DE69521185T2 - Hochreines transparentes Quarzglas und Verfahren zu seiner Herstellung - Google Patents

Hochreines transparentes Quarzglas und Verfahren zu seiner Herstellung

Info

Publication number
DE69521185T2
DE69521185T2 DE69521185T DE69521185T DE69521185T2 DE 69521185 T2 DE69521185 T2 DE 69521185T2 DE 69521185 T DE69521185 T DE 69521185T DE 69521185 T DE69521185 T DE 69521185T DE 69521185 T2 DE69521185 T2 DE 69521185T2
Authority
DE
Germany
Prior art keywords
production
quartz glass
transparent quartz
purity transparent
purity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69521185T
Other languages
English (en)
Other versions
DE69521185D1 (de
Inventor
Koichi Orii
Yukinobu Hara
Tomoyuki Akiyama
Koji Tsukuma
Yoshikazu Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Tosoh Quartz Corp
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Quartz Corp, Tosoh Corp filed Critical Tosoh Quartz Corp
Application granted granted Critical
Publication of DE69521185D1 publication Critical patent/DE69521185D1/de
Publication of DE69521185T2 publication Critical patent/DE69521185T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C03B32/02—Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/10—Melting processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE69521185T 1994-10-14 1995-10-13 Hochreines transparentes Quarzglas und Verfahren zu seiner Herstellung Expired - Lifetime DE69521185T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24941794A JP3751326B2 (ja) 1994-10-14 1994-10-14 高純度透明石英ガラスの製造方法

Publications (2)

Publication Number Publication Date
DE69521185D1 DE69521185D1 (de) 2001-07-12
DE69521185T2 true DE69521185T2 (de) 2001-10-25

Family

ID=17192673

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69521185T Expired - Lifetime DE69521185T2 (de) 1994-10-14 1995-10-13 Hochreines transparentes Quarzglas und Verfahren zu seiner Herstellung

Country Status (4)

Country Link
US (1) US5665133A (de)
EP (1) EP0711736B1 (de)
JP (1) JP3751326B2 (de)
DE (1) DE69521185T2 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
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JPH0912322A (ja) * 1995-06-29 1997-01-14 Tosoh Corp 高純度透明石英ガラス及びその製造方法
JPH0940434A (ja) * 1995-07-28 1997-02-10 Tosoh Corp 高純度石英ガラス及びその製造方法
GB2331985B (en) * 1997-12-03 2001-11-21 Tosoh Corp High purity transparent silica glass and process for producing same
JP4022678B2 (ja) * 1998-01-23 2007-12-19 東ソー株式会社 高純度透明シリカガラスの製造方法
US6376401B1 (en) 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
KR100665779B1 (ko) * 1999-10-18 2007-01-09 마츠시타 덴끼 산교 가부시키가이샤 고압 수은램프, 램프유닛 및 수은램프의 제조방법
WO2003040050A1 (en) * 2001-10-18 2003-05-15 Research Institute Of Industrial Science & Technology Preform for glass ferrule and fabrication method thereof
JP3801933B2 (ja) * 2002-03-15 2006-07-26 湖北工業株式会社 光学部材の製造方法
US20040050110A1 (en) * 2002-08-29 2004-03-18 Berkey George E. Methods for fabricating optical fibers and optical fiber preforms
DE102006018711B4 (de) * 2006-04-20 2008-09-25 Heraeus Quarzglas Gmbh & Co. Kg Werkstoff, insbesondere für ein optisches Bauteil zum Einsatz in der Mikrolithographie und Verfahren zur Herstellung eines Formkörpers aus dem Werkstoff
EP2070883B2 (de) * 2006-09-11 2017-04-19 Tosoh Corporation Quarzgutglas und herstellungsverfahren dafür
DE102006046619A1 (de) * 2006-09-29 2008-04-03 Heraeus Quarzglas Gmbh & Co. Kg Streichfähiger SiO2-Schlicker für die Herstellung von Quarzglas, Verfahren zur Herstellung von Quarzglas unter Einsatz des Schlickers
JP5663870B2 (ja) * 2009-12-24 2015-02-04 東ソー株式会社 金属不純物拡散阻止能を有する石英ガラス
US8197782B2 (en) 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
JP5833395B2 (ja) * 2011-09-22 2015-12-16 タテホ化学工業株式会社 キースイッチの製造方法
TWI794149B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 石英玻璃粉粒、不透明成型體及彼等之製備方法
US20190152827A1 (en) * 2015-12-18 2019-05-23 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies from silicon dioxide powder
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
TW201733932A (zh) * 2015-12-18 2017-10-01 德商何瑞斯廓格拉斯公司 石英玻璃製備中之二氧化矽粉末的蒸氣處理
TW201736290A (zh) * 2015-12-18 2017-10-16 何瑞斯廓格拉斯公司 石英玻璃體的製備與後處理
EP3390306A2 (de) * 2015-12-18 2018-10-24 Heraeus Quarzglas GmbH & Co. KG Herstellung eines quarzglaskörpers in einem hängenden sintertiegel
EP3390297A1 (de) * 2015-12-18 2018-10-24 Heraeus Quarzglas GmbH & Co. KG Gasspülung für schmelzofen und herstellungsverfahren für quarzglas
TW201731781A (zh) * 2015-12-18 2017-09-16 何瑞斯廓格拉斯公司 於豎立式燒結坩堝中製備石英玻璃體
CN108698882A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅粉末的氨处理
JP6940236B2 (ja) * 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 溶融炉内での露点監視による石英ガラス体の調製
EP3390290B1 (de) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Herstellung eines opaken quarzglaskörpers
CN108698886A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 降低二氧化硅颗粒的碳含量和石英玻璃体的制备
JP7048053B2 (ja) * 2015-12-18 2022-04-05 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー マルチチャンバ炉内での石英ガラス体の調製
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
US11492285B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies from silicon dioxide granulate
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
KR20180095614A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 낮은 OH, Cl, 및 Al 함량을 갖는 석영 유리로 제조된 유리 섬유 및 프리폼
CN108698889A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在悬挂式金属片坩埚中制备石英玻璃体
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
JP6707409B2 (ja) * 2016-06-30 2020-06-10 クアーズテック株式会社 シリカ焼結体

