DE3316114A1 - Verbundfilm, insbesondere fuer elektrolumineszenzstrukturen - Google Patents

Verbundfilm, insbesondere fuer elektrolumineszenzstrukturen

Info

Publication number
DE3316114A1
DE3316114A1 DE3316114A DE3316114A DE3316114A1 DE 3316114 A1 DE3316114 A1 DE 3316114A1 DE 3316114 A DE3316114 A DE 3316114A DE 3316114 A DE3316114 A DE 3316114A DE 3316114 A1 DE3316114 A1 DE 3316114A1
Authority
DE
Germany
Prior art keywords
film
layers
thickness
tio
properties
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE3316114A
Other languages
German (de)
English (en)
Other versions
DE3316114C2 (https=
Inventor
Jarmo Dipl.-Ing. 00350 Helsinki Skarp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ELKOTRADE AG ZUG CH
Original Assignee
Osakeyhtioe Lohja 08700 Virkkala AB
Lohja Oy AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osakeyhtioe Lohja 08700 Virkkala AB, Lohja Oy AB filed Critical Osakeyhtioe Lohja 08700 Virkkala AB
Publication of DE3316114A1 publication Critical patent/DE3316114A1/de
Application granted granted Critical
Publication of DE3316114C2 publication Critical patent/DE3316114C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/662—Laminate layers, e.g. stacks of alternating high-k metal oxides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H10P14/6339—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/6939—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal
    • H10P14/69394—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal the material containing titanium, e.g. TiO2
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/6939—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal
    • H10P14/69391—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal the material containing aluminium, e.g. Al2O3
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y10T428/24975—No layer or component greater than 5 mils thick

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
DE3316114A 1982-05-10 1983-05-03 Verbundfilm, insbesondere fuer elektrolumineszenzstrukturen Granted DE3316114A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI821647A FI64878C (fi) 1982-05-10 1982-05-10 Kombinationsfilm foer isynnerhet tunnfilmelektroluminensstrukturer

Publications (2)

Publication Number Publication Date
DE3316114A1 true DE3316114A1 (de) 1983-12-08
DE3316114C2 DE3316114C2 (https=) 1992-01-02

Family

ID=8515494

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3316114A Granted DE3316114A1 (de) 1982-05-10 1983-05-03 Verbundfilm, insbesondere fuer elektrolumineszenzstrukturen

Country Status (7)

Country Link
US (1) US4486487A (https=)
JP (1) JPS58206095A (https=)
DD (1) DD209845A5 (https=)
DE (1) DE3316114A1 (https=)
FI (1) FI64878C (https=)
FR (1) FR2526622B1 (https=)
GB (1) GB2120845B (https=)

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CN115298721B (zh) * 2020-03-26 2023-09-26 夏普株式会社 发光元件以及显示装置
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Also Published As

Publication number Publication date
JPS645440B2 (https=) 1989-01-30
FR2526622A1 (fr) 1983-11-10
DD209845A5 (de) 1984-05-23
FR2526622B1 (fr) 1986-01-24
GB8311576D0 (en) 1983-06-02
FI64878C (fi) 1984-01-10
FI64878B (fi) 1983-09-30
GB2120845A (en) 1983-12-07
US4486487A (en) 1984-12-04
JPS58206095A (ja) 1983-12-01
DE3316114C2 (https=) 1992-01-02
FI821647A0 (fi) 1982-05-10
GB2120845B (en) 1986-01-29

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