KR940005278B1 - X선 마스크용 멤브레인 및 제조법 - Google Patents

X선 마스크용 멤브레인 및 제조법 Download PDF

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Publication number
KR940005278B1
KR940005278B1 KR1019870011695A KR870011695A KR940005278B1 KR 940005278 B1 KR940005278 B1 KR 940005278B1 KR 1019870011695 A KR1019870011695 A KR 1019870011695A KR 870011695 A KR870011695 A KR 870011695A KR 940005278 B1 KR940005278 B1 KR 940005278B1
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KR
South Korea
Prior art keywords
atomic
membrane
film
silicon
atomic ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019870011695A
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English (en)
Korean (ko)
Other versions
KR880005668A (ko
Inventor
아기라 오요베
도시히로 마에다
히로유기 나가에
도시오 히라이
쯔요시 마스모도
Original Assignee
신기쥬즈 가이하즈지교단
아카바네 노브히사
도시오 히라이
쯔요시 마스모도
후루가와 덴기고교 가부시기가이샤
크사가베 에쯔지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 신기쥬즈 가이하즈지교단, 아카바네 노브히사, 도시오 히라이, 쯔요시 마스모도, 후루가와 덴기고교 가부시기가이샤, 크사가베 에쯔지 filed Critical 신기쥬즈 가이하즈지교단
Publication of KR880005668A publication Critical patent/KR880005668A/ko
Application granted granted Critical
Publication of KR940005278B1 publication Critical patent/KR940005278B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1019870011695A 1986-10-31 1987-10-21 X선 마스크용 멤브레인 및 제조법 Expired - Fee Related KR940005278B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP258337 1986-10-31
JP61258337A JPS63114124A (ja) 1986-10-31 1986-10-31 Ｘ線マスク用メンブレンおよび製造法
JP61-258337 1986-10-31

Publications (2)

Publication Number Publication Date
KR880005668A KR880005668A (ko) 1988-06-29
KR940005278B1 true KR940005278B1 (ko) 1994-06-15

Family

ID=17318842

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019870011695A Expired - Fee Related KR940005278B1 (ko) 1986-10-31 1987-10-21 X선 마스크용 멤브레인 및 제조법

Country Status (5)

Country Link
US (1) US4940851A (enExample)
JP (1) JPS63114124A (enExample)
KR (1) KR940005278B1 (enExample)
DE (1) DE3736933A1 (enExample)
GB (1) GB2198150B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6632750B2 (en) * 2000-07-31 2003-10-14 Hitachi, Ltd. Manufacturing method of semiconductor integrated circuit device
JP2004102367A (ja) * 2002-09-04 2004-04-02 Hitachi Ltd 需給計画方法およびシステム
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
SG11201906797WA (en) * 2017-02-24 2019-08-27 Furukawa Electric Co Ltd Mask-integrated surface protective tape, and method of producing a semiconductor chip using the same
US10983537B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU530905B2 (en) * 1977-12-22 1983-08-04 Canon Kabushiki Kaisha Electrophotographic photosensitive member
GB2100759B (en) * 1977-12-22 1983-06-08 Canon Kk Electrophotographic photosensitive member and process for production thereof
GB1603449A (en) * 1978-05-31 1981-11-25 Chemetal Corp Method for the formation of hard deposits
US4171489A (en) * 1978-09-13 1979-10-16 Bell Telephone Laboratories, Incorporated Radiation mask structure
US4222760A (en) * 1979-08-02 1980-09-16 Corning Glass Works Preparation of oxynitride glass-ceramics
JPS5626771A (en) * 1979-08-14 1981-03-14 Sumitomo Electric Industries Sintered body for cast iron cutting tool and its manufacture
JPS6022676B2 (ja) * 1980-02-23 1985-06-03 日本鋼管株式会社 窒化硅素・窒化硼素複合焼結体及びその製造方法
JPS594501B2 (ja) * 1980-08-19 1984-01-30 日本油脂株式会社 高硬度焼結体
JPS59152269A (ja) * 1983-02-08 1984-08-30 九州耐火煉瓦株式会社 窒化珪素系複合耐火物
JPS59169982A (ja) * 1983-03-17 1984-09-26 黒崎窒業株式会社 窒化硼素含有耐火物
JPS6340307A (ja) * 1986-08-05 1988-02-20 Tamura Seisakusho Co Ltd 磁束平衡法用トランス

Also Published As

Publication number Publication date
US4940851A (en) 1990-07-10
KR880005668A (ko) 1988-06-29
GB2198150A (en) 1988-06-08
DE3736933C2 (enExample) 1990-06-07
GB8725065D0 (en) 1987-12-02
JPS63114124A (ja) 1988-05-19
JPH0582963B2 (enExample) 1993-11-24
GB2198150B (en) 1991-02-06
DE3736933A1 (de) 1988-05-05

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