GB1387350A - Method of preparing a photoresist pattern upon a metal surface - Google Patents
Method of preparing a photoresist pattern upon a metal surfaceInfo
- Publication number
- GB1387350A GB1387350A GB4680472A GB4680472A GB1387350A GB 1387350 A GB1387350 A GB 1387350A GB 4680472 A GB4680472 A GB 4680472A GB 4680472 A GB4680472 A GB 4680472A GB 1387350 A GB1387350 A GB 1387350A
- Authority
- GB
- United Kingdom
- Prior art keywords
- resist
- heating
- preparing
- metal surface
- photoresist pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
1387350 Photo-resist processes BUCKBEE MEARS CO 11 Oct 1972 [3 Feb 1972] 46804/72 Heading G2C A process for producing a resist image comprises (a) applying a photo-resist layer to a metal support and heating to dry the layer, (b) imagewise exposing to harden the exposed areas, (c) heating to 90-120‹F for 30 to 120 seconds and (d) developing to remove the unexposed areas. The heating step ensures that the entire depth of the exposed areas are hardened and increases their adhesion for the support. The developed resist may also be heated to remove any remaining solvent.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22308272A | 1972-02-03 | 1972-02-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1387350A true GB1387350A (en) | 1975-03-19 |
Family
ID=22834951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4680472A Expired GB1387350A (en) | 1972-02-03 | 1972-10-11 | Method of preparing a photoresist pattern upon a metal surface |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS4887904A (en) |
BE (1) | BE791212A (en) |
CA (1) | CA981507A (en) |
DE (1) | DE2259180A1 (en) |
FR (1) | FR2171724A5 (en) |
GB (1) | GB1387350A (en) |
IT (1) | IT972853B (en) |
NL (1) | NL7215272A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2315128A (en) * | 1996-07-09 | 1998-01-21 | Tokyo Ohka Kogyo Co Ltd | Image formation method |
CN111352313A (en) * | 2018-12-20 | 2020-06-30 | 夏泰鑫半导体(青岛)有限公司 | Method for heating spin-on film on wafer and heating device |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228370B2 (en) * | 1972-03-06 | 1977-07-26 | ||
DE2529054C2 (en) * | 1975-06-30 | 1982-04-29 | Ibm Deutschland Gmbh, 7000 Stuttgart | Process for the production of a resist image which is negative for the original |
DE3038605A1 (en) | 1980-10-13 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | METHOD FOR PRODUCING RELIEF COPIES |
JPS5890636A (en) * | 1981-11-24 | 1983-05-30 | Fuji Photo Film Co Ltd | Method for forming image with photosensitive material using photopolymerizable composition and developing unit |
US4389482A (en) * | 1981-12-14 | 1983-06-21 | International Business Machines Corporation | Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light |
DE3731333A1 (en) * | 1987-09-15 | 1989-03-30 | Schering Ag | METHOD FOR THE PRODUCTION OF LADDER NETWORKS |
-
0
- BE BE791212D patent/BE791212A/en unknown
-
1972
- 1972-10-10 CA CA153,534A patent/CA981507A/en not_active Expired
- 1972-10-11 GB GB4680472A patent/GB1387350A/en not_active Expired
- 1972-11-10 NL NL7215272A patent/NL7215272A/xx not_active Application Discontinuation
- 1972-12-02 DE DE19722259180 patent/DE2259180A1/en active Pending
- 1972-12-18 FR FR7245032A patent/FR2171724A5/fr not_active Expired
- 1972-12-22 IT IT3350772A patent/IT972853B/en active
-
1973
- 1973-01-30 JP JP1166773A patent/JPS4887904A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2315128A (en) * | 1996-07-09 | 1998-01-21 | Tokyo Ohka Kogyo Co Ltd | Image formation method |
US5908734A (en) * | 1996-07-09 | 1999-06-01 | Tokyo Ohka Kogyo Co., Ltd. | Image formation method with a post exposure heating step |
GB2315128B (en) * | 1996-07-09 | 2000-06-14 | Tokyo Ohka Kogyo Co Ltd | Image formation method |
CN111352313A (en) * | 2018-12-20 | 2020-06-30 | 夏泰鑫半导体(青岛)有限公司 | Method for heating spin-on film on wafer and heating device |
Also Published As
Publication number | Publication date |
---|---|
FR2171724A5 (en) | 1973-09-21 |
IT972853B (en) | 1974-05-31 |
CA981507A (en) | 1976-01-13 |
BE791212A (en) | 1973-03-01 |
NL7215272A (en) | 1973-08-07 |
DE2259180A1 (en) | 1973-08-09 |
JPS4887904A (en) | 1973-11-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |