JP2001270894A - 有機金属モノアシルアリールホスフィン類 - Google Patents

有機金属モノアシルアリールホスフィン類

Info

Publication number
JP2001270894A
JP2001270894A JP2001031650A JP2001031650A JP2001270894A JP 2001270894 A JP2001270894 A JP 2001270894A JP 2001031650 A JP2001031650 A JP 2001031650A JP 2001031650 A JP2001031650 A JP 2001031650A JP 2001270894 A JP2001270894 A JP 2001270894A
Authority
JP
Japan
Prior art keywords
lithium
alkyl
oxide
formula
chloro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2001031650A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001270894A5 (enExample
Inventor
Jean-Pierre Wolf
ヴォルフ ジャン−ピエール
Beat Michael Aebli
ミハエル イーブリ ビート
Gebhard Hug
フグ ゲブハルド
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JP2001270894A publication Critical patent/JP2001270894A/ja
Publication of JP2001270894A5 publication Critical patent/JP2001270894A5/ja
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
    • A61K6/62—Photochemical radical initiators
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
    • A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6521—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Materials Engineering (AREA)
  • Animal Behavior & Ethology (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Wood Science & Technology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Biophysics (AREA)
  • Plastic & Reconstructive Surgery (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Printing Methods (AREA)
JP2001031650A 2000-02-08 2001-02-08 有機金属モノアシルアリールホスフィン類 Ceased JP2001270894A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH20000255/00 2000-02-08
CH2552000 2000-02-08

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011093335A Division JP2011140524A (ja) 2000-02-08 2011-04-19 有機金属モノアシルアリールホスフィン類

Publications (2)

Publication Number Publication Date
JP2001270894A true JP2001270894A (ja) 2001-10-02
JP2001270894A5 JP2001270894A5 (enExample) 2008-03-21

Family

ID=4471003

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2001031650A Ceased JP2001270894A (ja) 2000-02-08 2001-02-08 有機金属モノアシルアリールホスフィン類
JP2011093335A Pending JP2011140524A (ja) 2000-02-08 2011-04-19 有機金属モノアシルアリールホスフィン類

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2011093335A Pending JP2011140524A (ja) 2000-02-08 2011-04-19 有機金属モノアシルアリールホスフィン類

Country Status (14)

Country Link
US (2) US6399805B2 (enExample)
JP (2) JP2001270894A (enExample)
KR (1) KR100769838B1 (enExample)
CN (1) CN1200943C (enExample)
BE (1) BE1013960A3 (enExample)
BR (1) BR0100910A (enExample)
CA (1) CA2334291A1 (enExample)
DE (1) DE10105046A1 (enExample)
ES (1) ES2195706B1 (enExample)
FR (1) FR2804683B1 (enExample)
GB (1) GB2360283B (enExample)
IT (1) ITMI20010242A1 (enExample)
NL (1) NL1017310C2 (enExample)
TW (1) TW555762B (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
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JP2005529167A (ja) * 2002-06-11 2005-09-29 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド モノ−およびビス−アシルホスフィンオキサイドのマルチマー形態
JP2007011309A (ja) * 2005-06-01 2007-01-18 Fujifilm Holdings Corp フッ素化光重合開始剤を含む光学フィルム、反射防止フィルム、偏光板、およびそれを用いた画像表示装置
JP2015532275A (ja) * 2012-10-01 2015-11-09 イーティーエイチ・チューリッヒ アシルホスファン類の製造方法
JP2019502717A (ja) * 2016-01-11 2019-01-31 ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング シリコーン相溶性化合物
JP2020521722A (ja) * 2017-05-30 2020-07-27 アイジーエム グループ ビー．ヴィ． 非反応性金属リン化物の活性化によるビス（アシル）ホスフィンの合成

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CZ297808B6 (cs) 1999-10-20 2007-04-04 Ciba Specialty Chemicals Holding Inc. Fotoiniciacní prostredky, zpusob jejich prípravy a jejich pouzití
GB2365430B (en) 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
AU2002223526A1 (en) * 2000-09-14 2002-03-26 Ciba Specialty Chemicals Holding Inc. Acylphosphine oxide photoinitiators in methacrylate casting resins
JP4225898B2 (ja) * 2001-08-21 2009-02-18 チバ ホールディング インコーポレーテッド 深色モノ−及びビス−アシルホスフィンオキシド及びスルフィド並びに光開始剤としてのこれらの使用
BR0214324A (pt) * 2001-11-20 2004-11-03 Ciba Sc Holding Ag Formas diméricas e multiméricas de acilfosfinas, óxidos de acilfosfina e sulfetos de acilfosfina
DE10206096A1 (de) * 2002-02-13 2003-08-14 Basf Ag Mono- und Bisacylphosphinderivate
DE602004005981T8 (de) * 2003-05-23 2008-04-30 Ciba Specialty Chemicals Holding Inc. Stark haftende oberflächenbeschichtungen
CA2531318A1 (en) * 2003-07-18 2005-02-17 Ciba Specialty Chemicals Holding Inc. Process for preparing acylphosphanes and derivatives thereof
EP1699385B1 (en) 2003-12-29 2012-10-24 Abbott Medical Optics Inc. Intraocular lenses having a visible light-selective-transmissive-region
US20050154109A1 (en) * 2004-01-12 2005-07-14 Minyu Li Floor finish with lightening agent
US7278737B2 (en) 2004-04-30 2007-10-09 Advanced Medical Optics, Inc. Ophthalmic devices having a highly selective violet light transmissive filter and related methods
US20060115516A1 (en) 2004-11-22 2006-06-01 Pearson Jason C Copolymerizable methine and anthraquinone compounds and articles containing them
ATE549649T1 (de) * 2004-11-22 2012-03-15 Abbott Medical Optics Inc Copolymerisierbare azoverbindungen und sie enthaltende gegenstände
JP5148283B2 (ja) * 2004-11-23 2013-02-20 チバ ホールディング インコーポレーテッド アシルホスファン及びその誘導体の製造方法
GB2422678B (en) * 2005-01-25 2009-03-11 Photocentric Ltd Method of making a photopolymer plate
JP2006252787A (ja) * 2005-03-08 2006-09-21 Toppan Printing Co Ltd 有機ｅｌ素子製造方法および有機ｅｌ素子
GB2478470B8 (en) 2008-11-17 2014-05-21 Sierra Wireless Inc Method and apparatus for network port and netword address translation
US8228848B2 (en) * 2008-11-17 2012-07-24 Sierra Wireless, Inc. Method and apparatus for facilitating push communication across a network boundary
US8924486B2 (en) * 2009-02-12 2014-12-30 Sierra Wireless, Inc. Method and system for aggregating communications
CN102405239B (zh) 2009-04-20 2014-10-15 瑞士联邦苏黎世技术大学 聚合物纳米颗粒
US8633258B2 (en) 2010-06-30 2014-01-21 Dsm Ip Assets B.V. D1492 liquid BAPO photoinitiator and its use in radiation curable compositions
WO2012106820A1 (en) 2011-02-08 2012-08-16 Sierra Wireless, Inc. Method and system for forwarding data between network devices
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
GB201213163D0 (en) * 2012-07-24 2012-09-05 Lambson Ltd Photopolymerisation processes and novel compounds therefor
WO2014097079A1 (en) 2012-12-18 2014-06-26 Basf Se Semiconducting materials based on naphthalenediimide-vinylene-oligothiophene-vinylene polymers
CN110845530A (zh) * 2012-12-19 2020-02-28 Igm集团公司 双酰基次膦酸的衍生物、其制备及其作为光敏引发剂的用途
CN107082787B (zh) * 2017-06-09 2019-05-17 江苏富比亚化学品有限公司 一种苯甲酰基苯基次膦酸及其衍生物的制备方法
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
WO2019037016A1 (en) * 2017-08-24 2019-02-28 Henkel IP & Holding GmbH SILICONE POLYMER PHOTO-INITIATOR AND USES THEREOF
KR20200100610A (ko) 2017-12-27 2020-08-26 헨켈 아이피 앤드 홀딩 게엠베하 광학적으로 투명한 감압성 접착제 및 그의 용도
CN112654629B (zh) * 2018-10-01 2024-06-14 陶氏东丽株式会社 有机硅化合物、制备方法及其用途
EP4149758A4 (en) * 2020-05-14 2024-09-11 3M Innovative Properties Company MULTILAYER OPTICAL FILMS COMPRISING AT LEAST ONE LAYER OF FLUORINATED (CO)POLYMER PREPARED USING A FLUORINATED PHOTOINITIATOR, AND METHODS OF PREPARATION AND USE THEREOF
KR102651787B1 (ko) * 2021-07-14 2024-03-26 주식회사 엘지에너지솔루션 리튬 이차전지용 비수계 전해액 및 이를 포함하는 리튬 이차전지
CN114349788B (zh) * 2021-12-30 2023-06-20 华南理工大学 一种光引发剂及其制备方法与应用

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