CA981507A - Process for hardening photoresist - Google Patents

Process for hardening photoresist

Info

Publication number
CA981507A
CA981507A CA153,534A CA153534A CA981507A CA 981507 A CA981507 A CA 981507A CA 153534 A CA153534 A CA 153534A CA 981507 A CA981507 A CA 981507A
Authority
CA
Canada
Prior art keywords
hardening photoresist
photoresist
hardening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA153,534A
Other versions
CA153534S (en
Inventor
William D. Cross
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buckbee Mears Co
Original Assignee
Buckbee Mears Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Buckbee Mears Co filed Critical Buckbee Mears Co
Application granted granted Critical
Publication of CA981507A publication Critical patent/CA981507A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
CA153,534A 1972-02-03 1972-10-10 Process for hardening photoresist Expired CA981507A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22308272A 1972-02-03 1972-02-03

Publications (1)

Publication Number Publication Date
CA981507A true CA981507A (en) 1976-01-13

Family

ID=22834951

Family Applications (1)

Application Number Title Priority Date Filing Date
CA153,534A Expired CA981507A (en) 1972-02-03 1972-10-10 Process for hardening photoresist

Country Status (8)

Country Link
JP (1) JPS4887904A (en)
BE (1) BE791212A (en)
CA (1) CA981507A (en)
DE (1) DE2259180A1 (en)
FR (1) FR2171724A5 (en)
GB (1) GB1387350A (en)
IT (1) IT972853B (en)
NL (1) NL7215272A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228370B2 (en) * 1972-03-06 1977-07-26
DE2529054C2 (en) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Process for the production of a resist image which is negative for the original
DE3038605A1 (en) * 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt METHOD FOR PRODUCING RELIEF COPIES
JPS5890636A (en) * 1981-11-24 1983-05-30 Fuji Photo Film Co Ltd Method for forming image with photosensitive material using photopolymerizable composition and developing unit
US4389482A (en) * 1981-12-14 1983-06-21 International Business Machines Corporation Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
DE3731333A1 (en) * 1987-09-15 1989-03-30 Schering Ag METHOD FOR THE PRODUCTION OF LADDER NETWORKS
JPH1026834A (en) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd Image forming method
US11581187B2 (en) * 2018-12-20 2023-02-14 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Method of heating SOC film on wafer by electromagnetic wave generator and heating apparatus using the same

Also Published As

Publication number Publication date
DE2259180A1 (en) 1973-08-09
BE791212A (en) 1973-03-01
FR2171724A5 (en) 1973-09-21
IT972853B (en) 1974-05-31
JPS4887904A (en) 1973-11-19
NL7215272A (en) 1973-08-07
GB1387350A (en) 1975-03-19

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