JPS6221708A - 粒子状合成高純度二酸化珪素から物品を製造する方法 - Google Patents

粒子状合成高純度二酸化珪素から物品を製造する方法

Info

Publication number
JPS6221708A
JPS6221708A JP61159901A JP15990186A JPS6221708A JP S6221708 A JPS6221708 A JP S6221708A JP 61159901 A JP61159901 A JP 61159901A JP 15990186 A JP15990186 A JP 15990186A JP S6221708 A JPS6221708 A JP S6221708A
Authority
JP
Japan
Prior art keywords
product
particles
drying
silicon dioxide
sieved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61159901A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0475848B2 (enExample
Inventor
ウヴェ・ヴィーヒマン
アンドレアス・シュルトハイス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzschmelze GmbH
Heraeus Schott Quarzschmelze GmbH
Original Assignee
Heraeus Quarzschmelze GmbH
Heraeus Schott Quarzschmelze GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzschmelze GmbH, Heraeus Schott Quarzschmelze GmbH filed Critical Heraeus Quarzschmelze GmbH
Publication of JPS6221708A publication Critical patent/JPS6221708A/ja
Publication of JPH0475848B2 publication Critical patent/JPH0475848B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/152—Preparation of hydrogels
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
JP61159901A 1985-07-17 1986-07-09 粒子状合成高純度二酸化珪素から物品を製造する方法 Granted JPS6221708A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3525495.5 1985-07-17
DE3525495A DE3525495C1 (de) 1985-07-17 1985-07-17 Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid

Publications (2)

Publication Number Publication Date
JPS6221708A true JPS6221708A (ja) 1987-01-30
JPH0475848B2 JPH0475848B2 (enExample) 1992-12-02

Family

ID=6275984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61159901A Granted JPS6221708A (ja) 1985-07-17 1986-07-09 粒子状合成高純度二酸化珪素から物品を製造する方法

Country Status (5)

Country Link
US (1) US4826521A (enExample)
JP (1) JPS6221708A (enExample)
DE (1) DE3525495C1 (enExample)
FR (1) FR2585013B1 (enExample)
GB (1) GB2178020B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02199037A (ja) * 1989-01-27 1990-08-07 Shinetsu Sekiei Kk 石英ガラスの製造方法
JPH0337120A (ja) * 1989-06-30 1991-02-18 Toshiba Ceramics Co Ltd 石英ガラスの製造方法

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4767429A (en) * 1986-12-11 1988-08-30 American Telephone & Telegraph Co., At&T Bell Laboratories Glass body formed from a vapor-derived gel and process for producing same
JPH02124739A (ja) * 1988-10-31 1990-05-14 Shin Etsu Chem Co Ltd 合成石英ガラスおよびその製造方法
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
US5158758A (en) * 1989-04-24 1992-10-27 International Minerals & Chemical Corp. Production of silica having high specific surface area
JPH02307830A (ja) * 1989-05-18 1990-12-21 Chisso Corp 石英ガラス粉末の製造方法
JP2617822B2 (ja) * 1990-04-10 1997-06-04 日東化学工業株式会社 非焼結状クリストバライト粒子の製造方法
EP0486004B1 (en) * 1990-11-16 1996-09-11 Mitsubishi Chemical Corporation Method for producing a high-purity silica glass powder
US5236651A (en) * 1991-12-02 1993-08-17 Akzo N.V. Extrusion, collection, and drying of ceramic precursor gel to form dried gel particles
IT1304475B1 (it) * 1998-08-06 2001-03-19 Sacmi Procedimento ed impianto per la produzione di vetro ed in particolaredi fritte ceramiche.
US20020083740A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application
US7797966B2 (en) * 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US20020117625A1 (en) * 2001-02-26 2002-08-29 Pandelisev Kiril A. Fiber optic enhanced scintillator detector
JP2006219309A (ja) * 2005-02-08 2006-08-24 Asahi Glass Co Ltd 多孔質石英ガラス母材の製造方法及び装置
JP5648640B2 (ja) * 2010-01-07 2015-01-07 三菱マテリアル株式会社 合成非晶質シリカ粉末
US9446959B2 (en) 2011-03-23 2016-09-20 Mitsubishi Materials Corporation Synthetic amorphous silica powder and method for producing same
CN102491273B (zh) * 2011-11-15 2013-09-04 四川银邦硅业有限公司 用多晶硅副产物四氯化硅制备高浓度盐酸的方法
CN105722788B (zh) 2014-01-29 2018-04-03 三菱综合材料株式会社 合成非晶质二氧化硅粉末及其制造方法
WO2018198774A1 (ja) 2017-04-26 2018-11-01 東ソ－・エスジ－エム株式会社 耐紫外線性石英ガラス及びその製造方法
CN119873846B (zh) * 2025-03-06 2025-10-24 浙江大学杭州国际科创中心 一种合成二氧化硅中氯离子杂质的深度去除方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59137325A (ja) * 1983-01-27 1984-08-07 ワツカ−・ヘミトロニク・ゲゼルシヤフト・フユア・エレクトロニク・グルントシユトツフエ・ミツト・ベシユレンクテル・ハフツング 高純度合成石英ガラスからなる物品の製法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1596839B1 (de) * 1966-05-07 1970-11-26 Jenaer Glaswerk Schott & Gen Verfahren zur Herstellung von Formkoerpern aus Glaesern bei einer Temperatur unterhalb der ueblichen Schmelztemperatur
US3959174A (en) * 1971-08-24 1976-05-25 W. R. Grace & Co. Method of selectively producing high pore volume silica gel
JPS53298A (en) * 1976-06-23 1978-01-05 Nippon Saafuakutanto Kougiyou Process for producing epoxy resin emulsion
NL7707960A (nl) * 1977-07-18 1979-01-22 Stamicarbon Werkwijze ter bereiding van poreus, zuiver siliciumdioxyde.
NL7707961A (nl) * 1977-07-18 1979-01-22 Stamicarbon Werkwijze ter bereiding van poreus, zuiver siliciumdioxyde.
US4303641A (en) * 1978-05-24 1981-12-01 W. R. Grace & Co. Hydrous silica gel containing dentifrice
US4221691A (en) * 1979-02-16 1980-09-09 Dow Corning Corporation Method of hydrolyzing chlorosilanes
DE2952038C2 (de) * 1979-12-22 1982-03-11 Heraeus Quarzschmelze Gmbh, 6450 Hanau Schmelzvorrichtung aus Quarzglas zum Herstellen von massivem Quarzglas
US4278632A (en) * 1980-02-08 1981-07-14 Westinghouse Electric Corp. Method of conforming clear vitreous gal of silica-titania material
JPH05140797A (ja) * 1991-11-18 1993-06-08 Sumitomo Metal Ind Ltd 連続電気めつき鋼帯の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59137325A (ja) * 1983-01-27 1984-08-07 ワツカ−・ヘミトロニク・ゲゼルシヤフト・フユア・エレクトロニク・グルントシユトツフエ・ミツト・ベシユレンクテル・ハフツング 高純度合成石英ガラスからなる物品の製法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02199037A (ja) * 1989-01-27 1990-08-07 Shinetsu Sekiei Kk 石英ガラスの製造方法
JPH0337120A (ja) * 1989-06-30 1991-02-18 Toshiba Ceramics Co Ltd 石英ガラスの製造方法

Also Published As

Publication number Publication date
FR2585013A1 (fr) 1987-01-23
DE3525495C1 (de) 1987-01-02
GB2178020B (en) 1989-12-28
GB2178020A (en) 1987-02-04
US4826521A (en) 1989-05-02
FR2585013B1 (fr) 1990-06-29
GB8617189D0 (en) 1986-08-20
JPH0475848B2 (enExample) 1992-12-02

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Legal Events

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LAPS Cancellation because of no payment of annual fees