DE2307510A1 - Dotieren von cadmiumtelluridkristallen - Google Patents
Dotieren von cadmiumtelluridkristallenInfo
- Publication number
- DE2307510A1 DE2307510A1 DE19732307510 DE2307510A DE2307510A1 DE 2307510 A1 DE2307510 A1 DE 2307510A1 DE 19732307510 DE19732307510 DE 19732307510 DE 2307510 A DE2307510 A DE 2307510A DE 2307510 A1 DE2307510 A1 DE 2307510A1
- Authority
- DE
- Germany
- Prior art keywords
- doping
- zone
- cadmium telluride
- solution
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 title claims description 13
- 239000013078 crystal Substances 0.000 title description 15
- 239000000654 additive Substances 0.000 claims description 12
- 230000000996 additive effect Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 229910052714 tellurium Inorganic materials 0.000 claims description 8
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical group [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 6
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052733 gallium Inorganic materials 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000013508 migration Methods 0.000 claims 1
- 230000005012 migration Effects 0.000 claims 1
- 239000000243 solution Substances 0.000 description 18
- 239000003708 ampul Substances 0.000 description 15
- 229910004613 CdTe Inorganic materials 0.000 description 14
- 239000002019 doping agent Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000012467 final product Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/18, H10D48/04 and H10D48/07, with or without impurities, e.g. doping materials
- H01L21/38—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions
- H01L21/388—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions using diffusion into or out of a solid from or into a liquid phase, e.g. alloy diffusion processes
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/02—Zone-melting with a solvent, e.g. travelling solvent process
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22693572A | 1972-02-16 | 1972-02-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE2307510A1 true DE2307510A1 (de) | 1973-10-04 |
Family
ID=22851074
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19732307510 Pending DE2307510A1 (de) | 1972-02-16 | 1973-02-15 | Dotieren von cadmiumtelluridkristallen |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS4890678A (enrdf_load_html_response) |
DE (1) | DE2307510A1 (enrdf_load_html_response) |
FR (1) | FR2172232A1 (enrdf_load_html_response) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4690725A (en) * | 1985-11-22 | 1987-09-01 | Cominco Ltd. | Purification of Cd and Te by zone refining |
-
1973
- 1973-02-14 FR FR7305202A patent/FR2172232A1/fr active Granted
- 1973-02-15 DE DE19732307510 patent/DE2307510A1/de active Pending
- 1973-02-15 JP JP1883173A patent/JPS4890678A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS4890678A (enrdf_load_html_response) | 1973-11-26 |
FR2172232B3 (enrdf_load_html_response) | 1976-02-13 |
FR2172232A1 (en) | 1973-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE102015118504B4 (de) | Verfahren zur Herstellung eines SiC-Einkristalls | |
DE2925679A1 (de) | Verfahren zur herstellung von siliciumstaeben | |
DE3781016T2 (de) | Verfahren zur zuechtung eines multikomponent-kristalls. | |
DE1034772B (de) | Verfahren zum Ziehen von spannungsfreien Einkristallen fast konstanter Aktivatorkonzentration aus einer Halbleiterschmelze | |
DE3123233C2 (de) | Verfahren zur Herstellung von CdS-,CdSe-,ZnS-oder ZnSe-Halbleiterkristallen | |
DE1025995B (de) | Verfahren zur Herstellung von Halbleiterkoerpern mit aneinandergrenzenden Zonen verschiedener Leitfaehigkeit | |
DE1934369A1 (de) | Verfahren zum Herstellen von Einkristallen aus III-V-Verbindungen | |
DE69312582T2 (de) | Verfahren zur Herstellung eines Metalloxid-Kristalls | |
DE2241710B2 (de) | Schiffchen zum Züchten von Halbleitereinkristallen nach dem horizontalen Bridgman-Verfahren | |
DE1619977C3 (de) | Zweifach dotiertes Galliumarsenid | |
DE1667604B1 (de) | Verfahren zur herstellung von kristallinem cadmiumtellurid | |
DE2307510A1 (de) | Dotieren von cadmiumtelluridkristallen | |
DE2038875A1 (de) | Verfahren zur Herstellung gewachsener Mischkristalle | |
DE1719466C3 (de) | Verfahren zum Aufwachsen einer Mehrkomponentenhalbleiterschicht | |
DE2422251C2 (de) | Verfahren zur Herstellung eines dotierten Cadmiumtellurid-Einkristalls | |
DE19502029A1 (de) | Verfahren zur Herstellung von Einkristall-Zinkselenid in Masse | |
DE2904301C2 (enrdf_load_html_response) | ||
DE68912686T2 (de) | Verfahren zur Herstellung eines Einkristalls aus einer Halbleiter-Verbindung. | |
DE1161036B (de) | Verfahren zur Herstellung von hochdotierten AB-Halbleiterverbindungen | |
DE3531949A1 (de) | Verfahren zur herstellung von ss-zinkdiphosphid-einkristallen | |
DE2137772C3 (de) | Verfahren zum Züchten von Kristallen aus halbleitenden Verbindungen | |
DE1667604C (de) | Verfahren zur Herstellung von kristallinem Cadmiumtellurid | |
DE3210827C2 (de) | Verfahren zum Züchten eines III/V-Verbindungs-Einkristalls | |
DE2418711A1 (de) | Verfahren zur herstellung wismutdotierter eisengranateinkristalle | |
DE3830170C2 (enrdf_load_html_response) |