DE2314868A1 - Photolackzusammensetzung - Google Patents
PhotolackzusammensetzungInfo
- Publication number
- DE2314868A1 DE2314868A1 DE19732314868 DE2314868A DE2314868A1 DE 2314868 A1 DE2314868 A1 DE 2314868A1 DE 19732314868 DE19732314868 DE 19732314868 DE 2314868 A DE2314868 A DE 2314868A DE 2314868 A1 DE2314868 A1 DE 2314868A1
- Authority
- DE
- Germany
- Prior art keywords
- azido
- photoresist composition
- composition according
- iodide
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B62/00—Reactive dyes, i.e. dyes which form covalent bonds with the substrates or which polymerise with themselves
- C09B62/44—Reactive dyes, i.e. dyes which form covalent bonds with the substrates or which polymerise with themselves with the reactive group not directly attached to a heterocyclic ring
- C09B62/78—Reactive dyes, i.e. dyes which form covalent bonds with the substrates or which polymerise with themselves with the reactive group not directly attached to a heterocyclic ring with other reactive groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/0085—Azides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US23979472A | 1972-03-30 | 1972-03-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE2314868A1 true DE2314868A1 (de) | 1973-10-04 |
Family
ID=22903773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19732314868 Pending DE2314868A1 (de) | 1972-03-30 | 1973-03-26 | Photolackzusammensetzung |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5617655B2 (US07321065-20080122-C00020.png) |
DE (1) | DE2314868A1 (US07321065-20080122-C00020.png) |
FR (1) | FR2177770A1 (US07321065-20080122-C00020.png) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0154994A2 (en) * | 1984-03-13 | 1985-09-18 | Asahi Kasei Kogyo Kabushiki Kaisha | Improved surface tack-free photosensitive resin composition and a method using same |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5255399U (US07321065-20080122-C00020.png) * | 1975-10-16 | 1977-04-21 | ||
JPS5494499U (US07321065-20080122-C00020.png) * | 1977-11-09 | 1979-07-04 | ||
JPS6278986U (US07321065-20080122-C00020.png) * | 1985-11-07 | 1987-05-20 |
-
1973
- 1973-02-20 FR FR7306803A patent/FR2177770A1/fr active Granted
- 1973-02-28 JP JP2340573A patent/JPS5617655B2/ja not_active Expired
- 1973-03-26 DE DE19732314868 patent/DE2314868A1/de active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0154994A2 (en) * | 1984-03-13 | 1985-09-18 | Asahi Kasei Kogyo Kabushiki Kaisha | Improved surface tack-free photosensitive resin composition and a method using same |
EP0154994A3 (en) * | 1984-03-13 | 1986-01-22 | Asahi Kasei Kogyo Kabushiki Kaisha | A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method |
US4716094A (en) * | 1984-03-13 | 1987-12-29 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method |
Also Published As
Publication number | Publication date |
---|---|
FR2177770A1 (en) | 1973-11-09 |
JPS4917223A (US07321065-20080122-C00020.png) | 1974-02-15 |
JPS5617655B2 (US07321065-20080122-C00020.png) | 1981-04-23 |
FR2177770B1 (US07321065-20080122-C00020.png) | 1979-01-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OHJ | Non-payment of the annual fee |