DE3525495C1 - Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid - Google Patents
Verfahren zur Herstellung von Gegenstaenden aus synthetischem SiliziumdioxidInfo
- Publication number
- DE3525495C1 DE3525495C1 DE3525495A DE3525495A DE3525495C1 DE 3525495 C1 DE3525495 C1 DE 3525495C1 DE 3525495 A DE3525495 A DE 3525495A DE 3525495 A DE3525495 A DE 3525495A DE 3525495 C1 DE3525495 C1 DE 3525495C1
- Authority
- DE
- Germany
- Prior art keywords
- product
- grain
- sieved
- dried
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 60
- 235000012239 silicon dioxide Nutrition 0.000 title claims description 26
- 239000000377 silicon dioxide Substances 0.000 title claims description 20
- 238000000034 method Methods 0.000 title claims description 15
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- 230000007062 hydrolysis Effects 0.000 claims description 12
- 238000006460 hydrolysis reaction Methods 0.000 claims description 12
- 239000010453 quartz Substances 0.000 claims description 10
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 8
- 239000005049 silicon tetrachloride Substances 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 7
- 238000003756 stirring Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000012498 ultrapure water Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 239000000463 material Substances 0.000 description 5
- 239000000499 gel Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- -1 Titanium alkoxides Chemical class 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000000156 glass melt Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
- C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/152—Preparation of hydrogels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/901—Liquid phase reaction process
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Dispersion Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3525495A DE3525495C1 (de) | 1985-07-17 | 1985-07-17 | Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid |
| JP61159901A JPS6221708A (ja) | 1985-07-17 | 1986-07-09 | 粒子状合成高純度二酸化珪素から物品を製造する方法 |
| GB8617189A GB2178020B (en) | 1985-07-17 | 1986-07-15 | A process for producing objects from high purity synthetic particulate silicon dioxide |
| FR868610430A FR2585013B1 (fr) | 1985-07-17 | 1986-07-17 | Procede pour la fabrication d'objets en dioxyde de silicium particulaire synthetique de haute purete |
| US07/160,726 US4826521A (en) | 1985-07-17 | 1988-02-26 | Method of manufacturing articles of extremely pure synthetic particulate silicon dioxide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3525495A DE3525495C1 (de) | 1985-07-17 | 1985-07-17 | Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3525495C1 true DE3525495C1 (de) | 1987-01-02 |
Family
ID=6275984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3525495A Expired DE3525495C1 (de) | 1985-07-17 | 1985-07-17 | Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4826521A (enExample) |
| JP (1) | JPS6221708A (enExample) |
| DE (1) | DE3525495C1 (enExample) |
| FR (1) | FR2585013B1 (enExample) |
| GB (1) | GB2178020B (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4767429A (en) * | 1986-12-11 | 1988-08-30 | American Telephone & Telegraph Co., At&T Bell Laboratories | Glass body formed from a vapor-derived gel and process for producing same |
| JPH02124739A (ja) * | 1988-10-31 | 1990-05-14 | Shin Etsu Chem Co Ltd | 合成石英ガラスおよびその製造方法 |
| JP2780799B2 (ja) * | 1989-01-27 | 1998-07-30 | 信越石英株式会社 | 石英ガラスの製造方法 |
| US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
| US5158758A (en) * | 1989-04-24 | 1992-10-27 | International Minerals & Chemical Corp. | Production of silica having high specific surface area |
| JPH02307830A (ja) * | 1989-05-18 | 1990-12-21 | Chisso Corp | 石英ガラス粉末の製造方法 |
| JPH0337120A (ja) * | 1989-06-30 | 1991-02-18 | Toshiba Ceramics Co Ltd | 石英ガラスの製造方法 |
| JP2617822B2 (ja) * | 1990-04-10 | 1997-06-04 | 日東化学工業株式会社 | 非焼結状クリストバライト粒子の製造方法 |
| EP0486004B1 (en) * | 1990-11-16 | 1996-09-11 | Mitsubishi Chemical Corporation | Method for producing a high-purity silica glass powder |
| US5236651A (en) * | 1991-12-02 | 1993-08-17 | Akzo N.V. | Extrusion, collection, and drying of ceramic precursor gel to form dried gel particles |
| IT1304475B1 (it) * | 1998-08-06 | 2001-03-19 | Sacmi | Procedimento ed impianto per la produzione di vetro ed in particolaredi fritte ceramiche. |
| US20020083740A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application |
| US7797966B2 (en) * | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
| US20020117625A1 (en) * | 2001-02-26 | 2002-08-29 | Pandelisev Kiril A. | Fiber optic enhanced scintillator detector |
| JP2006219309A (ja) * | 2005-02-08 | 2006-08-24 | Asahi Glass Co Ltd | 多孔質石英ガラス母材の製造方法及び装置 |
| JP5648640B2 (ja) * | 2010-01-07 | 2015-01-07 | 三菱マテリアル株式会社 | 合成非晶質シリカ粉末 |
| US9446959B2 (en) | 2011-03-23 | 2016-09-20 | Mitsubishi Materials Corporation | Synthetic amorphous silica powder and method for producing same |
| CN102491273B (zh) * | 2011-11-15 | 2013-09-04 | 四川银邦硅业有限公司 | 用多晶硅副产物四氯化硅制备高浓度盐酸的方法 |
| CN105722788B (zh) | 2014-01-29 | 2018-04-03 | 三菱综合材料株式会社 | 合成非晶质二氧化硅粉末及其制造方法 |
| WO2018198774A1 (ja) | 2017-04-26 | 2018-11-01 | 東ソ－・エスジ－エム株式会社 | 耐紫外線性石英ガラス及びその製造方法 |
| CN119873846B (zh) * | 2025-03-06 | 2025-10-24 | 浙江大学杭州国际科创中心 | 一种合成二氧化硅中氯离子杂质的深度去除方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1596839B1 (de) * | 1966-05-07 | 1970-11-26 | Jenaer Glaswerk Schott & Gen | Verfahren zur Herstellung von Formkoerpern aus Glaesern bei einer Temperatur unterhalb der ueblichen Schmelztemperatur |
| US4278632A (en) * | 1980-02-08 | 1981-07-14 | Westinghouse Electric Corp. | Method of conforming clear vitreous gal of silica-titania material |
| DE3302745A1 (de) * | 1983-01-27 | 1984-08-02 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur herstellung von gegenstaenden aus hochreinem synthetischem quarzglas |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3959174A (en) * | 1971-08-24 | 1976-05-25 | W. R. Grace & Co. | Method of selectively producing high pore volume silica gel |
| JPS53298A (en) * | 1976-06-23 | 1978-01-05 | Nippon Saafuakutanto Kougiyou | Process for producing epoxy resin emulsion |
| NL7707960A (nl) * | 1977-07-18 | 1979-01-22 | Stamicarbon | Werkwijze ter bereiding van poreus, zuiver siliciumdioxyde. |
| NL7707961A (nl) * | 1977-07-18 | 1979-01-22 | Stamicarbon | Werkwijze ter bereiding van poreus, zuiver siliciumdioxyde. |
| US4303641A (en) * | 1978-05-24 | 1981-12-01 | W. R. Grace & Co. | Hydrous silica gel containing dentifrice |
| US4221691A (en) * | 1979-02-16 | 1980-09-09 | Dow Corning Corporation | Method of hydrolyzing chlorosilanes |
| DE2952038C2 (de) * | 1979-12-22 | 1982-03-11 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Schmelzvorrichtung aus Quarzglas zum Herstellen von massivem Quarzglas |
| JPH05140797A (ja) * | 1991-11-18 | 1993-06-08 | Sumitomo Metal Ind Ltd | 連続電気めつき鋼帯の製造方法 |
-
1985
- 1985-07-17 DE DE3525495A patent/DE3525495C1/de not_active Expired
-
1986
- 1986-07-09 JP JP61159901A patent/JPS6221708A/ja active Granted
- 1986-07-15 GB GB8617189A patent/GB2178020B/en not_active Expired
- 1986-07-17 FR FR868610430A patent/FR2585013B1/fr not_active Expired - Lifetime
-
1988
- 1988-02-26 US US07/160,726 patent/US4826521A/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1596839B1 (de) * | 1966-05-07 | 1970-11-26 | Jenaer Glaswerk Schott & Gen | Verfahren zur Herstellung von Formkoerpern aus Glaesern bei einer Temperatur unterhalb der ueblichen Schmelztemperatur |
| US4278632A (en) * | 1980-02-08 | 1981-07-14 | Westinghouse Electric Corp. | Method of conforming clear vitreous gal of silica-titania material |
| DE3302745A1 (de) * | 1983-01-27 | 1984-08-02 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur herstellung von gegenstaenden aus hochreinem synthetischem quarzglas |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2585013A1 (fr) | 1987-01-23 |
| GB2178020B (en) | 1989-12-28 |
| GB2178020A (en) | 1987-02-04 |
| US4826521A (en) | 1989-05-02 |
| JPS6221708A (ja) | 1987-01-30 |
| FR2585013B1 (fr) | 1990-06-29 |
| GB8617189D0 (en) | 1986-08-20 |
| JPH0475848B2 (enExample) | 1992-12-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8100 | Publication of patent without earlier publication of application | ||
| D1 | Grant (no unexamined application published) patent law 81 | ||
| 8363 | Opposition against the patent | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: HERAEUS QUARZGLAS GMBH, 6450 HANAU, DE |
|
| 8331 | Complete revocation |