 | 2007-02-01 | Carl Zeiss Smt Ag | Polarisationsoptimiertes Beleuchtungssystem |
JP2007156264A (ja) * | 2005-12-07 | 2007-06-21 | Ricoh Co Ltd | 高精度耐熱性ミラー及びその製造方法 |
JP2007193060A (ja) * | 2006-01-19 | 2007-08-02 | Shimadzu Corp | 固体レーザ用ミラー |
JP5473200B2 (ja) * | 2006-11-21 | 2014-04-16 | 村原 正隆 | 光学部品の接着方法および素子製作装置 |
DE102007054731A1 (de) * | 2007-11-14 | 2009-05-20 | Carl Zeiss Smt Ag | Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit |
DE102011054837A1 (de) | 2011-10-26 | 2013-05-02 | Carl Zeiss Laser Optics Gmbh | Optisches Element |
JP5962317B2 (ja) * | 2012-08-07 | 2016-08-03 | 株式会社島津製作所 | 回折格子及び光パルス圧縮器 |
JP6149218B2 (ja) * | 2013-06-19 | 2017-06-21 | 東海光学株式会社 | 誘電体多層膜の設計方法及び同方法で作製される光学素子 |
GB201400264D0 (en) * | 2014-01-08 | 2014-02-26 | Element Six Ltd | Synthetic diamond optical mirrors |
US9611999B2 (en) * | 2014-07-21 | 2017-04-04 | GE Lighting Solutions, LLC | Reflecting apparatus including enhanced aluminum optical coatings |
JPWO2017057233A1 (ja) * | 2015-09-30 | 2018-07-19 | 株式会社ニコン | 光学部材、チャンバ、及び光源装置 |
DE102018211499A1 (de) * | 2018-07-11 | 2020-01-16 | Carl Zeiss Smt Gmbh | Reflektives optisches Element und Verfahren zum Herstellen eines reflektiven optischen Elements |
DE102019120284A1 (de) * | 2018-08-08 | 2020-02-13 | Schott Ag | Spiegel sowie Spiegelträger mit hohem Aspektverhältnis sowie Verfahren und Mittel zur Herstellung eines solchen Spiegelträgers |
CN115373054A (zh) * | 2021-05-21 | 2022-11-22 | 手持产品公司 | 为光学部件提供光学涂层的方法、设备和系统 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3781712A (en) * | 1972-10-17 | 1973-12-25 | Hughes Aircraft Co | Gas laser with discharge conditioning using ultraviolet photons generated in high current density preliminary discharge |
GB1499684A (en) * | 1974-06-20 | 1978-02-01 | Westinghouse Electric Corp | High power laser mirror |
US4023119A (en) * | 1976-04-29 | 1977-05-10 | University Of Illinois Foundation | Laser output coupler |
NL7606693A (nl) * | 1976-06-21 | 1977-12-23 | Philips Nv | Gasontladingslaser en weergmefinrichting voor het uitlezen van informatie voorzien van een dergelijke gasontladingslaser. |
US4147409A (en) * | 1976-11-22 | 1979-04-03 | Optical Coating Laboratory, Inc. | Laser reflector with reduced electric field intensity |
US4189205A (en) * | 1978-02-21 | 1980-02-19 | Infrared Industries, Inc. | Coated copper reflector |
JPS5652701U (de) * | 1979-09-27 | 1981-05-09 | ||
JPS5689703A (en) * | 1979-12-24 | 1981-07-21 | Agency Of Ind Science & Technol | Manufacture of reflecting mirror for high output laser |
JPS6037631B2 (ja) * | 1981-06-08 | 1985-08-27 | 株式会社東芝 | アルゴン・イオン・レ−ザ装置 |
JPS5987404A (ja) * | 1982-11-12 | 1984-05-21 | Hitachi Ltd | レ−ザ装置用ミラ− |
US4713824A (en) * | 1983-02-11 | 1987-12-15 | Allied Corporation | Noble-metal overcoated, front-surface silver reflectors |
SU1125589A1 (ru) * | 1983-02-21 | 1984-11-23 | Ленинградский Ордена Трудового Красного Знамени Институт Точной Механики И Оптики | Антиотражательный интерференционный светофильтр |
JPS59195205A (ja) * | 1983-04-19 | 1984-11-06 | Minolta Camera Co Ltd | 多層膜ミラ− |
JPS6066202A (ja) * | 1983-09-20 | 1985-04-16 | Agency Of Ind Science & Technol | レ−ザ用反射鏡 |
US4710426A (en) * | 1983-11-28 | 1987-12-01 | Polaroid Corporation, Patent Dept. | Solar radiation-control articles with protective overlayer |
JPS60181704A (ja) * | 1984-02-29 | 1985-09-17 | Canon Inc | 真空紫外用反射ミラー |
JPS6113202A (ja) * | 1984-06-29 | 1986-01-21 | Nec Corp | レ−ザミラ− |
JPS61185986A (ja) * | 1985-02-13 | 1986-08-19 | Nec Corp | レ−ザ用反射鏡 |
US4746202A (en) * | 1985-07-11 | 1988-05-24 | Coherent, Inc. | Polarization preserving reflector and method |
US4686684A (en) * | 1985-08-09 | 1987-08-11 | United Technologies Corporation | Buried laser mirror with a multicomponent reflective interlayer |
JPS62254105A (ja) * | 1986-04-26 | 1987-11-05 | Komatsu Ltd | 反射鏡 |
JPS6363002A (ja) * | 1986-09-04 | 1988-03-19 | Nikon Corp | レ−ザ用反射鏡 |
-
1987
- 1987-02-26 JP JP62043328A patent/JP2629693B2/ja not_active Expired - Lifetime
-
1988
- 1988-02-25 EP EP88102823A patent/EP0280299B1/de not_active Expired - Lifetime
- 1988-02-25 US US07/160,460 patent/US4856019A/en not_active Expired - Lifetime
- 1988-02-25 DE DE3886067T patent/DE3886067T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US4856019A (en) | 1989-08-08 |
EP0280299A2 (de) | 1988-08-31 |
EP0280299A3 (en) | 1989-07-26 |
JPS63208801A (ja) | 1988-08-30 |
EP0280299B1 (de) | 1993-12-08 |
JP2629693B2 (ja) | 1997-07-09 |
DE3886067T2 (de) | 1994-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |