ES2045569T3 - Procedimiento y dispositivo para la elaboracion de un sistema estratificado semiconductor. - Google Patents

Procedimiento y dispositivo para la elaboracion de un sistema estratificado semiconductor.

Info

Publication number
ES2045569T3
ES2045569T3 ES90100176T ES90100176T ES2045569T3 ES 2045569 T3 ES2045569 T3 ES 2045569T3 ES 90100176 T ES90100176 T ES 90100176T ES 90100176 T ES90100176 T ES 90100176T ES 2045569 T3 ES2045569 T3 ES 2045569T3
Authority
ES
Spain
Prior art keywords
semi
procedure
elaboration
conductor
stratified system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES90100176T
Other languages
English (en)
Inventor
Campe Hilmar Dr Von
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nukem GmbH
Original Assignee
Nukem GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nukem GmbH filed Critical Nukem GmbH
Application granted granted Critical
Publication of ES2045569T3 publication Critical patent/ES2045569T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • H01L31/182—Special manufacturing methods for polycrystalline Si, e.g. Si ribbon, poly Si ingots, thin films of polycrystalline Si
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/546—Polycrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/107—Melt

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

SE PROPONE UN PROCEDIMIENTO Y DISPOSITIVO PARA LA FABRICACION DE UN SISTEMA DE SEMICONDUCTO DE ESTRATOS, EN EL QUE EN UN ESTRATO (10) SE APLICAN LAS CAPAS CORRESPONDIENTES DE SEMICONDUCTO MEDIANTE EFECTO DE CAMBIO CON UNA FUNDICION (42). LA CAPA SOPORTE (10) EN SI PUEDE SER DE VIDRIO O CUARZO QUE EN SU INTERIOR SE FORMA DE UNA FUNDICION DEJANDO RIGIDA UNA FUNDICION DE METAL.
ES90100176T 1989-01-14 1990-01-05 Procedimiento y dispositivo para la elaboracion de un sistema estratificado semiconductor. Expired - Lifetime ES2045569T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3901042A DE3901042A1 (de) 1989-01-14 1989-01-14 Verfahren und vorrichtung zur herstellung eines halbleiter-schichtsystems

Publications (1)

Publication Number Publication Date
ES2045569T3 true ES2045569T3 (es) 1994-01-16

Family

ID=6372136

Family Applications (1)

Application Number Title Priority Date Filing Date
ES90100176T Expired - Lifetime ES2045569T3 (es) 1989-01-14 1990-01-05 Procedimiento y dispositivo para la elaboracion de un sistema estratificado semiconductor.

Country Status (4)

Country Link
US (1) US5053355A (es)
EP (1) EP0379004B1 (es)
DE (2) DE3901042A1 (es)
ES (1) ES2045569T3 (es)

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US5908565A (en) * 1995-02-03 1999-06-01 Sharp Kabushiki Kaisha Line plasma vapor phase deposition apparatus and method
DE19530982C1 (de) * 1995-08-23 1996-12-05 Centrotherm Elektrische Anlage Vorrichtung zur Erzeugung einer Strömung in einer unter hoher Temperatur stehenden Flüssigkeit
US6391108B2 (en) * 1997-12-12 2002-05-21 Canon Kabushiki Kaisha Liquid phase growth method of silicon crystal, method of producing solar cell, and liquid phase growth apparatus
US6632730B1 (en) * 1999-11-23 2003-10-14 Ebara Solar, Inc. Method for self-doping contacts to a semiconductor
US7194197B1 (en) 2000-03-16 2007-03-20 Global Solar Energy, Inc. Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
US7170001B2 (en) * 2003-06-26 2007-01-30 Advent Solar, Inc. Fabrication of back-contacted silicon solar cells using thermomigration to create conductive vias
US7649141B2 (en) * 2003-06-30 2010-01-19 Advent Solar, Inc. Emitter wrap-through back contact solar cells on thin silicon wafers
US7335555B2 (en) * 2004-02-05 2008-02-26 Advent Solar, Inc. Buried-contact solar cells with self-doping contacts
US7144751B2 (en) * 2004-02-05 2006-12-05 Advent Solar, Inc. Back-contact solar cells and methods for fabrication
US20050172996A1 (en) * 2004-02-05 2005-08-11 Advent Solar, Inc. Contact fabrication of emitter wrap-through back contact silicon solar cells
US20060060238A1 (en) * 2004-02-05 2006-03-23 Advent Solar, Inc. Process and fabrication methods for emitter wrap through back contact solar cells
KR101083110B1 (ko) * 2004-08-30 2011-11-11 엘지디스플레이 주식회사 가스 분사 어셈블리를 구비한 스퍼터링 장비
CA2568136C (en) * 2006-11-30 2008-07-29 Tenxc Wireless Inc. Butler matrix implementation
WO2009029902A1 (en) * 2007-08-31 2009-03-05 Applied Materials, Inc. Photovoltaic production line
US20100047954A1 (en) * 2007-08-31 2010-02-25 Su Tzay-Fa Jeff Photovoltaic production line
EP2053663A1 (en) * 2007-10-25 2009-04-29 Applied Materials, Inc. Hover cushion transport for webs in a web coating process
US20090126786A1 (en) * 2007-11-13 2009-05-21 Advent Solar, Inc. Selective Emitter and Texture Processes for Back Contact Solar Cells
US20090188603A1 (en) * 2008-01-25 2009-07-30 Applied Materials, Inc. Method and apparatus for controlling laminator temperature on a solar cell
US8202368B2 (en) * 2008-04-15 2012-06-19 Yakima Products, Inc. Apparatus and methods for manufacturing thin-film solar cells
US12018857B2 (en) 2008-06-13 2024-06-25 Kateeva, Inc. Gas enclosure assembly and system
US11975546B2 (en) 2008-06-13 2024-05-07 Kateeva, Inc. Gas enclosure assembly and system
US10434804B2 (en) 2008-06-13 2019-10-08 Kateeva, Inc. Low particle gas enclosure systems and methods
US20110177622A1 (en) * 2009-12-28 2011-07-21 Global Solar Energy, Inc. Apparatus and methods of mixing and depositing thin film photovoltaic compositions
US20100266766A1 (en) * 2009-04-21 2010-10-21 Stefan Hein Guiding devices and methods for contactless guiding of a web in a web coating process
US20110068367A1 (en) * 2009-09-23 2011-03-24 Sierra Solar Power, Inc. Double-sided heterojunction solar cell based on thin epitaxial silicon
US9012766B2 (en) 2009-11-12 2015-04-21 Silevo, Inc. Aluminum grid as backside conductor on epitaxial silicon thin film solar cells
US9214576B2 (en) 2010-06-09 2015-12-15 Solarcity Corporation Transparent conducting oxide for photovoltaic devices
US9773928B2 (en) 2010-09-10 2017-09-26 Tesla, Inc. Solar cell with electroplated metal grid
US9800053B2 (en) 2010-10-08 2017-10-24 Tesla, Inc. Solar panels with integrated cell-level MPPT devices
US9054256B2 (en) 2011-06-02 2015-06-09 Solarcity Corporation Tunneling-junction solar cell with copper grid for concentrated photovoltaic application
KR20140003693A (ko) * 2012-06-22 2014-01-10 엘지전자 주식회사 태양 전지의 불순물층 형성용 마스크 및 이의 제조 방법, 그리고 이를 이용한 태양 전지용 불순물층의 제조 방법
WO2014055781A1 (en) 2012-10-04 2014-04-10 Silevo, Inc. Photovoltaic devices with electroplated metal grids
US9865754B2 (en) 2012-10-10 2018-01-09 Tesla, Inc. Hole collectors for silicon photovoltaic cells
US9281436B2 (en) 2012-12-28 2016-03-08 Solarcity Corporation Radio-frequency sputtering system with rotary target for fabricating solar cells
US9412884B2 (en) 2013-01-11 2016-08-09 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
US10074755B2 (en) 2013-01-11 2018-09-11 Tesla, Inc. High efficiency solar panel
WO2014110520A1 (en) 2013-01-11 2014-07-17 Silevo, Inc. Module fabrication of solar cells with low resistivity electrodes
US9624595B2 (en) 2013-05-24 2017-04-18 Solarcity Corporation Electroplating apparatus with improved throughput
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EP3087623B1 (en) 2013-12-26 2021-09-22 Kateeva, Inc. Thermal treatment of electronic devices
US9343678B2 (en) 2014-01-21 2016-05-17 Kateeva, Inc. Apparatus and techniques for electronic device encapsulation
EP3050135B1 (en) 2014-01-21 2019-11-06 Kateeva, Inc. Apparatus and techniques for electronic device encapsulation
EP3138123B1 (en) 2014-04-30 2021-06-02 Kateeva, Inc. Gas cushion apparatus and techniques for substrate coating
US10309012B2 (en) 2014-07-03 2019-06-04 Tesla, Inc. Wafer carrier for reducing contamination from carbon particles and outgassing
US9899546B2 (en) 2014-12-05 2018-02-20 Tesla, Inc. Photovoltaic cells with electrodes adapted to house conductive paste
US9947822B2 (en) 2015-02-02 2018-04-17 Tesla, Inc. Bifacial photovoltaic module using heterojunction solar cells
US9761744B2 (en) 2015-10-22 2017-09-12 Tesla, Inc. System and method for manufacturing photovoltaic structures with a metal seed layer
US9842956B2 (en) 2015-12-21 2017-12-12 Tesla, Inc. System and method for mass-production of high-efficiency photovoltaic structures
US9496429B1 (en) 2015-12-30 2016-11-15 Solarcity Corporation System and method for tin plating metal electrodes
US10115838B2 (en) 2016-04-19 2018-10-30 Tesla, Inc. Photovoltaic structures with interlocking busbars
CN106784062A (zh) * 2016-12-30 2017-05-31 中建材浚鑫科技股份有限公司 一种硅片清洗制绒装置及其方法
US10672919B2 (en) 2017-09-19 2020-06-02 Tesla, Inc. Moisture-resistant solar cells for solar roof tiles
US11190128B2 (en) 2018-02-27 2021-11-30 Tesla, Inc. Parallel-connected solar roof tile modules

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* Cited by examiner, † Cited by third party
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US4571448A (en) * 1981-11-16 1986-02-18 University Of Delaware Thin film photovoltaic solar cell and method of making the same
US4778478A (en) * 1981-11-16 1988-10-18 University Of Delaware Method of making thin film photovoltaic solar cell
DE3231326A1 (de) * 1982-08-23 1984-02-23 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zum herstellen von grossflaechigen, bandfoermigen siliziumkoerpern fuer solarzellen
DE3329923A1 (de) * 1983-08-19 1985-02-28 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen
DE3342046A1 (de) * 1983-08-19 1985-05-30 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen
US4599244A (en) * 1984-07-11 1986-07-08 Siemens Aktiengesellschaft Method large-area silicon bodies
DE3605973A1 (de) * 1986-02-25 1987-08-27 Licentia Gmbh Fluessigphasen-epitaxieanordnung

Also Published As

Publication number Publication date
DE59002410D1 (de) 1993-09-30
US5053355A (en) 1991-10-01
EP0379004A3 (en) 1990-10-10
EP0379004A2 (de) 1990-07-25
EP0379004B1 (de) 1993-08-25
DE3901042A1 (de) 1990-07-26
DE3901042C2 (es) 1993-07-15

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