DE2060683C2 - Verfahren zur Isolierung von reinem kubischen oder hartem hexagonalen Bornitrid - Google Patents
Verfahren zur Isolierung von reinem kubischen oder hartem hexagonalen BornitridInfo
- Publication number
- DE2060683C2 DE2060683C2 DE2060683A DE2060683A DE2060683C2 DE 2060683 C2 DE2060683 C2 DE 2060683C2 DE 2060683 A DE2060683 A DE 2060683A DE 2060683 A DE2060683 A DE 2060683A DE 2060683 C2 DE2060683 C2 DE 2060683C2
- Authority
- DE
- Germany
- Prior art keywords
- boron nitride
- cubic
- hard
- hexagonal boron
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052582 BN Inorganic materials 0.000 title claims description 51
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims description 51
- 238000000034 method Methods 0.000 title claims description 11
- 238000002955 isolation Methods 0.000 title 1
- 239000000203 mixture Substances 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 13
- 230000008018 melting Effects 0.000 claims description 13
- 238000002844 melting Methods 0.000 claims description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 13
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 12
- 150000004679 hydroxides Chemical class 0.000 claims description 12
- WMFOQBRAJBCJND-UHFFFAOYSA-M lithium hydroxide Inorganic materials [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 claims description 10
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 238000000926 separation method Methods 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 230000035939 shock Effects 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 239000000374 eutectic mixture Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 235000015895 biscuits Nutrition 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- WGPCGCOKHWGKJJ-UHFFFAOYSA-N sulfanylidenezinc Chemical compound [Zn]=S WGPCGCOKHWGKJJ-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Products (AREA)
- Processing Of Solid Wastes (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Catalysts (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1134770A | 1970-02-13 | 1970-02-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2060683A1 DE2060683A1 (de) | 1971-08-19 |
| DE2060683C2 true DE2060683C2 (de) | 1983-03-03 |
Family
ID=21749993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2060683A Expired DE2060683C2 (de) | 1970-02-13 | 1970-12-10 | Verfahren zur Isolierung von reinem kubischen oder hartem hexagonalen Bornitrid |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US3661521A (enExample) |
| JP (1) | JPS4927757B1 (enExample) |
| BE (1) | BE762472A (enExample) |
| CA (1) | CA943741A (enExample) |
| CH (1) | CH565711A5 (enExample) |
| DE (1) | DE2060683C2 (enExample) |
| FR (1) | FR2078105A5 (enExample) |
| GB (1) | GB1332140A (enExample) |
| IE (1) | IE34690B1 (enExample) |
| NL (1) | NL7101864A (enExample) |
| SE (1) | SE371176B (enExample) |
| ZA (1) | ZA707421B (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2500515A1 (de) * | 1974-01-23 | 1975-07-24 | Hitachi Ltd | Verfahren zur herstellung von kubischem bornitrid |
| US5618509A (en) * | 1993-07-09 | 1997-04-08 | Showa Denko K.K. | Method for producing cubic boron nitride |
| JP3471167B2 (ja) * | 1996-05-21 | 2003-11-25 | 昭和電工株式会社 | 立方晶窒化ホウ素の製造方法 |
| RU2142407C1 (ru) * | 1998-06-25 | 1999-12-10 | Химический факультет Московского государственного университета им.М.В.Ломоносова | Способ очистки кубического нитрида бора |
| CN1304278C (zh) * | 2002-02-28 | 2007-03-14 | 昭和电工株式会社 | 立方氮化硼的生产方法 |
| JP4145533B2 (ja) * | 2002-02-28 | 2008-09-03 | 昭和電工株式会社 | 立方晶窒化ホウ素の製造方法 |
| US7244406B2 (en) * | 2002-02-28 | 2007-07-17 | Showa Denko K.K. | Method for producing cubic boron nitride |
| US7214359B2 (en) * | 2003-02-03 | 2007-05-08 | Showa Denko K.K. | Cubic boron nitride, catalyst for synthesizing cubic boron nitride, and method for producing cubic boron nitride |
| JP4936424B2 (ja) * | 2005-10-31 | 2012-05-23 | 日本ミクロコーティング株式会社 | 研磨材及びその製造方法 |
| US8591613B2 (en) * | 2008-09-16 | 2013-11-26 | Diamond Innovations, Inc. | Abrasive grains having unique features |
| JP5057193B2 (ja) * | 2010-02-09 | 2012-10-24 | 三菱マテリアル株式会社 | 均質性、緻密性が高くかつ高硬度の立方晶窒化ホウ素焼結体の製造法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2947617A (en) * | 1958-01-06 | 1960-08-02 | Gen Electric | Abrasive material and preparation thereof |
| US3212851A (en) * | 1962-05-02 | 1965-10-19 | Gen Electric | Boron nitride having a new structure |
-
1970
- 1970-02-13 US US11347A patent/US3661521A/en not_active Expired - Lifetime
- 1970-11-02 IE IE1393/70A patent/IE34690B1/xx unknown
- 1970-11-02 ZA ZA707421A patent/ZA707421B/xx unknown
- 1970-11-05 GB GB5277870A patent/GB1332140A/en not_active Expired
- 1970-11-30 JP JP45105764A patent/JPS4927757B1/ja active Pending
- 1970-12-10 DE DE2060683A patent/DE2060683C2/de not_active Expired
- 1970-12-18 CH CH1880470A patent/CH565711A5/xx not_active IP Right Cessation
-
1971
- 1971-02-02 FR FR7103494A patent/FR2078105A5/fr not_active Expired
- 1971-02-02 CA CA104,217A patent/CA943741A/en not_active Expired
- 1971-02-03 BE BE762472A patent/BE762472A/xx not_active IP Right Cessation
- 1971-02-11 NL NL7101864A patent/NL7101864A/xx unknown
- 1971-02-12 SE SE7101831A patent/SE371176B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4927757B1 (enExample) | 1974-07-20 |
| CA943741A (en) | 1974-03-19 |
| IE34690B1 (en) | 1975-07-23 |
| SE371176B (enExample) | 1974-11-11 |
| NL7101864A (enExample) | 1971-08-17 |
| CH565711A5 (enExample) | 1975-08-29 |
| ZA707421B (en) | 1971-11-24 |
| IE34690L (en) | 1971-08-13 |
| DE2060683A1 (de) | 1971-08-19 |
| FR2078105A5 (enExample) | 1971-11-05 |
| GB1332140A (en) | 1973-10-03 |
| US3661521A (en) | 1972-05-09 |
| BE762472A (fr) | 1971-07-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |