CO5560597A2 - Proceso para fabricar una pelicula de vapor depositado y pelicula obtenida - Google Patents

Proceso para fabricar una pelicula de vapor depositado y pelicula obtenida

Info

Publication number
CO5560597A2
CO5560597A2 CO04015505A CO04015505A CO5560597A2 CO 5560597 A2 CO5560597 A2 CO 5560597A2 CO 04015505 A CO04015505 A CO 04015505A CO 04015505 A CO04015505 A CO 04015505A CO 5560597 A2 CO5560597 A2 CO 5560597A2
Authority
CO
Colombia
Prior art keywords
deposited
plasma
vapor
substrate
vapor film
Prior art date
Application number
CO04015505A
Other languages
English (en)
Inventor
Suzuki Hiroshi
Kanetaka Takeshi
Miki Oohashi
Sasaki Noboru
Takayuki Nakajima
Ishii Ryoji
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Publication of CO5560597A2 publication Critical patent/CO5560597A2/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/03—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/03—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite
    • C04B35/057—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite based on calcium oxide
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31507—Of polycarbonate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609—Particulate metal or metal compound-containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31725—Of polyamide
    • Y10T428/31765—Inorganic-containing or next to inorganic-containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31786—Of polyester [e.g., alkyd, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31931—Polyene monomer-containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31935—Ester, halide or nitrile of addition polymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31938—Polymer of monoethylenically unsaturated hydrocarbon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31971—Of carbohydrate

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

1.- Una película de vapor depositado que comprende un sustrato que consiste esencialmente de un material polimérico y una capa de vapor depositado formada sobre el sustrato y consiste esencialmente de un material cerámico.Caracterizada porque el sustrato se somete a un pre-tratamiento por plasma antes de la formación de la capa de vapor depositado sobre el sustrato mediante un plasma especial, usando un equipo de ánodo hueco que procesa plasma.2.- La película de vapor depositado de acuerdo con la reivindicación 1, caracterizada porque dicho equipo de ánodo hueco que procesa plasma es un equipo de ánodo hueco que procesa plasma asistido magnéticamente, además comprende un magneto.3.- La película de vapor depositado de acuerdo con la reivindicación 1 o 2, caracterizada porque el espesor de dicha capa de vapor depositado está entre 5nm y 300 nm.4.- La película de vapor depositado de acuerdo con cualquiera de las reivindicaciones 1 a 3, caracterizada porque dicho material cerámico se forma de al menos un óxido inorgánico seleccionado del grupo de óxido de aIuminio, oxido de silicio, óxido de magnesio y óxido de calcio.
CO04015505A 2001-07-24 2004-02-23 Proceso para fabricar una pelicula de vapor depositado y pelicula obtenida CO5560597A2 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001222717 2001-07-24

Publications (1)

Publication Number Publication Date
CO5560597A2 true CO5560597A2 (es) 2005-09-30

Family

ID=19056155

Family Applications (1)

Application Number Title Priority Date Filing Date
CO04015505A CO5560597A2 (es) 2001-07-24 2004-02-23 Proceso para fabricar una pelicula de vapor depositado y pelicula obtenida

Country Status (11)

