GB1247973A - Photographic method for producing a metallic pattern with a metal resinate - Google Patents

Photographic method for producing a metallic pattern with a metal resinate

Info

Publication number
GB1247973A
GB1247973A GB4461469A GB4461469A GB1247973A GB 1247973 A GB1247973 A GB 1247973A GB 4461469 A GB4461469 A GB 4461469A GB 4461469 A GB4461469 A GB 4461469A GB 1247973 A GB1247973 A GB 1247973A
Authority
GB
United Kingdom
Prior art keywords
resist
resinate
metal
specified
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4461469A
Inventor
Frederick Wells Brill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of GB1247973A publication Critical patent/GB1247973A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • H05K3/106—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam by photographic methods
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

1,247,973. Photographic process for producing metal patterns. RCA CORPORATION. Sept. 10, 1969 [Sept. 11, 1968], No. 44614/69. Heading G2C. Metal patterns are produced by imagewise exposing a material comprising a heat-resistant support coated with a layer of a photo-resist and a transparent metal resinate, developing to remove the more soluble areas of the resist and resinate and then heating the material to remove the resist and to convert the metal resinate to a metallic pattern. Specified supports are glass and ceramics while the resist specified is an o-naphthoquinone diazide and the resinate specified is a gold sulphoresinate. After the resist is removed, the material is preferably further heated to strengthen the bond between the metal image and support.
GB4461469A 1968-09-11 1969-09-10 Photographic method for producing a metallic pattern with a metal resinate Expired GB1247973A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75923268A 1968-09-11 1968-09-11

Publications (1)

Publication Number Publication Date
GB1247973A true GB1247973A (en) 1971-09-29

Family

ID=25054889

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4461469A Expired GB1247973A (en) 1968-09-11 1969-09-10 Photographic method for producing a metallic pattern with a metal resinate

Country Status (6)

Country Link
BE (1) BE738616A (en)
DE (1) DE1943972A1 (en)
ES (1) ES371197A1 (en)
FR (1) FR2017782A1 (en)
GB (1) GB1247973A (en)
NL (1) NL6913774A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007142809A3 (en) * 2006-06-02 2008-05-08 Eastman Kodak Co Nanoparticle patterning process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007142809A3 (en) * 2006-06-02 2008-05-08 Eastman Kodak Co Nanoparticle patterning process
US7745101B2 (en) 2006-06-02 2010-06-29 Eastman Kodak Company Nanoparticle patterning process

Also Published As

Publication number Publication date
FR2017782A1 (en) 1970-05-22
NL6913774A (en) 1970-03-13
BE738616A (en) 1970-02-16
ES371197A1 (en) 1971-08-16
DE1943972A1 (en) 1970-09-03

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