ES371197A1 - Photographic method for producing a metallic pattern with a metal resinate - Google Patents
Photographic method for producing a metallic pattern with a metal resinateInfo
- Publication number
- ES371197A1 ES371197A1 ES371197A ES371197A ES371197A1 ES 371197 A1 ES371197 A1 ES 371197A1 ES 371197 A ES371197 A ES 371197A ES 371197 A ES371197 A ES 371197A ES 371197 A1 ES371197 A1 ES 371197A1
- Authority
- ES
- Spain
- Prior art keywords
- resist
- resinate
- metal
- metallic pattern
- specified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
- H05K3/106—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam by photographic methods
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Engineering (AREA)
- ing And Chemical Polishing (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
Metal patterns are produced by imagewise exposing a material comprising a heat-resistant support coated with a layer of a photo-resist and a transparent metal resinate, developing to remove the more soluble areas of the resist and resinate and then heating the material to remove the resist and to convert the metal resinate to a metallic pattern. Specified supports are glass and ceramics while the resist specified is an o-naphthoquinone diazide and the resinate specified is a gold sulphoresinate. After the resist is removed, the material is preferably further heated to strengthen the bond between the metal image and support.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US75923268A | 1968-09-11 | 1968-09-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES371197A1 true ES371197A1 (en) | 1971-08-16 |
Family
ID=25054889
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES371197A Expired ES371197A1 (en) | 1968-09-11 | 1969-09-04 | Photographic method for producing a metallic pattern with a metal resinate |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE738616A (en) |
DE (1) | DE1943972A1 (en) |
ES (1) | ES371197A1 (en) |
FR (1) | FR2017782A1 (en) |
GB (1) | GB1247973A (en) |
NL (1) | NL6913774A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7745101B2 (en) | 2006-06-02 | 2010-06-29 | Eastman Kodak Company | Nanoparticle patterning process |
-
1969
- 1969-08-29 DE DE19691943972 patent/DE1943972A1/en active Pending
- 1969-09-04 ES ES371197A patent/ES371197A1/en not_active Expired
- 1969-09-09 FR FR6930577A patent/FR2017782A1/fr not_active Withdrawn
- 1969-09-09 BE BE738616D patent/BE738616A/xx unknown
- 1969-09-10 GB GB4461469A patent/GB1247973A/en not_active Expired
- 1969-09-10 NL NL6913774A patent/NL6913774A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
GB1247973A (en) | 1971-09-29 |
DE1943972A1 (en) | 1970-09-03 |
BE738616A (en) | 1970-02-16 |
FR2017782A1 (en) | 1970-05-22 |
NL6913774A (en) | 1970-03-13 |
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