Country Link
US (1) US7112370B2 (es)
EP (1) EP1410901B1 (es)
JP (1) JP4433794B2 (es)
KR (1) KR100864612B1 (es)
CN (1) CN1297397C (es)
CA (1) CA2453596C (es)
CO (1) CO5560597A2 (es)
MX (1) MXPA04000297A (es)
TW (1) TWI244437B (es)
WO (1) WO2003009998A1 (es)
ZA (1) ZA200400119B (es)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100661231B1 (ko) * 2000-12-18 2006-12-22 주식회사 효성 가스배리어성이 향상된 열수축성 폴리에스테르 필름의제조방법
JP2005335109A (ja) * 2004-05-25 2005-12-08 Toppan Printing Co Ltd 耐熱透明バリアフィルム
JP2006187966A (ja) * 2005-01-07 2006-07-20 Toppan Printing Co Ltd 透明ガスバリア積層体
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KR100733771B1 (ko) * 2006-02-09 2007-07-02 주식회사 동진에프엠티 가스베리어성이 우수한 코팅 필름의 제조방법
JP2007261134A (ja) * 2006-03-29 2007-10-11 Toppan Printing Co Ltd 帯電防止バリアフィルム
JP2008008400A (ja) * 2006-06-29 2008-01-17 Toppan Printing Co Ltd 真空断熱材
WO2008011547A1 (en) * 2006-07-20 2008-01-24 Cpfilms Inc. Composite, color corrected films comprising an aluminum oxide coating
JP2008049576A (ja) * 2006-08-24 2008-03-06 Toppan Printing Co Ltd ガスバリア性積層体
JP5391515B2 (ja) * 2006-09-11 2014-01-15 凸版印刷株式会社 太陽電池用裏面保護シートおよび太陽電池モジュール
JP2008066629A (ja) * 2006-09-11 2008-03-21 Toppan Printing Co Ltd 太陽電池用裏面保護シートおよび太陽電池モジュール
JP2008086855A (ja) * 2006-09-29 2008-04-17 Fujifilm Corp 生化学用器具
JP2009228015A (ja) * 2008-03-19 2009-10-08 Toppan Printing Co Ltd 積層体の製造方法および製造装置ならびにガスバリアフィルム
WO2009154150A1 (ja) * 2008-06-16 2009-12-23 東レ株式会社 蒸着フィルム
JP5251388B2 (ja) * 2008-09-18 2013-07-31 凸版印刷株式会社 積層体製造装置
JP5544109B2 (ja) * 2009-03-31 2014-07-09 リンテック株式会社 ガスバリア性フィルムおよび電子デバイス
KR101144233B1 (ko) * 2009-07-28 2012-05-10 지 . 텍 (주) 롤-투-롤 스퍼터링 장치의 전처리 방법 및 장치
CN102115868A (zh) * 2009-12-30 2011-07-06 上海欧菲尔光电技术有限公司 红外窗口的氧化铝保护膜制备方法
KR20120059853A (ko) * 2010-12-01 2012-06-11 삼성전자주식회사 그래핀 기판 및 제조방법
CN102074281A (zh) * 2010-12-21 2011-05-25 苏州禾盛新型材料股份有限公司 射频等离子的透明导电膜
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CN102828149A (zh) * 2011-06-13 2012-12-19 鸿富锦精密工业（深圳）有限公司 镀膜件及其制造方法
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CN110719968A (zh) * 2017-06-22 2020-01-21 宝洁公司 包括水溶性层和气相沉积无机涂层的膜
WO2018237212A1 (en) 2017-06-22 2018-12-27 The Procter & Gamble Company FILMS COMPRISING A WATER-SOLUBLE LAYER AND AN ORGANIC COATING DEPOSITED IN STEAM PHASE
WO2019087960A1 (ja) * 2017-10-30 2019-05-09 大日本印刷株式会社 積層フィルム、バリア性積層フィルム及び該バリア性積層フィルムを用いたガスバリア性包装材料、ガスバリア性包装体
JP7027972B2 (ja) * 2018-03-09 2022-03-02 大日本印刷株式会社 バリア樹脂フィルム、バリア積層体及び該バリア積層体を用いた包装材料
JP7248011B2 (ja) * 2018-03-22 2023-03-29 大日本印刷株式会社 バリア性積層フィルム及び該バリア性積層フィルムを用いた包装材料
EP3769956A4 (en) * 2018-03-23 2021-06-02 Dai Nippon Printing Co., Ltd. BARRIER RESIN FILM, BARRIER LAMINATE AND PACKAGING MATERIAL USING A BARRIER LAMINATE
JP2021536363A (ja) * 2018-08-14 2021-12-27 イーコンクリート テク リミテッドECOncrete Tech LTD. 鋳型作製用の組成物及びその使用
CN108973289A (zh) * 2018-08-17 2018-12-11 江阴宝柏包装有限公司 一种透明高阻隔的农药包装膜及其制备工艺
JP7425984B2 (ja) * 2018-09-28 2024-02-01 大日本印刷株式会社 紙容器用包装材料及び液体紙容器
JP7373126B2 (ja) * 2018-10-24 2023-11-02 大日本印刷株式会社 紙容器用包装材料及び液体紙容器
KR20220024001A (ko) * 2019-06-12 2022-03-03 다이니폰 인사츠 가부시키가이샤 배리어 필름, 적층체 및 포장 제품
CN111205499A (zh) * 2020-03-11 2020-05-29 刘珂贝 一种纳米微晶纤维素压电材料及其制备方法
EP4360871A1 (en) * 2021-06-21 2024-05-01 Toppan Inc. Gas barrier film, laminate, and packaging material
JP7031783B1 (ja) 2021-06-21 2022-03-08 凸版印刷株式会社 ガスバリアフィルム、積層体、および包装材料
JP7036266B1 (ja) 2021-06-21 2022-03-15 凸版印刷株式会社 ガスバリアフィルム、積層体、および包装材料
JP7036265B1 (ja) 2021-06-21 2022-03-15 凸版印刷株式会社 ガスバリアフィルム、積層体、および包装材料

