DE1924317B2 - - Google Patents

Info

Publication number
DE1924317B2
DE1924317B2 DE19691924317 DE1924317A DE1924317B2 DE 1924317 B2 DE1924317 B2 DE 1924317B2 DE 19691924317 DE19691924317 DE 19691924317 DE 1924317 A DE1924317 A DE 1924317A DE 1924317 B2 DE1924317 B2 DE 1924317B2
Authority
DE
Germany
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691924317
Other versions
DE1924317A1 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of DE1924317A1 publication Critical patent/DE1924317A1/de
Publication of DE1924317B2 publication Critical patent/DE1924317B2/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/113—Binder containing with plasticizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
DE19691924317 1968-05-24 1969-05-13 Fotopolymerisierbare Masse Pending DE1924317A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73173368A 1968-05-24 1968-05-24

Publications (2)

Publication Number Publication Date
DE1924317A1 DE1924317A1 (de) 1970-10-29
DE1924317B2 true DE1924317B2 (de) 1971-02-25

Family

ID=24940743

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691924317 Pending DE1924317A1 (de) 1968-05-24 1969-05-13 Fotopolymerisierbare Masse

Country Status (7)

Country Link
US (1) US3549367A (de)
JP (1) JPS4838403B1 (de)
BE (1) BE733543A (de)
DE (1) DE1924317A1 (de)
FR (1) FR2009250A1 (de)
GB (1) GB1231345A (de)
NL (1) NL164136C (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2558813A1 (de) * 1975-12-27 1977-07-07 Hoechst Ag Lichtempfindliche kopiermasse mit synergistischem initiatorsystem
DE2830143A1 (de) * 1977-07-11 1979-01-18 Du Pont Photopolymerisierbare massen, ihre verwendung in materialien und verfahren zur erzeugung von polymerbildern

Families Citing this family (229)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE759041A (fr) * 1969-11-18 1971-05-17 Du Pont Compositions photopolymerisables contenant des aminophenylcetones et des adjuvants
US3844790A (en) * 1972-06-02 1974-10-29 Du Pont Photopolymerizable compositions with improved resistance to oxygen inhibition
US3850634A (en) * 1973-07-19 1974-11-26 Ball Corp Method of forming a photoresist with acrylamide photopolymers
US3926643A (en) * 1974-05-16 1975-12-16 Du Pont Photopolymerizable compositions comprising initiator combinations comprising thioxanthenones
US3970535A (en) * 1974-06-12 1976-07-20 Scm Corporation Photopolymerization process utilizing a 2-methyl-substituted benzimidazole as a photosensitizer
JPS5152816A (en) * 1974-09-03 1976-05-10 Energy Conversion Devices Inc Gazokeiseifuirumu oyobi gazokeiseihoho
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4048034A (en) * 1976-08-27 1977-09-13 Uop Inc. Photopolymerization using an alpha-aminoacetophenone
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
US4162162A (en) * 1978-05-08 1979-07-24 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
US4129486A (en) * 1978-05-09 1978-12-12 Polychrome Corporation Ultraviolet curing printing inks having improved shelf life
DE2822191A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
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US4343921A (en) 1978-11-06 1982-08-10 Usm Corporation Adhesive composition
US4245030A (en) * 1979-05-23 1981-01-13 Hoechst Aktiengesellschaft Photopolymerizable mixture containing improved plasticizer
US4245031A (en) * 1979-09-18 1981-01-13 E. I. Du Pont De Nemours And Company Photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
US4291115A (en) * 1979-09-18 1981-09-22 E. I. Du Pont De Nemours And Company Elements and method which use photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
US4308338A (en) * 1980-03-26 1981-12-29 E. I. Du Pont De Nemours And Company Methods of imaging photopolymerizable materials containing diester polyether
US4268667A (en) * 1980-04-21 1981-05-19 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sensitizers for photopolymerizable compositions
US4341860A (en) * 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
US4460427A (en) * 1981-09-21 1984-07-17 E. I. Dupont De Nemours And Company Process for the preparation of flexible circuits
US4454218A (en) * 1982-09-13 1984-06-12 E. I. Du Pont De Nemours And Company N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions
US4535052A (en) * 1983-05-02 1985-08-13 E. I. Du Pont De Nemours And Company Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions
DE3409888A1 (de) * 1984-03-17 1985-09-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung
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US4592816A (en) 1984-09-26 1986-06-03 Rohm And Haas Company Electrophoretic deposition process
DE3681366D1 (de) 1985-07-31 1991-10-17 Du Pont Optische beschichtungszusammensetzung.
US4755450A (en) * 1986-04-22 1988-07-05 Minnesota Mining And Manufacturing Company Spectral sensitizing dyes in photopolymerizable systems
US4732831A (en) * 1986-05-01 1988-03-22 E. I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
EP0243934A3 (de) * 1986-05-01 1990-04-18 E.I. Du Pont De Nemours And Company Elektrophotographisches Drucken mit einer Druckplatte auf der Basis von Photopolymeren
DE3619792A1 (de) * 1986-06-18 1987-12-23 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
US4894314A (en) * 1986-11-12 1990-01-16 Morton Thiokol, Inc. Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717034A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien, sowie neue chinazolon-4-verbindungen
DE3717036A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE4300856A1 (de) * 1993-01-15 1994-07-21 Basf Lacke & Farben Lichtempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer Reliefdruckplatte
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US5489621A (en) * 1993-05-12 1996-02-06 Fuji Photo Film Co., Ltd. Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor
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US3549367A (en) 1970-12-22
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