DE69803643D1 - Undurchsichtiger Silikatglasgegenstand mit durchsichtigem Bereich und Verfahren zu dessen Herstellung - Google Patents

Undurchsichtiger Silikatglasgegenstand mit durchsichtigem Bereich und Verfahren zu dessen Herstellung

Info

Publication number
DE69803643D1
DE69803643D1 DE69803643T DE69803643T DE69803643D1 DE 69803643 D1 DE69803643 D1 DE 69803643D1 DE 69803643 T DE69803643 T DE 69803643T DE 69803643 T DE69803643 T DE 69803643T DE 69803643 D1 DE69803643 D1 DE 69803643D1
Authority
DE
Germany
Prior art keywords
manufacture
glass article
silicate glass
transparent area
opaque
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69803643T
Other languages
English (en)
Other versions
DE69803643T3 (de
DE69803643T2 (de
Inventor
Hiroya Nagata
Masayuki Kudo
Koji Tsukuma
Yoshikazu Kikuchi
Tomoyuki Akiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Quartz Corp
Tosoh Corp
Original Assignee
Tosoh Quartz Corp
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26350161&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69803643(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP28350697A external-priority patent/JP4191271B2/ja
Priority claimed from JP01424898A external-priority patent/JP4035793B2/ja
Application filed by Tosoh Quartz Corp, Tosoh Corp filed Critical Tosoh Quartz Corp
Application granted granted Critical
Publication of DE69803643D1 publication Critical patent/DE69803643D1/de
Publication of DE69803643T2 publication Critical patent/DE69803643T2/de
Publication of DE69803643T3 publication Critical patent/DE69803643T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
    • C03C11/007—Foam glass, e.g. obtained by incorporating a blowing agent and heating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/24—Doped silica-based glasses containing non-metals other than boron or halide containing nitrogen, e.g. silicon oxy-nitride glasses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/10—Melting processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/08—Quartz
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
    • Y10T428/1317—Multilayer [continuous layer]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE1998603643 1997-10-16 1998-10-15 Undurchsichtiger Silikatglasgegenstand mit durchsichtigem Bereich und Verfahren zu dessen Herstellung Expired - Lifetime DE69803643T3 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP28350697A JP4191271B2 (ja) 1997-10-16 1997-10-16 透明部を有する不透明石英ガラス及びその製造方法
JP28350697 1997-10-16
JP01424898A JP4035793B2 (ja) 1998-01-27 1998-01-27 透明部を有する不透明石英ガラスリングの製造方法
JP1424898 1998-01-27

Publications (3)

Publication Number Publication Date
DE69803643D1 true DE69803643D1 (de) 2002-03-14
DE69803643T2 DE69803643T2 (de) 2002-08-08
DE69803643T3 DE69803643T3 (de) 2006-11-30

Family

ID=26350161

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1998603643 Expired - Lifetime DE69803643T3 (de) 1997-10-16 1998-10-15 Undurchsichtiger Silikatglasgegenstand mit durchsichtigem Bereich und Verfahren zu dessen Herstellung

Country Status (3)

Country Link
US (1) US6312775B1 (de)
EP (1) EP0909743B2 (de)
DE (1) DE69803643T3 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19962452B4 (de) 1999-12-22 2004-03-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung von opakem Quarzglas
JP4447738B2 (ja) * 2000-05-31 2010-04-07 信越石英株式会社 多層構造の石英ガラスルツボの製造方法
DE10044163A1 (de) * 2000-09-07 2002-04-04 Wacker Chemie Gmbh Elektrophoretisch nachverdichtete SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung
GB0717849D0 (en) * 2007-09-13 2007-10-24 Vibraglaz Uk Ltd Finishing medium and process
US8715037B2 (en) 2007-09-13 2014-05-06 Vibraglaz (Uk) Limited Materials processing medium and method
TWI652240B (zh) * 2014-02-17 2019-03-01 日商東曹股份有限公司 不透明石英玻璃及其製造方法
KR102397734B1 (ko) 2015-07-15 2022-05-13 헤래우스 쿼츠 아메리카 엘엘씨 투명한 용융 석영에 불투명한 용융 석영을 합치기 위한 프로세스

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3935119A (en) * 1971-11-30 1976-01-27 Owens-Illinois, Inc. Luminescent device, process, composition, and article
JPS6443164A (en) 1987-08-10 1989-02-15 Nat Federation Agric Coop Ass Crushing of fruit, vegetable or such
US4935046A (en) * 1987-12-03 1990-06-19 Shin-Etsu Handotai Company, Limited Manufacture of a quartz glass vessel for the growth of single crystal semiconductor
JP3043032B2 (ja) * 1990-07-06 2000-05-22 日本石英硝子株式会社 不透明石英ガラスの製造法
JPH0624771A (ja) 1992-06-30 1994-02-01 Nitto Chem Ind Co Ltd 高純度不透明石英ガラスおよびその製造方法
JP2829227B2 (ja) 1993-08-24 1998-11-25 信越石英株式会社 不透明石英ガラス
US5585173A (en) * 1993-10-08 1996-12-17 Tosoh Corporation High-purity, opaque quartz glass, method for producing same and use thereof
DE4338807C1 (de) * 1993-11-12 1995-01-26 Heraeus Quarzglas Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper
JP3394320B2 (ja) 1994-04-28 2003-04-07 信越石英株式会社 透明層と不透明層とを有する積層石英ガラス部材の製造方法
JP3434572B2 (ja) 1994-04-28 2003-08-11 信越石英株式会社 透明石英ガラス層付不透明石英ガラス部材の製造方法
JP3368547B2 (ja) 1994-04-28 2003-01-20 信越石英株式会社 不透明石英ガラスおよびその製造方法
JP3449654B2 (ja) * 1994-09-30 2003-09-22 信越石英株式会社 不透明石英ガラスの製造方法
US5651827A (en) * 1996-01-11 1997-07-29 Heraeus Quarzglas Gmbh Single-wafer heat-treatment apparatus and method of manufacturing reactor vessel used for same
DE69716822T2 (de) * 1996-07-04 2003-09-11 Tosoh Corp Opakes Quarzglas und Verfahren zu dessen Herstellung

Also Published As

Publication number Publication date
EP0909743B1 (de) 2002-01-30
US6312775B1 (en) 2001-11-06
DE69803643T3 (de) 2006-11-30
DE69803643T2 (de) 2002-08-08
EP0909743B2 (de) 2006-06-07
EP0909743A1 (de) 1999-04-21

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings