JPS5341220A - Photographic light sensitive material - Google Patents

Photographic light sensitive material

Info

Publication number
JPS5341220A
JPS5341220A JP11541276A JP11541276A JPS5341220A JP S5341220 A JPS5341220 A JP S5341220A JP 11541276 A JP11541276 A JP 11541276A JP 11541276 A JP11541276 A JP 11541276A JP S5341220 A JPS5341220 A JP S5341220A
Authority
JP
Japan
Prior art keywords
sensitive material
light sensitive
photographic light
layer
laminating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11541276A
Other languages
Japanese (ja)
Inventor
Masamichi Sato
Itsuo Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11541276A priority Critical patent/JPS5341220A/en
Publication of JPS5341220A publication Critical patent/JPS5341220A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)

Abstract

PURPOSE:To improve a hard mark for photo-mask without being influenced by the composition on treating requirements of a supporting substrate by laminating a Cr thin layer, a Cr2O3 layer of specific thickness, and a silver halide emulsion layer on a transparent substrate.
JP11541276A 1976-09-28 1976-09-28 Photographic light sensitive material Pending JPS5341220A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11541276A JPS5341220A (en) 1976-09-28 1976-09-28 Photographic light sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11541276A JPS5341220A (en) 1976-09-28 1976-09-28 Photographic light sensitive material

Publications (1)

Publication Number Publication Date
JPS5341220A true JPS5341220A (en) 1978-04-14

Family

ID=14661917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11541276A Pending JPS5341220A (en) 1976-09-28 1976-09-28 Photographic light sensitive material

Country Status (1)

Country Link
JP (1) JPS5341220A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0514675A1 (en) 1991-04-22 1992-11-25 Fuji Photo Film Co., Ltd. Silver halide photographic materials and method for processing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0514675A1 (en) 1991-04-22 1992-11-25 Fuji Photo Film Co., Ltd. Silver halide photographic materials and method for processing the same

Similar Documents

Publication Publication Date Title
JPS5323277A (en) Photomasking material and photomask
JPS5341220A (en) Photographic light sensitive material
ES453925A1 (en) Coated transparent sheets
JPS5284727A (en) Thermodevelopable light sensitive material
JPS5299072A (en) Mask for x-ray exposure
JPS52127329A (en) Silver halide photosensitive material for color photography
JPS5265436A (en) Formation of photographic original for printing
JPS5315831A (en) Treatment of silver halide color photographic photosensitive material
JPS5216224A (en) Photographic light sensitive material
JPS5320325A (en) Color photographic image formation
NL7710996A (en) MASK FOR OPTICAL LIGHTING.
JPS54162546A (en) Image formation method
JPS541621A (en) Silver halide color photographic material
JPS52131751A (en) Measuring method for thickness of transparent film
ES477340A1 (en) Improvements in or relating to photographic copying material
JPS5236021A (en) Method for forming photographic image
JPS5469072A (en) Photo mask for adhesion exposure
JPS5227630A (en) Method for producing photographic light sensitive material
JPS51151134A (en) Multilayer color photographic light sensitive material
JPS52112314A (en) Lith-type silver halide photographic light sensitive material
JPS53123917A (en) Thermodevelopable photosensitive material
JPS5667840A (en) Self-developing film unit
JPS52132835A (en) Formation of photographic image
JPS5265424A (en) Photographic material for non silver image
JPS5417832A (en) Silver halide photographic material