DE2133515B2 - Lichtempfindliches gemisch - Google Patents

Lichtempfindliches gemisch

Info

Publication number
DE2133515B2
DE2133515B2 DE19712133515 DE2133515A DE2133515B2 DE 2133515 B2 DE2133515 B2 DE 2133515B2 DE 19712133515 DE19712133515 DE 19712133515 DE 2133515 A DE2133515 A DE 2133515A DE 2133515 B2 DE2133515 B2 DE 2133515B2
Authority
DE
Germany
Prior art keywords
light
ketone
hexaarylbiimidazole
radicals
bis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19712133515
Other languages
German (de)
English (en)
Other versions
DE2133515C3 (xx
DE2133515A1 (en
Inventor
Martin David; Henry jun. Cyrus Pershing; Wilmington Del. Baum (V.StA.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE2133515A1 publication Critical patent/DE2133515A1/de
Publication of DE2133515B2 publication Critical patent/DE2133515B2/de
Application granted granted Critical
Publication of DE2133515C3 publication Critical patent/DE2133515C3/de
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE19712133515 1970-07-09 1971-07-06 Lichtempfindliches gemisch Granted DE2133515B2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5365670A 1970-07-09 1970-07-09
US5368670A 1970-07-09 1970-07-09
US5368670 1970-07-09

Publications (3)

Publication Number Publication Date
DE2133515A1 DE2133515A1 (en) 1972-01-13
DE2133515B2 true DE2133515B2 (de) 1976-08-12
DE2133515C3 DE2133515C3 (xx) 1977-03-24

Family

ID=26732106

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712133515 Granted DE2133515B2 (de) 1970-07-09 1971-07-06 Lichtempfindliches gemisch

Country Status (1)

Country Link
DE (1) DE2133515B2 (xx)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3623522A1 (de) * 1985-07-16 1987-01-29 Mead Corp Abbildungserzeugende materialien mit photosensitiven mikrokapseln enthaltend tertiaere amine als coinitiatoren

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1154963A (en) * 1980-02-25 1983-10-11 Harold T. Thomas USE OF.alpha.,.alpha.'-BIS(DIALKYLAMINOBENZYLIDENE) KETONE DYES IN OPTICAL RECORDING ELEMENTS

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3623522A1 (de) * 1985-07-16 1987-01-29 Mead Corp Abbildungserzeugende materialien mit photosensitiven mikrokapseln enthaltend tertiaere amine als coinitiatoren

Also Published As

Publication number Publication date
DE2133515A1 (en) 1972-01-13

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E77 Valid patent as to the heymanns-index 1977