FR2382032A1 - Double-surfaced etching of photographic material coated plates - to produce objects enamelled in different colours more efficiently - Google Patents

Double-surfaced etching of photographic material coated plates - to produce objects enamelled in different colours more efficiently

Info

Publication number
FR2382032A1
FR2382032A1 FR7706328A FR7706328A FR2382032A1 FR 2382032 A1 FR2382032 A1 FR 2382032A1 FR 7706328 A FR7706328 A FR 7706328A FR 7706328 A FR7706328 A FR 7706328A FR 2382032 A1 FR2382032 A1 FR 2382032A1
Authority
FR
France
Prior art keywords
enamelled
plate
surfaced
etching
efficiently
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7706328A
Other languages
French (fr)
Other versions
FR2382032B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHARRIEAU CHRISTIAN
Original Assignee
CHARRIEAU CHRISTIAN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHARRIEAU CHRISTIAN filed Critical CHARRIEAU CHRISTIAN
Priority to FR7706328A priority Critical patent/FR2382032A1/en
Publication of FR2382032A1 publication Critical patent/FR2382032A1/en
Application granted granted Critical
Publication of FR2382032B1 publication Critical patent/FR2382032B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0957Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer with sensitive layers on both sides of the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23DENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
    • C23D5/00Coating with enamels or vitreous layers
    • C23D5/06Coating with enamels or vitreous layers producing designs or letters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

Photoengraving process for the prodn. of enamelled brooches, medallions, etc., comprises exposing a plate of Cu which has a coating of a light sensitive substance through a mask such as a photographic transparency, and after development of the exposed zones, the plate is etched by means of acid. Both faces of the plate are coated, and one face is exposed through a mask having the silhouette of an object, whilst the other face is treated through a mask having in addition to the silhouette, lines marking out additional details such as different zones. The plate is then etched on both surfaces to give a piece having the outline desired with recesses delineating the various zones. These are filled with enamel powder of the colours desired, and fired.
FR7706328A 1977-02-24 1977-02-24 Double-surfaced etching of photographic material coated plates - to produce objects enamelled in different colours more efficiently Granted FR2382032A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7706328A FR2382032A1 (en) 1977-02-24 1977-02-24 Double-surfaced etching of photographic material coated plates - to produce objects enamelled in different colours more efficiently

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7706328A FR2382032A1 (en) 1977-02-24 1977-02-24 Double-surfaced etching of photographic material coated plates - to produce objects enamelled in different colours more efficiently

Publications (2)

Publication Number Publication Date
FR2382032A1 true FR2382032A1 (en) 1978-09-22
FR2382032B1 FR2382032B1 (en) 1981-12-24

Family

ID=9187527

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7706328A Granted FR2382032A1 (en) 1977-02-24 1977-02-24 Double-surfaced etching of photographic material coated plates - to produce objects enamelled in different colours more efficiently

Country Status (1)

Country Link
FR (1) FR2382032A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2618573A1 (en) * 1987-07-22 1989-01-27 Bois Daniel Method for manufacturing micromechanical parts
FR2633643A1 (en) * 1988-06-29 1990-01-05 Fayette Isabelle Enamelling process, especially for left surfaces

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2618573A1 (en) * 1987-07-22 1989-01-27 Bois Daniel Method for manufacturing micromechanical parts
FR2633643A1 (en) * 1988-06-29 1990-01-05 Fayette Isabelle Enamelling process, especially for left surfaces

Also Published As

Publication number Publication date
FR2382032B1 (en) 1981-12-24

Similar Documents

Publication Publication Date Title
JPS51136538A (en) Method of forming thin film having desired pattern on substrate
JPS526528A (en) Method of forming resist film
JPS542720A (en) Forming method of photopolymerized image
DE2860605D1 (en) Process for forming thin film patterns by use of lift-off processing
JPS5384564A (en) Method of producing thin film pattern
JPS5275986A (en) Method of forming mask layer
FR2382032A1 (en) Double-surfaced etching of photographic material coated plates - to produce objects enamelled in different colours more efficiently
JPS5226171A (en) Mask creation method
JPS51122770A (en) Method of manufacturing throughhholed printed substrate
JPS5235718A (en) Method of coating film on surface of pattern plate for decompressionnformed mold
JPS52149978A (en) Developing treatment method of photoresist film
JPS5316740A (en) Method of forming painted film of threeedimensional pattern
JPS52173A (en) X-ray etching mask
JPS54141573A (en) Mask for exposure
JPS5261763A (en) Method of forming pattern film on substrate using mask
JPS5258873A (en) Method of producing printed substrate
JPS5388728A (en) Method of forming pattern
JPS5396678A (en) Method and apparatus for mask pattern exposure
JPS5432771A (en) Method of forming thin film pattern on microelectronic engineering body
GB597964A (en) Improvements in or relating to a process for making reticles and reticles produced thereby
JPS5549834A (en) Diagrammatic powder-applied layer forming method
JPS5238169A (en) Method of producing printed substrate
JPS5469072A (en) Photo mask for adhesion exposure
JPS5225055A (en) Method of producing cuisine of boiled cod roe
JPS55121060A (en) Forming method of doctor blade for gravure printing

Legal Events

Date Code Title Description
ST Notification of lapse