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN87103355A (zh) * 1987-05-04 1988-11-16 张忠武 流延聚丙烯真空镀铝薄膜的方法
JPH01252475A (ja) 1988-03-30 1989-10-09 Mitsubishi Electric Corp エレベータ装置
JPH03258061A (ja) * 1990-03-08 1991-11-18 Fujitsu Ltd 携帯電話機
JPH03285061A (ja) * 1990-03-30 1991-12-16 Ulvac Japan Ltd スパッタクリーニング法
CH682821A5 (de) * 1991-10-01 1993-11-30 Alusuisse Lonza Services Ag Vorbehandelte Substratfläche einer Permeationssperre.
JPH05287498A (ja) * 1992-04-16 1993-11-02 Nkk Corp 蒸着処理用帯板の前処理方法及び装置
DE69430927T2 (de) * 1993-09-30 2003-02-06 Toppan Printing Co. Ltd., Tokio/Tokyo Gasundurchlässiges Verbundmaterial
DE4343040C1 (de) * 1993-12-16 1995-01-26 Fraunhofer Ges Forschung Barrierefolie
US6146724A (en) * 1994-06-06 2000-11-14 The University Of Tennessee Research Corporation One atmosphere uniform glow discharge plasma coating with gas barrier properties
US6083628A (en) * 1994-11-04 2000-07-04 Sigma Laboratories Of Arizona, Inc. Hybrid polymer film
US5743966A (en) * 1996-05-31 1998-04-28 The Boc Group, Inc. Unwinding of plastic film in the presence of a plasma
US6106933A (en) * 1997-04-03 2000-08-22 Toray Industries, Inc. Transparent gas barrier biaxially oriented polypropylene film, a laminate film, and a production method thereof
JP2000052475A (ja) * 1998-08-07 2000-02-22 Dainippon Printing Co Ltd バリア性フィルムおよびそれを使用した積層材
DE19845268C1 (de) * 1998-10-01 2000-01-05 Fraunhofer Ges Forschung Verfahren zum Bedampfen bandförmiger Substrate mit einer transparenten Barriereschicht aus Aluminiumoxid
JP2001088239A (ja) * 1999-09-27 2001-04-03 Dainippon Printing Co Ltd バリア性フィルムおよびそれを使用した積層材
DE10060002B4 (de) * 1999-12-07 2016-01-28 Komatsu Ltd. Vorrichtung zur Oberflächenbehandlung

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TWI244437B (en) 2005-12-01
CA2453596C (en) 2010-04-20
US20040166322A1 (en) 2004-08-26
EP1410901B1 (en) 2013-04-10
EP1410901A4 (en) 2009-09-23
WO2003009998A1 (fr) 2003-02-06
US7112370B2 (en) 2006-09-26
ZA200400119B (en) 2004-10-11
JPWO2003009998A1 (ja) 2004-11-11
EP1410901A1 (en) 2004-04-21
KR100864612B1 (ko) 2008-10-22
CN1535203A (zh) 2004-10-06
CN1297397C (zh) 2007-01-31

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