CN1985330A - 半导体存储器 - Google Patents
半导体存储器 Download PDFInfo
- Publication number
- CN1985330A CN1985330A CNA2004800435563A CN200480043556A CN1985330A CN 1985330 A CN1985330 A CN 1985330A CN A2004800435563 A CNA2004800435563 A CN A2004800435563A CN 200480043556 A CN200480043556 A CN 200480043556A CN 1985330 A CN1985330 A CN 1985330A
- Authority
- CN
- China
- Prior art keywords
- signal
- word line
- address
- word
- refresh
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 93
- 230000004044 response Effects 0.000 claims abstract description 40
- 238000003860 storage Methods 0.000 claims description 93
- 230000004913 activation Effects 0.000 claims description 87
- 230000009172 bursting Effects 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 9
- 238000007599 discharging Methods 0.000 abstract description 20
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 28
- 238000005516 engineering process Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 230000006870 function Effects 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 7
- 230000003213 activating effect Effects 0.000 description 5
- 210000004027 cell Anatomy 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- XJCLWVXTCRQIDI-UHFFFAOYSA-N Sulfallate Chemical compound CCN(CC)C(=S)SCC(Cl)=C XJCLWVXTCRQIDI-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000002045 lasting effect Effects 0.000 description 3
- 230000002459 sustained effect Effects 0.000 description 3
- 230000001360 synchronised effect Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 101000771599 Homo sapiens WD repeat-containing protein 5 Proteins 0.000 description 1
- 102100029445 WD repeat-containing protein 5 Human genes 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- GOLXNESZZPUPJE-UHFFFAOYSA-N spiromesifen Chemical compound CC1=CC(C)=CC(C)=C1C(C(O1)=O)=C(OC(=O)CC(C)(C)C)C11CCCC1 GOLXNESZZPUPJE-UHFFFAOYSA-N 0.000 description 1
- 210000000352 storage cell Anatomy 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/406—Management or control of the refreshing or charge-regeneration cycles
- G11C11/40618—Refresh operations over multiple banks or interleaving
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/406—Management or control of the refreshing or charge-regeneration cycles
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/4063—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
- G11C11/407—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
- G11C11/408—Address circuits
- G11C11/4087—Address decoders, e.g. bit - or word line decoders; Multiple line decoders
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Dram (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2004/011267 WO2006013632A1 (ja) | 2004-08-05 | 2004-08-05 | 半導体メモリ |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1985330A true CN1985330A (zh) | 2007-06-20 |
CN100592420C CN100592420C (zh) | 2010-02-24 |
Family
ID=35786933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200480043556A Expired - Fee Related CN100592420C (zh) | 2004-08-05 | 2004-08-05 | 半导体存储器 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7379370B2 (zh) |
JP (1) | JP4579247B2 (zh) |
CN (1) | CN100592420C (zh) |
WO (1) | WO2006013632A1 (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110261754A (zh) * | 2018-03-12 | 2019-09-20 | 爱思开海力士有限公司 | 半导体装置以及包括该半导体装置的测试系统 |
CN110910943A (zh) * | 2018-09-14 | 2020-03-24 | 爱思开海力士有限公司 | 半导体器件的熔丝锁存器 |
CN112397120A (zh) * | 2019-08-16 | 2021-02-23 | 美光科技公司 | 用于减少半导体装置中存取装置亚阈值泄漏的设备和方法 |
CN113129976A (zh) * | 2021-06-17 | 2021-07-16 | 中天弘宇集成电路有限责任公司 | 行译码电路及存储器 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7444577B2 (en) * | 2005-08-04 | 2008-10-28 | Rambus Inc. | Memory device testing to support address-differentiated refresh rates |
JP4816911B2 (ja) * | 2006-02-07 | 2011-11-16 | 日本電気株式会社 | メモリの同期化方法及びリフレッシュ制御回路 |
JP4813937B2 (ja) * | 2006-03-20 | 2011-11-09 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
CN1851825B (zh) * | 2006-05-10 | 2010-05-12 | 威盛电子股份有限公司 | 高效能存储器及相关方法 |
JP5151106B2 (ja) * | 2006-09-27 | 2013-02-27 | 富士通セミコンダクター株式会社 | 半導体メモリおよびシステム |
