DE69834925D1 - Pulsenergiesteuerung für excimer-laser - Google Patents

Pulsenergiesteuerung für excimer-laser

Info

Publication number
DE69834925D1
DE69834925D1 DE69834925T DE69834925T DE69834925D1 DE 69834925 D1 DE69834925 D1 DE 69834925D1 DE 69834925 T DE69834925 T DE 69834925T DE 69834925 T DE69834925 T DE 69834925T DE 69834925 D1 DE69834925 D1 DE 69834925D1
Authority
DE
Germany
Prior art keywords
engine control
excimer laser
pulse engine
pulse
excimer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69834925T
Other languages
English (en)
Other versions
DE69834925T2 (de
Inventor
L Sandstrom
A Besaucele
Igor V Fomenkov
P Das
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/947,474 external-priority patent/US5982800A/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of DE69834925D1 publication Critical patent/DE69834925D1/de
Application granted granted Critical
Publication of DE69834925T2 publication Critical patent/DE69834925T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2256—KrF, i.e. krypton fluoride is comprised for lasing around 248 nm

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69834925T 1997-10-10 1998-09-01 Pulsenergiesteuerung für excimer-laser Expired - Lifetime DE69834925T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US34870 1993-03-19
US08/947,474 US5982800A (en) 1997-04-23 1997-10-10 Narrow band excimer laser
US947474 1997-10-10
US09/034,870 US6005879A (en) 1997-04-23 1998-03-04 Pulse energy control for excimer laser
PCT/US1998/018138 WO1999019950A1 (en) 1997-10-10 1998-09-01 Pulse energy control for excimer laser

Publications (2)

Publication Number Publication Date
DE69834925D1 true DE69834925D1 (de) 2006-07-27
DE69834925T2 DE69834925T2 (de) 2006-10-05

Family

ID=26711497

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69834925T Expired - Lifetime DE69834925T2 (de) 1997-10-10 1998-09-01 Pulsenergiesteuerung für excimer-laser

Country Status (6)

Country Link
EP (1) EP1019992B1 (de)
JP (1) JP3184160B2 (de)
AU (1) AU9297598A (de)
DE (1) DE69834925T2 (de)
TW (1) TW388145B (de)
WO (1) WO1999019950A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6882674B2 (en) * 1999-12-27 2005-04-19 Cymer, Inc. Four KHz gas discharge laser system
JP5253830B2 (ja) * 2008-02-04 2013-07-31 ギガフォトン株式会社 レーザ装置の故障診断システム
EP2351170A4 (de) * 2008-10-21 2013-04-10 Cymer Inc Verfahren und vorrichtung zur lasersteuerung bei einem zweikammern-gasentladungslaser
US10627724B2 (en) 2015-09-23 2020-04-21 Asml Netherlands B.V. Lithographic apparatus and method
JP6845255B2 (ja) * 2016-12-05 2021-03-17 ギガフォトン株式会社 レーザ装置
US10096969B1 (en) * 2017-09-14 2018-10-09 Cymer, Llc Method for dither free adaptive and robust dose control for photolithography
CN109638629B (zh) * 2019-02-19 2020-02-14 北京科益虹源光电技术有限公司 一种准分子激光脉冲能量稳定性控制方法及系统
CN109950786B (zh) * 2019-03-29 2024-04-19 北京科益虹源光电技术有限公司 准分子激光器剂量稳定控制系统及控制方法
CN117543323A (zh) * 2022-12-27 2024-02-09 北京科益虹源光电技术有限公司 激光器的周期同步控制方法、设备及双腔准分子激光器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5463650A (en) * 1992-07-17 1995-10-31 Kabushiki Kaisha Komatsu Seisakusho Apparatus for controlling output of an excimer laser device
US5729563A (en) * 1994-07-07 1998-03-17 Hewlett-Packard Company Method and apparatus for optically and thermally isolating surface emitting laser diodes

Also Published As

Publication number Publication date
JP3184160B2 (ja) 2001-07-09
AU9297598A (en) 1999-05-03
WO1999019950A8 (en) 1999-06-24
EP1019992A4 (de) 2005-09-21
WO1999019950A1 (en) 1999-04-22
EP1019992B1 (de) 2006-06-14
JPH11191653A (ja) 1999-07-13
DE69834925T2 (de) 2006-10-05
EP1019992A1 (de) 2000-07-19
TW388145B (en) 2000-04-21

Similar Documents

Publication Publication Date Title
DE69825609D1 (de) Schmalbandiger excimer-laser mit gaszusatz
DE69940693D1 (de) Pulssteuerung in lasersystemen
DE59503722D1 (de) Entladungsanordnung für impulsgaslaser
DE69737344D1 (de) Pulsbreitenregler
EP1110282A4 (de) Excimerlaser mit pulsvervielfacher
DE69638243D1 (de) Schneidkopf für Bohrer
DE69511295T2 (de) Motorregelung
DE69939105D1 (de) MODULARER, SCHMALBANDIGER KrF-EXCIMERLASER
DE3886067D1 (de) Spiegel für Excimer-Laser und Excimer-Laservorrichtung unter Verwendung des Spiegels.
NO20003581D0 (no) Kontrollinnretning for sveiseapparat
DE60014469D1 (de) Steuerung für Dieselmotor
DE69623527D1 (de) Startsteuerung für Fahrzeuge
DE69628983D1 (de) Steuervorrichtung für Thermodrucker
DE69717182D1 (de) Excimerlasergenerator
FR2734025B1 (fr) Moteur fusee a propergol liquide, a impulsions
DE69834925D1 (de) Pulsenergiesteuerung für excimer-laser
EP1041689A4 (de) Excimer-laser
DE59803569D1 (de) Steuerung für auf muskel- und motorkraft gestützte antriebe
DE69831379D1 (de) Dynamische Pulsbreitenmodulation für Laserdruck
DE69813465D1 (de) Laserschneideinrichtung
DE60040256D1 (de) Excimer-Laservorrichtung
BR9505760A (pt) Dispositivo de fornecimento de oxidante e método para efetuar combustão
DE69506284T2 (de) Gütegeschaltetes Lasersystem
DE69628539D1 (de) Einstellung der Punktgrösse für Laserdrucker
DE59702467D1 (de) Kurzpuls-laservorrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition