GB1387350A - Method of preparing a photoresist pattern upon a metal surface - Google Patents

Method of preparing a photoresist pattern upon a metal surface

Info

Publication number
GB1387350A
GB1387350A GB4680472A GB4680472A GB1387350A GB 1387350 A GB1387350 A GB 1387350A GB 4680472 A GB4680472 A GB 4680472A GB 4680472 A GB4680472 A GB 4680472A GB 1387350 A GB1387350 A GB 1387350A
Authority
GB
United Kingdom
Prior art keywords
resist
heating
preparing
metal surface
photoresist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4680472A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buckbee Mears Co
Original Assignee
Buckbee Mears Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Buckbee Mears Co filed Critical Buckbee Mears Co
Publication of GB1387350A publication Critical patent/GB1387350A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/38Treatment before imagewise removal, e.g. prebaking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/168Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1387350 Photo-resist processes BUCKBEE MEARS CO 11 Oct 1972 [3 Feb 1972] 46804/72 Heading G2C A process for producing a resist image comprises (a) applying a photo-resist layer to a metal support and heating to dry the layer, (b) imagewise exposing to harden the exposed areas, (c) heating to 90-120‹F for 30 to 120 seconds and (d) developing to remove the unexposed areas. The heating step ensures that the entire depth of the exposed areas are hardened and increases their adhesion for the support. The developed resist may also be heated to remove any remaining solvent.
GB4680472A 1972-02-03 1972-10-11 Method of preparing a photoresist pattern upon a metal surface Expired GB1387350A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22308272A 1972-02-03 1972-02-03

Publications (1)

Publication Number Publication Date
GB1387350A true GB1387350A (en) 1975-03-19

Family

ID=22834951

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4680472A Expired GB1387350A (en) 1972-02-03 1972-10-11 Method of preparing a photoresist pattern upon a metal surface

Country Status (8)

Country Link
JP (1) JPS4887904A (en)
BE (1) BE791212A (en)
CA (1) CA981507A (en)
DE (1) DE2259180A1 (en)
FR (1) FR2171724A5 (en)
GB (1) GB1387350A (en)
IT (1) IT972853B (en)
NL (1) NL7215272A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2315128A (en) * 1996-07-09 1998-01-21 Tokyo Ohka Kogyo Co Ltd Image formation method
CN111352313A (en) * 2018-12-20 2020-06-30 夏泰鑫半导体(青岛)有限公司 Method for heating spin-on film on wafer and heating device

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228370B2 (en) * 1972-03-06 1977-07-26
DE2529054C2 (en) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Process for the production of a resist image which is negative for the original
DE3038605A1 (en) 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt METHOD FOR PRODUCING RELIEF COPIES
JPS5890636A (en) * 1981-11-24 1983-05-30 Fuji Photo Film Co Ltd Method for forming image with photosensitive material using photopolymerizable composition and developing unit
US4389482A (en) * 1981-12-14 1983-06-21 International Business Machines Corporation Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
DE3731333A1 (en) * 1987-09-15 1989-03-30 Schering Ag METHOD FOR THE PRODUCTION OF LADDER NETWORKS

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2315128A (en) * 1996-07-09 1998-01-21 Tokyo Ohka Kogyo Co Ltd Image formation method
US5908734A (en) * 1996-07-09 1999-06-01 Tokyo Ohka Kogyo Co., Ltd. Image formation method with a post exposure heating step
GB2315128B (en) * 1996-07-09 2000-06-14 Tokyo Ohka Kogyo Co Ltd Image formation method
CN111352313A (en) * 2018-12-20 2020-06-30 夏泰鑫半导体(青岛)有限公司 Method for heating spin-on film on wafer and heating device

Also Published As

Publication number Publication date
FR2171724A5 (en) 1973-09-21
IT972853B (en) 1974-05-31
CA981507A (en) 1976-01-13
BE791212A (en) 1973-03-01
NL7215272A (en) 1973-08-07
DE2259180A1 (en) 1973-08-09
JPS4887904A (en) 1973-11-19

Similar Documents

Publication Publication Date Title
MY106633A (en) Positive acting photoresists and method of producing same.
GB1514109A (en) Method of making resist mask on a substrate
SE7610739L (en) PROCEDURE FOR MANUFACTURE OF PLANT PRINTING MATERIALS BY LASER RAY
GB1263122A (en) Image reproduction process
NL7602349A (en) METHOD OF ALIGNING MASK AND A PLATE.
GB1387350A (en) Method of preparing a photoresist pattern upon a metal surface
JPS5569265A (en) Pattern-forming method
NL7903137A (en) METHOD FOR THE MANUFACTURE OF A LITHOGRAPHIC PRINTING PLATE.
NL7605422A (en) METHOD OF EXPOSURE ACCORDING TO A PRE-DETERMINED PATTERN OF A SURFACE OF A LIGHT-SENSITIVE ORGAN.
SE7714551L (en) PROCEDURE FOR PREPARING RELIEF RECORDS
DE69131647D1 (en) IMAGE GENERATION METHOD
ES382004A1 (en) Production of coloured colloid patterns
ATE17612T1 (en) PROCESS FOR BURNING LIGHT-SENSITIVE COATINGS IN THE MANUFACTURE OF PRINTING FORMES.
DK526781A (en) METHOD FOR MAKING RELIEF COPIES
ATE47631T1 (en) PROCESS FOR MAKING PHOTORESIST STRUCTURES.
GB1293722A (en) Photoresist process
GB1492955A (en) Method of forming a negative resist using an epoxy compound and a polymer
JPS51114931A (en) Photoresist pattern formation method
JP2603935B2 (en) Method of forming resist pattern
GB1282126A (en) Method of forming a pattern on a metal roll surface
GB1294355A (en) Photographic process
ES440747A1 (en) Method of producing etch-resistant stencils and stencils produced thereby
JPS5541728A (en) Pattern formation by thick film paste
GB1453253A (en) Photomasking method
ES371197A1 (en) Photographic method for producing a metallic pattern with a metal resinate

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee