CN1387465A - 铜或铜合金非电镀镀锡的方法 - Google Patents

铜或铜合金非电镀镀锡的方法 Download PDF

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CN1387465A
CN1387465A CN00815462.7A CN00815462A CN1387465A CN 1387465 A CN1387465 A CN 1387465A CN 00815462 A CN00815462 A CN 00815462A CN 1387465 A CN1387465 A CN 1387465A
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copper
tin
electrolyte
layer
complexing agent
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CN1192125C (zh
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J·贝尔
J·赫耶
J·休普
I·卡克
M·克莱恩菲尔德
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MacDermid Enthone Inc
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Enthone OMI Inc
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48Coating with alloys

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  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Conductive Materials (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

从甲磺酸和含锡、含络合剂的电解质中通过沉积锡对铜和铜合金进行非电镀镀锡的方法。通过所描述的方法,形成可以焊接的耐用锡层,同时,该锡层能防止基体金属的释放,本发明公开了电解质具有至少一种加入的外来金属以在锡层内形成扩散阻挡层。

Description

铜或铜合金非电镀镀锡的方法
本发明涉及通过从含锡的电解质中沉积锡来对铜或铜合金进行非电镀镀锡的方法,该电解质由甲磺酸和络合剂组成。
基于酸性和碱性电解质的非电镀锡沉积是现有技术中已知的,也是常用的。基本上是通过离子交换过程对铜和铜合金进行镀覆锡,例如用于凉水和热水的管道、管道截面和配件、电池接线柱、厕所连接管以及导体结构。作为电解质锡的来源,主要使用二价锡盐,例如氯化锡、硫酸锡、四氟硼酸锡或甲磺酸锡。
通过把铜置换成锡来实现在铜和铜合金上形成非电镀沉积的锡层,从而能够通过络合剂去掉铜。
在DE 197 49 328 A1中描述了通用的方法。那里描述的方法指的是通过化学沉积锡层而在铜或铜合金的管道、管道截面和配件上进行镀锡。建议以甲磺酸、甲磺酸锡、络合剂以及润湿剂作为电解质。
用迄今已知的锡沉积方法制备的锡层会一直增加直到不再有表面铜通过多孔的锡层。因此能获得的层厚最大限于2微米。其缺点在于会发生从基体材料中,特别是从合金元件的基体材料中的金属扩散,这会导致不希望的结果。例如,饮用水管道的铜可能会溶解并通过锡扩散从而进入水中,而这有损于健康。而且,沉积通用的锡层不能防止例如从钎焊基体材料中释放铅和锌。另外,由于扩散造成镀锡基体材料的表面焊接困难也是一个缺点。
为了避免上述缺点,本发明的目的是设计一种对铜和铜合金进行非电镀镀锡的方法,通过这种方法,可以形成容易焊接的耐用锡层,同时,该方法能防止基体材料的释放。
作为溶液,本发明建议向电解质中加入至少一种外来金属以在锡层中形成扩散阻挡层。
根据本发明中描述的方法,建议使用含至少一种外来金属的锡浴以通过化学沉积形成锡层。向锡浴中加入外来金属能实现对扩散过程有益的抑制,这样就建立起从很大程度上防止从基体材料中释放金属的扩散阻挡层。这样所取得的优点是在表面处良好的焊接特性和锡层良好的耐用性。
因此,通过上述方法形成的锡层不仅能够形成有效的腐蚀保护,而且通过使用外来金属形成了基本上防止从基体层中释放材料的扩散稳定的锡层。特别是从输送饮用水的铜管道的角度看,这是一个优点,然而,通过扩散稳定的锡层能防止从基体钎焊材料中向外扩散铅和锌。
根据本发明的一个特点,建议以银、铋、镍、钛、锆和铟中的一种金属作为外来金属,其中使用铟被证明是特别有效的。对于在锡层内形成扩散阻挡层,向锡浴中加入至少一种上述金属作为外来金属。
根据本发明的另一个特点,使用硫脲和/或其衍生物为络合剂。作为络合剂的硫脲可以使荷正电的铜离子释放。形成的铜硫脲络合物在大于28℃的温度下,在电解质中是可溶的。作为络合铜的结果,其电位与锡的电位相比下降。接着,有更为惰性的锡沉积,于是在铜上形成锡层。释放的铜离子在电解质中富集,从而当铜的浓度大于7g/l时,不再可能经济地操作,因为在这些浓度下,锡不再以令人满意的速度沉积。因此建议,在电解质溶液中通过沉积铜-硫脲化合物而去掉铜。通过这种方式,基本上可以增加锡浴的使用寿命。通过过滤,利用本发明的另一个特点可以实现铜-硫脲化合物的沉积。
使用根据本发明的锡浴进行非电镀沉积扩散稳定的锡层是有利的,该锡浴优选的是含下列成分:
1.锡源,
优选的是二价锡盐,例如甲磺酸锡,在锡浴中为1到30g/l的锡;
2.酸,
优选的是锡浴中5到200g/l的甲磺酸,从而可以认为锡浴的pH值是0到3;
3.络合剂,
优选的是硫脲或其衍生物,10到200g/l;
4.1到10g/l的润湿剂
5.至少一种外来金属,
优选的是银、铋、镍、钛、锆和铟中的一种金属,在锡浴中的比例是1到500mg/l
为了应用本发明中描述的方法,建议锡浴的工作温度为35到80℃。另外,当使用所描述的方法时,也可以采用现有技术中的常规已知方法。这包括,例如工件的清洗、酸洗和干燥。
关于本发明的进一步的细节是根据下面的实施例得出的,在每个实施例中都推荐了一种电解质组合物。
实施例1
                    硫脲          100g/l
                    甲磺酸        100g/l
                    甲磺酸锡      5g/l锡
                    润湿剂        5g/l
                    铋            30mg/l
实施例2
                    硫脲          100g/l
                    甲磺酸        100g/l
                    甲磺酸锡      15g/l锡
                    润湿剂        3g/l
                    抗氧化剂      5g/l
                    钛            5mg/l
实施例3
                    硫脲          120g/l
                    甲磺酸        140g/l
                    甲磺酸锡      15g/l锡
                    润湿剂        5g/l
                    抗氧化剂      5g/l
                    铟            50mg/l
通过化学沉积,本发明描述的方法能够形成扩散稳定的锡层,从而通过加入外来金属形成的扩散阻挡层有利于防止从基体材料中释放金属。另外,通过使用硫脲作为络合剂,通过过滤,有可能从电解质中去掉从铜中释放的铜离子,这样基本上实现了延长锡浴使用寿命。而且,照这样,基本上加速了反应过程。

Claims (5)

1.一种从甲磺酸和含锡、含络合剂的电解质中通过沉积锡对铜和铜合金进行非电镀镀锡的方法,其特征在于电解质具有至少一种外加的外来金属以在锡层内建立扩散阻挡层。
2.根据权利要求1的方法,其特征在于以银、铋、镍、钛、锆和铟中的一种金属作为外来金属。
3.根据权利要求1和2的方法,其特征在于以硫脲和/或其衍生物作为络合剂
4.根据前面任何一个权利要求的方法,其特征在于通过铜-硫脲化合物的沉积去掉溶液中的铜而更新电解质。
5.根据权利要求4的方法,其特征在于铜-硫脲化合物是过滤掉的。
CNB008154627A 1999-11-12 2000-11-09 铜或铜合金非电镀镀锡的方法 Expired - Lifetime CN1192125C (zh)

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DE19954613A DE19954613A1 (de) 1999-11-12 1999-11-12 Verfahren zur stromlosen Verzinnung von Kupfer oder Kupferlegierungen
DE19954613.4 1999-11-12

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JP (1) JP4084569B2 (zh)
CN (1) CN1192125C (zh)
AT (1) ATE480340T1 (zh)
AU (1) AU1597501A (zh)
DE (2) DE19954613A1 (zh)
WO (1) WO2001034310A1 (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103052736A (zh) * 2010-07-09 2013-04-17 埃托特克德国有限公司 金属涂层沉积方法与装置
TWI464295B (zh) * 2010-12-28 2014-12-11 羅門哈斯電子材料有限公司 從鍍覆溶液中移除雜質的方法
TWI471456B (zh) * 2011-09-14 2015-02-01 羅門哈斯電子材料有限公司 自鍍覆液移除雜質之方法

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JP4998704B2 (ja) 2007-01-22 2012-08-15 上村工業株式会社 置換錫合金めっき皮膜の形成方法、置換錫合金めっき浴及びめっき性能の維持方法
US9175400B2 (en) * 2009-10-28 2015-11-03 Enthone Inc. Immersion tin silver plating in electronics manufacture
JP5715411B2 (ja) * 2010-12-28 2015-05-07 ローム・アンド・ハース電子材料株式会社 めっき液中から不純物を除去する方法
MA37931A1 (fr) * 2012-08-13 2016-07-29 Teni Boulikas Procédés améliorés permettant de traiter un cancer avec une toxicité rénale réduite

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103052736A (zh) * 2010-07-09 2013-04-17 埃托特克德国有限公司 金属涂层沉积方法与装置
TWI464295B (zh) * 2010-12-28 2014-12-11 羅門哈斯電子材料有限公司 從鍍覆溶液中移除雜質的方法
TWI471456B (zh) * 2011-09-14 2015-02-01 羅門哈斯電子材料有限公司 自鍍覆液移除雜質之方法

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AU1597501A (en) 2001-06-06
JP2003514120A (ja) 2003-04-15
ATE480340T1 (de) 2010-09-15
WO2001034310A1 (en) 2001-05-17
CN1192125C (zh) 2005-03-09
DE19954613A1 (de) 2001-05-17
EP1230034A4 (en) 2003-01-08
EP1230034A1 (en) 2002-08-14
DE60044943D1 (de) 2010-10-21
JP4084569B2 (ja) 2008-04-30

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