JPS5469072A - Photo mask for adhesion exposure - Google Patents

Photo mask for adhesion exposure

Info

Publication number
JPS5469072A
JPS5469072A JP13599577A JP13599577A JPS5469072A JP S5469072 A JPS5469072 A JP S5469072A JP 13599577 A JP13599577 A JP 13599577A JP 13599577 A JP13599577 A JP 13599577A JP S5469072 A JPS5469072 A JP S5469072A
Authority
JP
Japan
Prior art keywords
groove
transparent
layer
development
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13599577A
Other languages
Japanese (ja)
Inventor
Okimitsu Yasuda
Nobuo Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13599577A priority Critical patent/JPS5469072A/en
Publication of JPS5469072A publication Critical patent/JPS5469072A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To secure the perfect adhesion by providing the thin groove of μ-unit at the transparent part of the mask pattern on the glass substrate to use it as the gas exhaustion path.
CONSTITUTION: The sensitive emulsion is coated on glass substrate 5 to form blackened silver 6 and transparent gelatin layer 7 in the desired pattern after exposure and development. With the thick coating of the emulsion, the transparent glatin layer sinks through the development to form groove 8. And the thickness of layer 7 features 3W10μ, and the depth of the groove is 1W3μ respectively. The gas can go outside easily though the groove, thus obtaining the perfect adhesion in a short time. And a minute pattern can be reproduced accurately on the sensitizer.
COPYRIGHT: (C)1979,JPO&Japio
JP13599577A 1977-11-12 1977-11-12 Photo mask for adhesion exposure Pending JPS5469072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13599577A JPS5469072A (en) 1977-11-12 1977-11-12 Photo mask for adhesion exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13599577A JPS5469072A (en) 1977-11-12 1977-11-12 Photo mask for adhesion exposure

Publications (1)

Publication Number Publication Date
JPS5469072A true JPS5469072A (en) 1979-06-02

Family

ID=15164724

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13599577A Pending JPS5469072A (en) 1977-11-12 1977-11-12 Photo mask for adhesion exposure

Country Status (1)

Country Link
JP (1) JPS5469072A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4670364A (en) * 1982-05-18 1987-06-02 Comtech Research Unit Limited Photomask for electrophotography

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4670364A (en) * 1982-05-18 1987-06-02 Comtech Research Unit Limited Photomask for electrophotography

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