DE69600216D1 - Silicaglas, optisches Element damit und Verfahren zu dessen Herstellung - Google Patents
Silicaglas, optisches Element damit und Verfahren zu dessen HerstellungInfo
- Publication number
- DE69600216D1 DE69600216D1 DE69600216T DE69600216T DE69600216D1 DE 69600216 D1 DE69600216 D1 DE 69600216D1 DE 69600216 T DE69600216 T DE 69600216T DE 69600216 T DE69600216 T DE 69600216T DE 69600216 D1 DE69600216 D1 DE 69600216D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- optical element
- silica glass
- silica
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
- C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47995 | 1995-01-06 | ||
JP6103895 | 1995-03-20 | ||
JP6103995 | 1995-03-20 | ||
JP9668795 | 1995-04-21 | ||
JP7164040A JPH0912324A (ja) | 1995-06-29 | 1995-06-29 | 紫外線照射による歪が抑制された石英ガラス部材 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69600216D1 true DE69600216D1 (de) | 1998-05-14 |
DE69600216T2 DE69600216T2 (de) | 1998-09-17 |
Family
ID=27517963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69600216T Expired - Lifetime DE69600216T2 (de) | 1995-01-06 | 1996-01-05 | Silicaglas, optisches Element damit und Verfahren zu dessen Herstellung |
Country Status (4)
Country | Link |
---|---|
US (2) | US5707908A (de) |
EP (1) | EP0720969B1 (de) |
KR (1) | KR100382776B1 (de) |
DE (1) | DE69600216T2 (de) |
Families Citing this family (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6518210B1 (en) * | 1995-01-06 | 2003-02-11 | Nikon Corporation | Exposure apparatus including silica glass and method for producing silica glass |
US6087283A (en) * | 1995-01-06 | 2000-07-11 | Nikon Corporation | Silica glass for photolithography |
US6442973B1 (en) | 1995-01-06 | 2002-09-03 | Nikon Corporation | Synthetic silica glass and its manufacturing method |
JPH11209134A (ja) * | 1998-01-23 | 1999-08-03 | Nikon Corp | 合成石英ガラスおよびその製造方法 |
US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
WO1998000761A1 (en) * | 1996-07-02 | 1998-01-08 | Heraeus Quarzglas Gmbh | Projection aligner for integrated circuit fabrication |
US5958809A (en) * | 1996-08-21 | 1999-09-28 | Nikon Corporation | Fluorine-containing silica glass |
US6309991B1 (en) * | 1996-08-29 | 2001-10-30 | Corning Incorporated | Silica with low compaction under high energy irradiation |
WO1998040319A1 (de) * | 1997-03-07 | 1998-09-17 | Schott Ml Gmbh | Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung |
US6432278B2 (en) | 1997-03-26 | 2002-08-13 | The Institute Of Physical And Chemical Research | Method for controlling refractive index of silica glass |
EP0870737B1 (de) | 1997-04-08 | 2002-07-24 | Shin-Etsu Quartz Products Co., Ltd. | Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas |
TW440548B (en) * | 1997-05-14 | 2001-06-16 | Nippon Kogaku Kk | Synthetic silica glass optical member and method of manufacturing the same |
JPH10330124A (ja) | 1997-05-30 | 1998-12-15 | Toshiba Corp | 石英ガラスおよびその製造方法、ならびにその石英ガラスを用いた熱処理装置および熱処理方法 |
KR100554091B1 (ko) * | 1997-12-08 | 2006-05-16 | 가부시키가이샤 니콘 | 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재 |
US8402786B2 (en) * | 1998-01-30 | 2013-03-26 | Asahi Glass Company, Limited | Synthetic silica glass optical component and process for its production |
DE69915181T2 (de) * | 1998-07-15 | 2004-07-29 | Kitagawa Industries Co., Ltd., Nagoya | Quarzglas, optisches Element und gegen ultraviolette und radioaktive Strahlung resistente faseroptische Vorrichtung, und Herstellungsverfahren dafür |
