GB2198150B - Membrane for use in x-ray mask and method for preparing the same - Google Patents

Membrane for use in x-ray mask and method for preparing the same

Info

Publication number
GB2198150B
GB2198150B GB8725065A GB8725065A GB2198150B GB 2198150 B GB2198150 B GB 2198150B GB 8725065 A GB8725065 A GB 8725065A GB 8725065 A GB8725065 A GB 8725065A GB 2198150 B GB2198150 B GB 2198150B
Authority
GB
United Kingdom
Prior art keywords
membrane
preparing
same
ray mask
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB8725065A
Other languages
English (en)
Other versions
GB2198150A (en
GB8725065D0 (en
Inventor
Akira Oyobe
Toshihiko Maeda
Hiroyuki Nakae
Toshio Hirai
Tsuyoshi Masumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Japan Science and Technology Agency
Original Assignee
Furukawa Electric Co Ltd
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd, Research Development Corp of Japan filed Critical Furukawa Electric Co Ltd
Publication of GB8725065D0 publication Critical patent/GB8725065D0/en
Publication of GB2198150A publication Critical patent/GB2198150A/en
Application granted granted Critical
Publication of GB2198150B publication Critical patent/GB2198150B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
GB8725065A 1986-10-31 1987-10-26 Membrane for use in x-ray mask and method for preparing the same Expired - Lifetime GB2198150B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61258337A JPS63114124A (ja) 1986-10-31 1986-10-31 Ｘ線マスク用メンブレンおよび製造法

Publications (3)

Publication Number Publication Date
GB8725065D0 GB8725065D0 (en) 1987-12-02
GB2198150A GB2198150A (en) 1988-06-08
GB2198150B true GB2198150B (en) 1991-02-06

Family

ID=17318842

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8725065A Expired - Lifetime GB2198150B (en) 1986-10-31 1987-10-26 Membrane for use in x-ray mask and method for preparing the same

Country Status (5)

Country Link
US (1) US4940851A (enExample)
JP (1) JPS63114124A (enExample)
KR (1) KR940005278B1 (enExample)
DE (1) DE3736933A1 (enExample)
GB (1) GB2198150B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6632750B2 (en) * 2000-07-31 2003-10-14 Hitachi, Ltd. Manufacturing method of semiconductor integrated circuit device
JP2004102367A (ja) * 2002-09-04 2004-04-02 Hitachi Ltd 需給計画方法およびシステム
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
JP7084306B2 (ja) * 2017-02-24 2022-06-14 古河電気工業株式会社 マスク一体型表面保護テープおよびそれを用いる半導体チップの製造方法
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171489A (en) * 1978-09-13 1979-10-16 Bell Telephone Laboratories, Incorporated Radiation mask structure
GB1603449A (en) * 1978-05-31 1981-11-25 Chemetal Corp Method for the formation of hard deposits
GB2100759A (en) * 1977-12-22 1983-01-06 Canon Kk Electrophotographic photosensitive member and process for production thereof
JPS6340307A (ja) * 1986-08-05 1988-02-20 Tamura Seisakusho Co Ltd 磁束平衡法用トランス

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4265991A (en) * 1977-12-22 1981-05-05 Canon Kabushiki Kaisha Electrophotographic photosensitive member and process for production thereof
US4222760A (en) * 1979-08-02 1980-09-16 Corning Glass Works Preparation of oxynitride glass-ceramics
JPS5626771A (en) * 1979-08-14 1981-03-14 Sumitomo Electric Industries Sintered body for cast iron cutting tool and its manufacture
JPS6022676B2 (ja) * 1980-02-23 1985-06-03 日本鋼管株式会社 窒化硅素・窒化硼素複合焼結体及びその製造方法
JPS594501B2 (ja) * 1980-08-19 1984-01-30 日本油脂株式会社 高硬度焼結体
JPS59152269A (ja) * 1983-02-08 1984-08-30 九州耐火煉瓦株式会社 窒化珪素系複合耐火物
JPS59169982A (ja) * 1983-03-17 1984-09-26 黒崎窒業株式会社 窒化硼素含有耐火物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2100759A (en) * 1977-12-22 1983-01-06 Canon Kk Electrophotographic photosensitive member and process for production thereof
GB1603449A (en) * 1978-05-31 1981-11-25 Chemetal Corp Method for the formation of hard deposits
US4171489A (en) * 1978-09-13 1979-10-16 Bell Telephone Laboratories, Incorporated Radiation mask structure
JPS6340307A (ja) * 1986-08-05 1988-02-20 Tamura Seisakusho Co Ltd 磁束平衡法用トランス

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Chemical Abstracts, Vol 85, No. 24, 13 December 1976, page 253, No. P 181453 y *

Also Published As

Publication number Publication date
JPS63114124A (ja) 1988-05-19
US4940851A (en) 1990-07-10
DE3736933A1 (de) 1988-05-05
KR940005278B1 (ko) 1994-06-15
DE3736933C2 (enExample) 1990-06-07
GB2198150A (en) 1988-06-08
GB8725065D0 (en) 1987-12-02
KR880005668A (ko) 1988-06-29
JPH0582963B2 (enExample) 1993-11-24

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20001026