DE10105046A1 - Metallorganische Monoacyl-Aryl-Phosphine - Google Patents

Metallorganische Monoacyl-Aryl-Phosphine

Info

Publication number
DE10105046A1
DE10105046A1 DE10105046A DE10105046A DE10105046A1 DE 10105046 A1 DE10105046 A1 DE 10105046A1 DE 10105046 A DE10105046 A DE 10105046A DE 10105046 A DE10105046 A DE 10105046A DE 10105046 A1 DE10105046 A1 DE 10105046A1
Authority
DE
Germany
Prior art keywords
phenyl
alkyl
lithium
substituted
phosphine oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10105046A
Other languages
German (de)
English (en)
Inventor
Jean-Pierre Wolf
Beat Michael Aebli
Gebhard Hug
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of DE10105046A1 publication Critical patent/DE10105046A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00Preparations for dentistry
    • A61K6/60Preparations for dentistry comprising organic or organo-metallic additives
    • A61K6/62Photochemical radical initiators
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00Preparations for dentistry
    • A61K6/80Preparations for artificial teeth, for filling teeth or for capping teeth
    • A61K6/884Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/5036Phosphines containing the structure -C(=X)-P or NC-P
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6521Six-membered rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0755Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/124Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Veterinary Medicine (AREA)
  • Animal Behavior & Ethology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Biophysics (AREA)
  • Plastic & Reconstructive Surgery (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Printing Methods (AREA)
DE10105046A 2000-02-08 2001-02-05 Metallorganische Monoacyl-Aryl-Phosphine Withdrawn DE10105046A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH2552000 2000-02-08

Publications (1)

Publication Number Publication Date
DE10105046A1 true DE10105046A1 (de) 2001-08-09

Family

ID=4471003

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10105046A Withdrawn DE10105046A1 (de) 2000-02-08 2001-02-05 Metallorganische Monoacyl-Aryl-Phosphine

Country Status (14)

Country Link
US (2) US6399805B2 (enExample)
JP (2) JP2001270894A (enExample)
KR (1) KR100769838B1 (enExample)
CN (1) CN1200943C (enExample)
BE (1) BE1013960A3 (enExample)
BR (1) BR0100910A (enExample)
CA (1) CA2334291A1 (enExample)
DE (1) DE10105046A1 (enExample)
ES (1) ES2195706B1 (enExample)
FR (1) FR2804683B1 (enExample)
GB (1) GB2360283B (enExample)
IT (1) ITMI20010242A1 (enExample)
NL (1) NL1017310C2 (enExample)
TW (1) TW555762B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003044030A1 (en) * 2001-11-20 2003-05-30 Ciba Specialty Chemicals Holding Inc. Multimer forms of acylphosphines and their derivatives
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
EP3409680A1 (en) * 2017-05-30 2018-12-05 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
EP4178002A4 (en) * 2021-07-14 2024-04-10 LG Energy Solution, Ltd. NON-AQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY THEREOF