DE19841932A1 (de) * | 1998-09-14 | 2000-03-16 | Heraeus Quarzglas | Optisches Bauteil aus Quarzglas und Verfahren für seine Herstellung |
US6058739A (en) * | 1998-10-29 | 2000-05-09 | Cymer, Inc. | Long life fused silica ultraviolet optical elements |
JP2000143278A (ja) | 1998-11-10 | 2000-05-23 | Nikon Corp | 耐久性の向上された投影露光装置及び結像光学系の製造方法 |
US6563567B1 (en) * | 1998-12-17 | 2003-05-13 | Nikon Corporation | Method and apparatus for illuminating a surface using a projection imaging apparatus |
US6682859B2 (en) * | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6782716B2 (en) * | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6319634B1 (en) * | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
JP4601022B2 (ja) | 1999-03-04 | 2010-12-22 | 信越石英株式会社 | ArFエキシマレーザーリソグラフィー用合成石英ガラス部材 |
US6649268B1 (en) * | 1999-03-10 | 2003-11-18 | Nikon Corporation | Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member |
JP4051805B2 (ja) | 1999-03-25 | 2008-02-27 | 旭硝子株式会社 | 露光装置およびフォトマスク |
DE10029938A1 (de) * | 1999-07-09 | 2001-07-05 | Zeiss Carl | Optisches System für das Vakuum-Ultraviolett |
WO2001012566A1 (fr) | 1999-08-12 | 2001-02-22 | Nikon Corporation | Procede de preparation de silice vitreuse synthetique et appareil de traitement thermique |
WO2001023935A1 (fr) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Procede et dispositif d'exposition par projection, et systeme optique de projection |
WO2001023933A1 (fr) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Systeme optique de projection |
US6403508B1 (en) | 2000-05-31 | 2002-06-11 | Corning Incorporated | Fused silica with constant induced absorption |
KR20040004389A (ko) * | 2000-10-03 | 2004-01-13 | 코닝 인코포레이티드 | 포토리소그라피 방법 및 시스템 |
TW554260B (en) * | 2001-02-24 | 2003-09-21 | Corning Inc | A below 193 nm UVU transmitting glass photomask, the method of making their blank, the method of making said glass and the method of making homogenous glass optical element |
DE10159962A1 (de) * | 2001-12-06 | 2003-07-03 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
DE10159961C2 (de) * | 2001-12-06 | 2003-12-24 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
DE10159959A1 (de) * | 2001-12-06 | 2003-06-26 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
EP1456142B1 (de) * | 2001-12-21 | 2007-03-07 | Corning Incorporated | Schmelzquarzglas enthaltend aluminium |
US6630418B2 (en) * | 2001-12-21 | 2003-10-07 | Corning Incorporated | Fused silica containing aluminum |
ATE477218T1 (de) * | 2002-03-01 | 2010-08-15 | Schott Ag | Verfahren zu herstellung von quarzglas und einer quarzglasvorform |
JPWO2003080525A1 (ja) * | 2002-03-25 | 2005-07-21 | 株式会社ニコン | 合成石英ガラス部材及びその製造方法 |
JP4403082B2 (ja) * | 2002-11-29 | 2010-01-20 | 信越石英株式会社 | 合成石英ガラスの製造方法及び合成石英ガラス体 |
EP1596424B1 (de) * | 2003-02-17 | 2016-11-02 | Nikon Corporation | Belichtungsvorrichtung und verfahren zur musterbelichtung |
KR101532824B1 (ko) | 2003-04-09 | 2015-07-01 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
US20050132749A1 (en) * | 2003-12-05 | 2005-06-23 | Shin-Etsu Chmeical Co., Ltd. | Burner and method for the manufacture of synthetic quartz glass |
DE102004009557B3 (de) * | 2004-02-25 | 2005-04-21 | Autoflug Gmbh | Land-, Luft- oder Seefahrzeug mit einem Transportraum zur Aufnahme von Gütern und/oder von der Personenbeförderung dienenden, am Fahrzeug gehalterten Sitzen |
