FR2585013B1 - Procede pour la fabrication d'objets en dioxyde de silicium particulaire synthetique de haute purete - Google Patents

Procede pour la fabrication d'objets en dioxyde de silicium particulaire synthetique de haute purete

Info

Publication number
FR2585013B1
FR2585013B1 FR868610430A FR8610430A FR2585013B1 FR 2585013 B1 FR2585013 B1 FR 2585013B1 FR 868610430 A FR868610430 A FR 868610430A FR 8610430 A FR8610430 A FR 8610430A FR 2585013 B1 FR2585013 B1 FR 2585013B1
Authority
FR
France
Prior art keywords
objects
manufacture
silicon dioxide
high purity
particulate silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR868610430A
Other languages
English (en)
Other versions
FR2585013A1 (fr
Inventor
Uwe Wiechmann
Andreas Schultheis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzschmelze GmbH
Heraeus Schott Quarzschmelze GmbH
Original Assignee
Heraeus Quarzschmelze GmbH
Heraeus Schott Quarzschmelze GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzschmelze GmbH, Heraeus Schott Quarzschmelze GmbH filed Critical Heraeus Quarzschmelze GmbH
Publication of FR2585013A1 publication Critical patent/FR2585013A1/fr
Application granted granted Critical
Publication of FR2585013B1 publication Critical patent/FR2585013B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/152—Preparation of hydrogels
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
FR868610430A 1985-07-17 1986-07-17 Procede pour la fabrication d'objets en dioxyde de silicium particulaire synthetique de haute purete Expired - Lifetime FR2585013B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3525495A DE3525495C1 (de) 1985-07-17 1985-07-17 Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid

Publications (2)

Publication Number Publication Date
FR2585013A1 FR2585013A1 (fr) 1987-01-23
FR2585013B1 true FR2585013B1 (fr) 1990-06-29

Family

ID=6275984

Family Applications (1)

Application Number Title Priority Date Filing Date
FR868610430A Expired - Lifetime FR2585013B1 (fr) 1985-07-17 1986-07-17 Procede pour la fabrication d'objets en dioxyde de silicium particulaire synthetique de haute purete

Country Status (5)

Country Link
US (1) US4826521A (fr)
JP (1) JPS6221708A (fr)
DE (1) DE3525495C1 (fr)
FR (1) FR2585013B1 (fr)
GB (1) GB2178020B (fr)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4767429A (en) * 1986-12-11 1988-08-30 American Telephone & Telegraph Co., At&T Bell Laboratories Glass body formed from a vapor-derived gel and process for producing same
JPH02124739A (ja) * 1988-10-31 1990-05-14 Shin Etsu Chem Co Ltd 合成石英ガラスおよびその製造方法
JP2780799B2 (ja) * 1989-01-27 1998-07-30 信越石英株式会社 石英ガラスの製造方法
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
US5158758A (en) * 1989-04-24 1992-10-27 International Minerals & Chemical Corp. Production of silica having high specific surface area
JPH02307830A (ja) * 1989-05-18 1990-12-21 Chisso Corp 石英ガラス粉末の製造方法
JPH0337120A (ja) * 1989-06-30 1991-02-18 Toshiba Ceramics Co Ltd 石英ガラスの製造方法
JP2617822B2 (ja) * 1990-04-10 1997-06-04 日東化学工業株式会社 非焼結状クリストバライト粒子の製造方法
EP0486004B1 (fr) * 1990-11-16 1996-09-11 Mitsubishi Chemical Corporation Procédé pour la fabrication de la poudre de verre de silice à haute pûreté
US5236651A (en) * 1991-12-02 1993-08-17 Akzo N.V. Extrusion, collection, and drying of ceramic precursor gel to form dried gel particles
IT1304475B1 (it) * 1998-08-06 2001-03-19 Sacmi Procedimento ed impianto per la produzione di vetro ed in particolaredi fritte ceramiche.
US7797966B2 (en) * 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US20020083740A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application
US20020117625A1 (en) * 2001-02-26 2002-08-29 Pandelisev Kiril A. Fiber optic enhanced scintillator detector
JP2006219309A (ja) * 2005-02-08 2006-08-24 Asahi Glass Co Ltd 多孔質石英ガラス母材の製造方法及び装置
JP5648640B2 (ja) * 2010-01-07 2015-01-07 三菱マテリアル株式会社 合成非晶質シリカ粉末
KR20140002673A (ko) * 2011-03-23 2014-01-08 미쓰비시 마테리알 가부시키가이샤 합성 비정질 실리카 분말 및 그 제조 방법
CN102491273B (zh) * 2011-11-15 2013-09-04 四川银邦硅业有限公司 用多晶硅副产物四氯化硅制备高浓度盐酸的方法
CN105722788B (zh) 2014-01-29 2018-04-03 三菱综合材料株式会社 合成非晶质二氧化硅粉末及其制造方法
WO2018198774A1 (fr) 2017-04-26 2018-11-01 東ソ－・エスジ－エム株式会社 Verre de quartz résistant aux ultraviolets et son procédé de fabrication

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1596839B1 (de) * 1966-05-07 1970-11-26 Jenaer Glaswerk Schott & Gen Verfahren zur Herstellung von Formkoerpern aus Glaesern bei einer Temperatur unterhalb der ueblichen Schmelztemperatur
US3959174A (en) * 1971-08-24 1976-05-25 W. R. Grace & Co. Method of selectively producing high pore volume silica gel
JPS53298A (en) * 1976-06-23 1978-01-05 Nippon Saafuakutanto Kougiyou Process for producing epoxy resin emulsion
NL7707960A (nl) * 1977-07-18 1979-01-22 Stamicarbon Werkwijze ter bereiding van poreus, zuiver siliciumdioxyde.
NL7707961A (nl) * 1977-07-18 1979-01-22 Stamicarbon Werkwijze ter bereiding van poreus, zuiver siliciumdioxyde.
US4303641A (en) * 1978-05-24 1981-12-01 W. R. Grace & Co. Hydrous silica gel containing dentifrice
US4221691A (en) * 1979-02-16 1980-09-09 Dow Corning Corporation Method of hydrolyzing chlorosilanes
DE2952038C2 (de) * 1979-12-22 1982-03-11 Heraeus Quarzschmelze Gmbh, 6450 Hanau Schmelzvorrichtung aus Quarzglas zum Herstellen von massivem Quarzglas
US4278632A (en) * 1980-02-08 1981-07-14 Westinghouse Electric Corp. Method of conforming clear vitreous gal of silica-titania material
DE3302745A1 (de) * 1983-01-27 1984-08-02 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur herstellung von gegenstaenden aus hochreinem synthetischem quarzglas
JPH05140797A (ja) * 1991-11-18 1993-06-08 Sumitomo Metal Ind Ltd 連続電気めつき鋼帯の製造方法

Also Published As

Publication number Publication date
JPH0475848B2 (fr) 1992-12-02
FR2585013A1 (fr) 1987-01-23
GB8617189D0 (en) 1986-08-20
DE3525495C1 (de) 1987-01-02
JPS6221708A (ja) 1987-01-30
US4826521A (en) 1989-05-02
GB2178020B (en) 1989-12-28
GB2178020A (en) 1987-02-04

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Legal Events

Date Code Title Description
CD Change of name or company name
ST Notification of lapse