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Publication number Priority date Publication date Assignee Title
EP0173961B1 (de) * 1984-08-30 1991-01-23 Japan Oxygen Co., Ltd. Verfahren zur Herstellung von Glas
JPS623012A (ja) 1985-06-27 1987-01-09 Nitto Chem Ind Co Ltd 高純度シリカの製造方法
CA1271307A (en) * 1985-06-27 1990-07-10 Iwao Ohshima Process for manufacturing high purity silica
JPS623011A (ja) 1985-06-27 1987-01-09 Nitto Chem Ind Co Ltd 高純度シリカの製造方法
SU1653541A3 (ru) 1986-02-05 1991-05-30 Nitto Chemical Industry Co Ltd Способ получения высокочистои окиси кренш1я
JPH0757685B2 (ja) 1986-02-05 1995-06-21 日東化学工業株式会社 高純度シリカの製造方法
EP0258457B1 (de) * 1986-02-28 1991-09-25 Japan Oxygen Co. Ltd. Verfahren zur herstellung von glas
US4828594A (en) * 1986-02-28 1989-05-09 Japan Oxygen Co., Ltd. Process for the production of glass
JPS62212234A (ja) * 1986-02-28 1987-09-18 Nippon Sanso Kk ガラスの製造法
JPS63166730A (ja) * 1986-12-27 1988-07-09 Shinetsu Sekiei Kk 石英ガラスの製造方法
JPH0624993B2 (ja) * 1987-12-28 1994-04-06 信越石英株式会社 石英ガラスの製造方法
JP2737191B2 (ja) * 1987-12-28 1998-04-08 東ソー株式会社 均質な石英ガラス塊の製造方法
JPH0776100B2 (ja) * 1988-04-21 1995-08-16 日東化学工業株式会社 ガラス成形体の製造方法
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
JP2617822B2 (ja) * 1990-04-10 1997-06-04 日東化学工業株式会社 非焼結状クリストバライト粒子の製造方法
US5330941A (en) * 1991-07-24 1994-07-19 Asahi Glass Company Ltd. Quartz glass substrate for polysilicon thin film transistor liquid crystal display

Also Published As

Publication number Publication date
JPH08119664A (ja) 1996-05-14
EP0711736B1 (de) 2001-06-06
US5665133A (en) 1997-09-09
EP0711736A1 (de) 1996-05-15
DE69521185D1 (de) 2001-07-12
JP3751326B2 (ja) 2006-03-01

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: TOSOH CORP., SHINNANYO, YAMAGUCHI, JP TOSOH QUARTZ

8364 No opposition during term of opposition