DE1572134B1 - Fotopolymerisierbares Aufzeichnungsmaterial - Google Patents

Fotopolymerisierbares Aufzeichnungsmaterial

Info

Publication number
DE1572134B1
DE1572134B1 DE19661572134D DE1572134DA DE1572134B1 DE 1572134 B1 DE1572134 B1 DE 1572134B1 DE 19661572134 D DE19661572134 D DE 19661572134D DE 1572134D A DE1572134D A DE 1572134DA DE 1572134 B1 DE1572134 B1 DE 1572134B1
Authority
DE
Germany
Prior art keywords
photopolymerizable
parts
recording material
diethyl
iodide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19661572134D
Other languages
German (de)
English (en)
Inventor
Thommes Glen Anthony
Wilhelm Michel Gerd
Peter Walker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US502462A external-priority patent/US3418118A/en
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE1572134B1 publication Critical patent/DE1572134B1/de
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/34Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
DE19661572134D 1965-06-03 1966-05-27 Fotopolymerisierbares Aufzeichnungsmaterial Pending DE1572134B1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US46119965A 1965-06-03 1965-06-03
US48507065A 1965-09-03 1965-09-03
US502462A US3418118A (en) 1965-06-03 1965-10-22 Photographic processes and products
US53178466A 1966-03-04 1966-03-04

Publications (1)

Publication Number Publication Date
DE1572134B1 true DE1572134B1 (de) 1970-02-12

Family

ID=27504067

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19661572134D Pending DE1572134B1 (de) 1965-06-03 1966-05-27 Fotopolymerisierbares Aufzeichnungsmaterial

Country Status (3)

Country Link
BE (1) BE682052A (enrdf_load_stackoverflow)
DE (1) DE1572134B1 (enrdf_load_stackoverflow)
GB (1) GB1146498A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
GB1146498A (en) 1969-03-26
BE682052A (enrdf_load_stackoverflow) 1966-12-05

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