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ATE221893T1 (de) * 1998-11-30 2002-08-15 Ciba Sc Holding Ag Verfahren zur herstellung von acylphosphinen und derivaten
US6803392B1 (en) 1999-10-20 2004-10-12 Ciba Specialty Chemicals Corporation Photoinitiator formulations
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
CN1264876C (zh) * 2000-09-14 2006-07-19 西巴特殊化学品控股有限公司 在甲基丙烯酸酯铸模树脂中的酰基膦氧化物光引发剂
KR100903939B1 (ko) * 2001-08-21 2009-06-25 시바 홀딩 인크 광개시제로서의 장파장 모노- 및 비스-아실포스핀 옥사이드 및 설파이드
DE10206096A1 (de) * 2002-02-13 2003-08-14 Basf Ag Mono- und Bisacylphosphinderivate
KR20050009744A (ko) * 2002-06-11 2005-01-25 시바 스페셜티 케미칼스 홀딩 인크. 모노- 및 비스아실포스핀 옥사이드의 다량체 형태
CA2522898A1 (en) * 2003-05-23 2004-12-02 Ciba Specialty Chemicals Holding Inc. Strongly adherent surface coatings
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US20050154109A1 (en) * 2004-01-12 2005-07-14 Minyu Li Floor finish with lightening agent
BRPI0509338B1 (pt) * 2004-04-30 2017-10-17 Abbott Medical Optics Inc. Detached devices having a highly selective violet light transmitter and related methods
US20060115516A1 (en) 2004-11-22 2006-06-01 Pearson Jason C Copolymerizable methine and anthraquinone compounds and articles containing them
CA2588538C (en) * 2004-11-22 2014-07-29 Advanced Medical Optics, Inc. Copolymerizable azo compounds and articles containing them
EP1814891B1 (en) * 2004-11-23 2011-01-26 Basf Se Bisacylphosphanes and their use as photoinitiators; process for preparing acylphosphanes
GB2422678B (en) * 2005-01-25 2009-03-11 Photocentric Ltd Method of making a photopolymer plate
JP2006252787A (ja) * 2005-03-08 2006-09-21 Toppan Printing Co Ltd 有機el素子製造方法および有機el素子
JP5232365B2 (ja) * 2005-06-01 2013-07-10 富士フイルム株式会社 フッ素化光重合開始剤を含む光学フィルム、反射防止フィルム、偏光板、およびそれを用いた画像表示装置
US8228848B2 (en) * 2008-11-17 2012-07-24 Sierra Wireless, Inc. Method and apparatus for facilitating push communication across a network boundary
US8924486B2 (en) * 2009-02-12 2014-12-30 Sierra Wireless, Inc. Method and system for aggregating communications
WO2010054471A1 (en) 2008-11-17 2010-05-20 Sierra Wireless, Inc. Method and apparatus for network port and network address translation
WO2010121387A1 (en) * 2009-04-20 2010-10-28 ETH Zürich Polymer nanoparticles
US8633258B2 (en) 2010-06-30 2014-01-21 Dsm Ip Assets B.V. D1492 liquid BAPO photoinitiator and its use in radiation curable compositions
WO2012106820A1 (en) 2011-02-08 2012-08-16 Sierra Wireless, Inc. Method and system for forwarding data between network devices
GB201213163D0 (en) 2012-07-24 2012-09-05 Lambson Ltd Photopolymerisation processes and novel compounds therefor
EP2903995B1 (en) * 2012-10-01 2019-01-16 ETH Zürich A process for the preparation of acylphosphanes
EP2935393A4 (en) 2012-12-18 2016-06-01 Basf Se SEMICONDUCTOR MATERIALS BASED ON NAPHTHALENDIIMIDE VINYLENE OLIGOTHIOPHENO VINYLENE POLYMERS
JP6400021B2 (ja) * 2012-12-19 2018-10-03 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se ビスアシルホスフィン酸の誘導体、その製造および光開始剤としての使用
CN108779192B (zh) * 2016-01-11 2021-01-26 汉高知识产权控股有限责任公司 有机硅相容的化合物
CN107082787B (zh) * 2017-06-09 2019-05-17 江苏富比亚化学品有限公司 一种苯甲酰基苯基次膦酸及其衍生物的制备方法
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
JP2020531594A (ja) * 2017-08-24 2020-11-05 スージョウ・レインボー・マテリアルズ・カンパニー・リミテッドSuzhou Rainbow Materials Co., Ltd. シリコーン高分子光開始剤およびその使用
MX2020006710A (es) 2017-12-27 2020-08-20 Henkel IP & Holding GmbH Adhesivos sensibles a la presion opticamente transparentes y usos de los mismos.
KR102693603B1 (ko) 2018-10-01 2024-08-09 다우 글로벌 테크놀로지스 엘엘씨 유기 규소 화합물, 이의 제조 방법 및 그 사용
CN115701282A (zh) * 2020-05-14 2023-02-07 3M创新有限公司 包含至少一个使用氟化光引发剂制备的氟化(共)聚合物层的多层光学膜及其制备和使用方法
CN114349788B (zh) * 2021-12-30 2023-06-20 华南理工大学 一种光引发剂及其制备方法与应用

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003044030A1 (en) * 2001-11-20 2003-05-30 Ciba Specialty Chemicals Holding Inc. Multimer forms of acylphosphines and their derivatives
US7109250B2 (en) 2001-11-20 2006-09-19 Ciba Specialty Chemicals Corp. Multimer forms of acylphosphines and their derivatives
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
EP3409680A1 (en) * 2017-05-30 2018-12-05 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
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FR2804683A1 (fr) 2001-08-10
JP2011140524A (ja) 2011-07-21
ES2195706A1 (es) 2003-12-01
BE1013960A3 (fr) 2003-01-14
CN1200943C (zh) 2005-05-11
JP2001270894A (ja) 2001-10-02
ES2195706B1 (es) 2005-03-01
BR0100910A (pt) 2001-10-02
US6579663B2 (en) 2003-06-17
US6399805B2 (en) 2002-06-04
KR20010083161A (ko) 2001-08-31
US20010031898A1 (en) 2001-10-18
NL1017310C2 (nl) 2002-06-18
CN1308081A (zh) 2001-08-15
ITMI20010242A1 (it) 2002-08-07
TW555762B (en) 2003-10-01
CA2334291A1 (en) 2001-08-08
US20020107413A1 (en) 2002-08-08
FR2804683B1 (fr) 2005-04-08
GB0102398D0 (en) 2001-03-14
NL1017310A1 (nl) 2001-08-09
KR100769838B1 (ko) 2007-10-24
GB2360283B (en) 2002-08-21

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