DE2259180A1 - Verfahren zum haerten von photoresisten - Google Patents

Verfahren zum haerten von photoresisten

Info

Publication number
DE2259180A1
DE2259180A1 DE19722259180 DE2259180A DE2259180A1 DE 2259180 A1 DE2259180 A1 DE 2259180A1 DE 19722259180 DE19722259180 DE 19722259180 DE 2259180 A DE2259180 A DE 2259180A DE 2259180 A1 DE2259180 A1 DE 2259180A1
Authority
DE
Germany
Prior art keywords
resist
metal surface
heating
areas
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19722259180
Other languages
German (de)
English (en)
Inventor
Auf Nichtnennung Antrag
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buckbee Mears Co
Original Assignee
Buckbee Mears Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Buckbee Mears Co filed Critical Buckbee Mears Co
Publication of DE2259180A1 publication Critical patent/DE2259180A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
DE19722259180 1972-02-03 1972-12-02 Verfahren zum haerten von photoresisten Pending DE2259180A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22308272A 1972-02-03 1972-02-03

Publications (1)

Publication Number Publication Date
DE2259180A1 true DE2259180A1 (de) 1973-08-09

Family

ID=22834951

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19722259180 Pending DE2259180A1 (de) 1972-02-03 1972-12-02 Verfahren zum haerten von photoresisten

Country Status (8)

Country Link
JP (1) JPS4887904A (es)
BE (1) BE791212A (es)
CA (1) CA981507A (es)
DE (1) DE2259180A1 (es)
FR (1) FR2171724A5 (es)
GB (1) GB1387350A (es)
IT (1) IT972853B (es)
NL (1) NL7215272A (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0049840A2 (de) * 1980-10-13 1982-04-21 Hoechst Aktiengesellschaft Verfahren zur Herstellung von Reliefkopien

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228370B2 (es) * 1972-03-06 1977-07-26
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
JPS5890636A (ja) * 1981-11-24 1983-05-30 Fuji Photo Film Co Ltd 光重合性組成物を用いた感光材料による画像形成方法および現像ユニツト
US4389482A (en) * 1981-12-14 1983-06-21 International Business Machines Corporation Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
DE3731333A1 (de) * 1987-09-15 1989-03-30 Schering Ag Verfahren zur herstellung von leiternetzwerken
JPH1026834A (ja) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd 画像形成方法
US11581187B2 (en) * 2018-12-20 2023-02-14 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Method of heating SOC film on wafer by electromagnetic wave generator and heating apparatus using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0049840A2 (de) * 1980-10-13 1982-04-21 Hoechst Aktiengesellschaft Verfahren zur Herstellung von Reliefkopien
EP0049840A3 (en) * 1980-10-13 1982-05-19 Hoechst Aktiengesellschaft Process for the production of relief copies

Also Published As

Publication number Publication date
IT972853B (it) 1974-05-31
JPS4887904A (es) 1973-11-19
GB1387350A (en) 1975-03-19
NL7215272A (es) 1973-08-07
BE791212A (fr) 1973-03-01
FR2171724A5 (es) 1973-09-21
CA981507A (en) 1976-01-13

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Legal Events

Date Code Title Description
OHA Expiration of time for request for examination