DE3736933C2 - - Google Patents

Info

Publication number
DE3736933C2
DE3736933C2 DE3736933A DE3736933A DE3736933C2 DE 3736933 C2 DE3736933 C2 DE 3736933C2 DE 3736933 A DE3736933 A DE 3736933A DE 3736933 A DE3736933 A DE 3736933A DE 3736933 C2 DE3736933 C2 DE 3736933C2
Authority
DE
Germany
Prior art keywords
silicon
membrane
films
compound
atomic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3736933A
Other languages
German (de)
English (en)
Other versions
DE3736933A1 (de
Inventor
Akira Yokohama Kanagawa Jp Oyobe
Toshihiko Tokio/Tokyo Jp Maeda
Hiroyuki Kawasaki Kanagawa Jp Nakae
Toshio Izumi Miyagi Jp Hirai
Tsuyoshi Sendai Miyagi Jp Masumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Japan Science and Technology Agency
Original Assignee
Furukawa Electric Co Ltd
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd, Research Development Corp of Japan filed Critical Furukawa Electric Co Ltd
Publication of DE3736933A1 publication Critical patent/DE3736933A1/de
Application granted granted Critical
Publication of DE3736933C2 publication Critical patent/DE3736933C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE19873736933 1986-10-31 1987-10-30 Membran fuer die verwendung in einer roentgenstrahlenmaske und verfahren zu ihrer herstellung Granted DE3736933A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61258337A JPS63114124A (ja) 1986-10-31 1986-10-31 Ｘ線マスク用メンブレンおよび製造法

Publications (2)

Publication Number Publication Date
DE3736933A1 DE3736933A1 (de) 1988-05-05
DE3736933C2 true DE3736933C2 (enExample) 1990-06-07

Family

ID=17318842

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873736933 Granted DE3736933A1 (de) 1986-10-31 1987-10-30 Membran fuer die verwendung in einer roentgenstrahlenmaske und verfahren zu ihrer herstellung

Country Status (5)

Country Link
US (1) US4940851A (enExample)
JP (1) JPS63114124A (enExample)
KR (1) KR940005278B1 (enExample)
DE (1) DE3736933A1 (enExample)
GB (1) GB2198150B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6632750B2 (en) * 2000-07-31 2003-10-14 Hitachi, Ltd. Manufacturing method of semiconductor integrated circuit device
JP2004102367A (ja) * 2002-09-04 2004-04-02 Hitachi Ltd 需給計画方法およびシステム
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
JP7084306B2 (ja) * 2017-02-24 2022-06-14 古河電気工業株式会社 マスク一体型表面保護テープおよびそれを用いる半導体チップの製造方法
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2100759B (en) * 1977-12-22 1983-06-08 Canon Kk Electrophotographic photosensitive member and process for production thereof
AU530905B2 (en) * 1977-12-22 1983-08-04 Canon Kabushiki Kaisha Electrophotographic photosensitive member
GB1603449A (en) * 1978-05-31 1981-11-25 Chemetal Corp Method for the formation of hard deposits
US4171489A (en) * 1978-09-13 1979-10-16 Bell Telephone Laboratories, Incorporated Radiation mask structure
US4222760A (en) * 1979-08-02 1980-09-16 Corning Glass Works Preparation of oxynitride glass-ceramics
JPS5626771A (en) * 1979-08-14 1981-03-14 Sumitomo Electric Industries Sintered body for cast iron cutting tool and its manufacture
JPS6022676B2 (ja) * 1980-02-23 1985-06-03 日本鋼管株式会社 窒化硅素・窒化硼素複合焼結体及びその製造方法
JPS594501B2 (ja) * 1980-08-19 1984-01-30 日本油脂株式会社 高硬度焼結体
JPS59152269A (ja) * 1983-02-08 1984-08-30 九州耐火煉瓦株式会社 窒化珪素系複合耐火物
JPS59169982A (ja) * 1983-03-17 1984-09-26 黒崎窒業株式会社 窒化硼素含有耐火物
JPS6340307A (ja) * 1986-08-05 1988-02-20 Tamura Seisakusho Co Ltd 磁束平衡法用トランス

Also Published As

Publication number Publication date
GB2198150B (en) 1991-02-06
US4940851A (en) 1990-07-10
KR880005668A (ko) 1988-06-29
DE3736933A1 (de) 1988-05-05
JPS63114124A (ja) 1988-05-19
JPH0582963B2 (enExample) 1993-11-24
GB8725065D0 (en) 1987-12-02
GB2198150A (en) 1988-06-08
KR940005278B1 (ko) 1994-06-15

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee