JPS4887904A - - Google Patents

Info

Publication number
JPS4887904A
JPS4887904A JP1166773A JP1166773A JPS4887904A JP S4887904 A JPS4887904 A JP S4887904A JP 1166773 A JP1166773 A JP 1166773A JP 1166773 A JP1166773 A JP 1166773A JP S4887904 A JPS4887904 A JP S4887904A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1166773A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4887904A publication Critical patent/JPS4887904A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/38Treatment before imagewise removal, e.g. prebaking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/168Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
JP1166773A 1972-02-03 1973-01-30 Pending JPS4887904A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22308272A 1972-02-03 1972-02-03

Publications (1)

Publication Number Publication Date
JPS4887904A true JPS4887904A (es) 1973-11-19

Family

ID=22834951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1166773A Pending JPS4887904A (es) 1972-02-03 1973-01-30

Country Status (8)

Country Link
JP (1) JPS4887904A (es)
BE (1) BE791212A (es)
CA (1) CA981507A (es)
DE (1) DE2259180A1 (es)
FR (1) FR2171724A5 (es)
GB (1) GB1387350A (es)
IT (1) IT972853B (es)
NL (1) NL7215272A (es)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4890738A (es) * 1972-03-06 1973-11-27
JPS5890636A (ja) * 1981-11-24 1983-05-30 Fuji Photo Film Co Ltd 光重合性組成物を用いた感光材料による画像形成方法および現像ユニツト
JPS58115435A (ja) * 1981-12-14 1983-07-09 インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン パタ−ン状フオトレジストの形成方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
DE3038605A1 (de) 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
DE3731333A1 (de) * 1987-09-15 1989-03-30 Schering Ag Verfahren zur herstellung von leiternetzwerken
JPH1026834A (ja) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd 画像形成方法
US11581187B2 (en) * 2018-12-20 2023-02-14 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Method of heating SOC film on wafer by electromagnetic wave generator and heating apparatus using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4890738A (es) * 1972-03-06 1973-11-27
JPS5228370B2 (es) * 1972-03-06 1977-07-26
JPS5890636A (ja) * 1981-11-24 1983-05-30 Fuji Photo Film Co Ltd 光重合性組成物を用いた感光材料による画像形成方法および現像ユニツト
JPS58115435A (ja) * 1981-12-14 1983-07-09 インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン パタ−ン状フオトレジストの形成方法
JPH0216911B2 (es) * 1981-12-14 1990-04-18 Intaanashonaru Bijinesu Mashiinzu Corp

Also Published As

Publication number Publication date
IT972853B (it) 1974-05-31
GB1387350A (en) 1975-03-19
NL7215272A (es) 1973-08-07
BE791212A (fr) 1973-03-01
FR2171724A5 (es) 1973-09-21
CA981507A (en) 1976-01-13
DE2259180A1 (de) 1973-08-09

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