KR100878307B1 (ko) * | 2007-05-11 | 2009-01-14 | 주식회사 하이닉스반도체 | 멀티 워드라인 테스트 제어 회로 및 그의 제어 방법 |
JP4962206B2 (ja) * | 2007-08-10 | 2012-06-27 | 富士通セミコンダクター株式会社 | 半導体記憶装置及びワードデコーダ制御方法 |
CN102194513B (zh) * | 2010-03-11 | 2013-07-31 | 复旦大学 | 自动调整存储器刷新操作频率的电路、方法及其存储器 |
US8547777B2 (en) * | 2010-12-22 | 2013-10-01 | Intel Corporation | Nor logic word line selection |
JP5932236B2 (ja) * | 2011-04-13 | 2016-06-08 | ピーエスフォー ルクスコ エスエイアールエルPS4 Luxco S.a.r.l. | 半導体装置及びシステム |
KR20130117424A (ko) * | 2012-04-17 | 2013-10-28 | 삼성전자주식회사 | 반도체 메모리 장치의 리프레쉬 회로 |
KR20160119588A (ko) * | 2015-04-06 | 2016-10-14 | 에스케이하이닉스 주식회사 | 반도체 메모리 장치 |
KR102550685B1 (ko) * | 2016-07-25 | 2023-07-04 | 에스케이하이닉스 주식회사 | 반도체장치 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3255947B2 (ja) * | 1991-11-12 | 2002-02-12 | 株式会社日立製作所 | 半導体装置 |
JPH08315598A (ja) * | 1995-05-12 | 1996-11-29 | Mitsubishi Electric Corp | テスト機能内蔵メモリ集積回路 |
JPH08315569A (ja) * | 1995-05-16 | 1996-11-29 | Hitachi Ltd | 半導体記憶装置、及びデータ処理装置 |
JP3752288B2 (ja) | 1995-12-11 | 2006-03-08 | 株式会社ルネサステクノロジ | 半導体記憶装置 |
TW509943B (en) * | 1999-10-06 | 2002-11-11 | Ind Tech Res Inst | Hidden-type refreshed 2P2N pseudo static random access memory and its refreshing method |
JP5034149B2 (ja) * | 2000-10-05 | 2012-09-26 | 富士通セミコンダクター株式会社 | 半導体メモリおよびその制御方法 |
JP3705113B2 (ja) | 2000-10-27 | 2005-10-12 | セイコーエプソン株式会社 | 半導体メモリ装置内のワード線の活性化 |
JP2003068071A (ja) * | 2001-08-30 | 2003-03-07 | Hitachi Ltd | 半導体メモリ |
US6515929B1 (en) * | 2001-10-29 | 2003-02-04 | Etron Technology, Inc. | Partial refresh feature in pseudo SRAM |
JP2004102508A (ja) * | 2002-09-06 | 2004-04-02 | Renesas Technology Corp | 半導体記憶装置 |
-
2004
- 2004-08-05 WO PCT/JP2004/011267 patent/WO2006013632A1/ja active Application Filing
- 2004-08-05 JP JP2006531067A patent/JP4579247B2/ja not_active Expired - Fee Related
- 2004-08-05 CN CN200480043556A patent/CN100592420C/zh not_active Expired - Fee Related
-
2006
- 2006-12-20 US US11/641,767 patent/US7379370B2/en not_active Expired - Lifetime
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110261754A (zh) * | 2018-03-12 | 2019-09-20 | 爱思开海力士有限公司 | 半导体装置以及包括该半导体装置的测试系统 |
CN110910943A (zh) * | 2018-09-14 | 2020-03-24 | 爱思开海力士有限公司 | 半导体器件的熔丝锁存器 |
CN110910943B (zh) * | 2018-09-14 | 2023-06-09 | 爱思开海力士有限公司 | 半导体器件的熔丝锁存器 |
CN112397120A (zh) * | 2019-08-16 | 2021-02-23 | 美光科技公司 | 用于减少半导体装置中存取装置亚阈值泄漏的设备和方法 |
CN113129976A (zh) * | 2021-06-17 | 2021-07-16 | 中天弘宇集成电路有限责任公司 | 行译码电路及存储器 |
CN113129976B (zh) * | 2021-06-17 | 2021-09-03 | 中天弘宇集成电路有限责任公司 | 行译码电路及存储器 |
US11410738B1 (en) | 2021-06-17 | 2022-08-09 | China Flash Co., Ltd. | Word line decoding circuit and memory |
Also Published As
Publication number | Publication date |
---|---|
CN100592420C (zh) | 2010-02-24 |
US20070121410A1 (en) | 2007-05-31 |
JPWO2006013632A1 (ja) | 2008-05-01 |
US7379370B2 (en) | 2008-05-27 |
JP4579247B2 (ja) | 2010-11-10 |
WO2006013632A1 (ja) | 2006-02-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: FUJITSU MICROELECTRONICS CO., LTD. Free format text: FORMER OWNER: FUJITSU LIMITED Effective date: 20081024 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20081024 Address after: Tokyo, Japan, Japan Applicant after: Fujitsu Microelectronics Ltd. Address before: Kanagawa Applicant before: Fujitsu Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: FUJITSU SEMICONDUCTORS CO., LTD Free format text: FORMER NAME: FUJITSU MICROELECTRON CO., LTD. |
|
CP03 | Change of name, title or address |
Address after: Kanagawa Patentee after: Fujitsu Semiconductor Co., Ltd. Address before: Tokyo, Japan, Japan Patentee before: Fujitsu Microelectronics Ltd. |
|
ASS | Succession or assignment of patent right |
Owner name: SUOSI FUTURE CO., LTD. Free format text: FORMER OWNER: FUJITSU SEMICONDUCTOR CO., LTD. Effective date: 20150512 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150512 Address after: Kanagawa Patentee after: Co., Ltd. Suo Si future Address before: Kanagawa Patentee before: Fujitsu Semiconductor Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100224 Termination date: 20200805 |