JPS5469072A - Photo mask for adhesion exposure - Google Patents
Photo mask for adhesion exposureInfo
- Publication number
- JPS5469072A JPS5469072A JP13599577A JP13599577A JPS5469072A JP S5469072 A JPS5469072 A JP S5469072A JP 13599577 A JP13599577 A JP 13599577A JP 13599577 A JP13599577 A JP 13599577A JP S5469072 A JPS5469072 A JP S5469072A
- Authority
- JP
- Japan
- Prior art keywords
- groove
- transparent
- layer
- development
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To secure the perfect adhesion by providing the thin groove of μ-unit at the transparent part of the mask pattern on the glass substrate to use it as the gas exhaustion path.
CONSTITUTION: The sensitive emulsion is coated on glass substrate 5 to form blackened silver 6 and transparent gelatin layer 7 in the desired pattern after exposure and development. With the thick coating of the emulsion, the transparent glatin layer sinks through the development to form groove 8. And the thickness of layer 7 features 3W10μ, and the depth of the groove is 1W3μ respectively. The gas can go outside easily though the groove, thus obtaining the perfect adhesion in a short time. And a minute pattern can be reproduced accurately on the sensitizer.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13599577A JPS5469072A (en) | 1977-11-12 | 1977-11-12 | Photo mask for adhesion exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13599577A JPS5469072A (en) | 1977-11-12 | 1977-11-12 | Photo mask for adhesion exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5469072A true JPS5469072A (en) | 1979-06-02 |
Family
ID=15164724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13599577A Pending JPS5469072A (en) | 1977-11-12 | 1977-11-12 | Photo mask for adhesion exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5469072A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4670364A (en) * | 1982-05-18 | 1987-06-02 | Comtech Research Unit Limited | Photomask for electrophotography |
-
1977
- 1977-11-12 JP JP13599577A patent/JPS5469072A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4670364A (en) * | 1982-05-18 | 1987-06-02 | Comtech Research Unit Limited | Photomask for electrophotography |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5217815A (en) | Substrate and material using the same | |
JPS5469072A (en) | Photo mask for adhesion exposure | |
JPS53120527A (en) | Forming method of positive type radiation sensitive material layer | |
JPS5492061A (en) | Micropattern forming method | |
JPS5484932A (en) | Forming method of multi-layer construction | |
JPS51127680A (en) | Manufacturing process of semiconductor device | |
JPS5461478A (en) | Chromium plate | |
JPS54141573A (en) | Mask for exposure | |
JPS5387668A (en) | Forming method of patterns | |
JPS52131751A (en) | Measuring method for thickness of transparent film | |
JPS53120529A (en) | Forming method of positive type radiation sensitive material layer | |
JPS5549834A (en) | Diagrammatic powder-applied layer forming method | |
JPS5568634A (en) | Manufacture of mask for x-ray exposure | |
JPS5618420A (en) | Manufacture of semiconductor device | |
JPS5437579A (en) | Chrome plate | |
JPS5421272A (en) | Metal photo mask | |
JPS5621328A (en) | Method of making pattern | |
JPS5323632A (en) | Image formation using peeling phenomenon | |
JPS51127181A (en) | Films having selective transmittance for light | |
JPS5317075A (en) | Production of silicon mask for x-ray exposure | |
JPS5341220A (en) | Photographic light sensitive material | |
JPS5351973A (en) | Photo mask | |
JPS5588333A (en) | Manufacture of x-ray exposing mask | |
FR2382032A1 (en) | Double-surfaced etching of photographic material coated plates - to produce objects enamelled in different colours more efficiently | |
JPS5384465A (en) | Manufacture of semiconductor device |