US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
EP1690837A1 (de) * | 2005-02-10 | 2006-08-16 | Schott AG | Synthetisches Quarzglas sowie Verfahren zur Herstellung eines Quarzglas-Körpers |
US20060218971A1 (en) * | 2005-02-10 | 2006-10-05 | Rolf Martin | Synthetic quartz glass and process for producing a quartz glass body |
ES2383915T3 (es) * | 2006-01-12 | 2012-06-27 | Ppg Industries Ohio, Inc. | Panel pantalla con características de redirección de la luz producida por láser |
US8629610B2 (en) * | 2006-01-12 | 2014-01-14 | Ppg Industries Ohio, Inc. | Display panel |
US11402572B2 (en) * | 2009-03-04 | 2022-08-02 | Nkt Photonics A/S | Microstructured hollow core optical fiber using low chlorine concentration |
US8891582B2 (en) | 2009-10-21 | 2014-11-18 | Corning Museum of Glass | Electric glass hot shop system |
DE102012000418A1 (de) * | 2011-12-23 | 2013-06-27 | J-Plasma Gmbh | Verfahren zum Herstellen von Stablinsen und Vorrichtung hierfür |
CN104193169A (zh) * | 2014-08-18 | 2014-12-10 | 张桂华 | 一种led节能灯用玻璃管及其制作方法和装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5325230A (en) * | 1989-06-09 | 1994-06-28 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks of synthetic silica glass and method for their production |
DE69015453T3 (de) * | 1989-06-09 | 2001-10-11 | Heraeus Quarzglas | Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung. |
JPH0627013B2 (ja) * | 1989-06-14 | 1994-04-13 | 信越石英株式会社 | 紫外線レーザ用合成シリカガラス光学体及びその製造方法 |
US5410428A (en) * | 1990-10-30 | 1995-04-25 | Shin-Etsu Quartz Products Co. Ltd. | Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof |
WO1993000307A1 (en) * | 1991-06-29 | 1993-01-07 | Shin-Etsu Quartz Products Company Limited | Synthetic quartz glass optical member for excimer laser and production thereof |
JPH0611705A (ja) * | 1992-01-31 | 1994-01-21 | Sony Corp | 能動素子基板 |
US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
JP2784708B2 (ja) * | 1992-12-28 | 1998-08-06 | 信越石英株式会社 | エキシマレーザー用光学石英ガラス部材及びその製造方法 |
US5702495A (en) * | 1993-02-10 | 1997-12-30 | Nikon Corporation | Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
JP2859095B2 (ja) * | 1993-07-30 | 1999-02-17 | 信越化学工業株式会社 | エキシマレーザリソグラフィー用合成石英マスク基板 |
KR100298167B1 (ko) * | 1994-07-07 | 2001-10-24 | 오노 시게오 | 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재 |
US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
US5616159A (en) * | 1995-04-14 | 1997-04-01 | Corning Incorporated | Method of forming high purity fused silica having high resistance to optical damage |
DE69601749T3 (de) * | 1995-06-07 | 2004-04-29 | Corning Inc. | Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten |
-
1996
- 1996-01-03 US US08/582,266 patent/US5707908A/en not_active Expired - Lifetime
- 1996-01-05 DE DE69600216T patent/DE69600216T2/de not_active Expired - Lifetime
- 1996-01-05 KR KR1019960000916A patent/KR100382776B1/ko not_active IP Right Cessation
- 1996-01-05 EP EP96100118A patent/EP0720969B1/de not_active Expired - Lifetime
-
1997
- 1997-09-11 US US08/927,630 patent/US5908482A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0720969A1 (de) | 1996-07-10 |
DE69600216T2 (de) | 1998-09-17 |
KR960029260A (ko) | 1996-08-17 |
EP0720969B1 (de) | 1998-04-08 |
US5908482A (en) | 1999-06-01 |
KR100382776B1 (ko) | 2003-09-22 |
US5707908A (en) | 1998-01-13 |
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