CN1234798C - 研磨用组合物及使用了该组合物的存储硬盘的制造方法 - Google Patents

研磨用组合物及使用了该组合物的存储硬盘的制造方法 Download PDF

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Publication number
CN1234798C
CN1234798C CN 02107700 CN02107700A CN1234798C CN 1234798 C CN1234798 C CN 1234798C CN 02107700 CN02107700 CN 02107700 CN 02107700 A CN02107700 A CN 02107700A CN 1234798 C CN1234798 C CN 1234798C
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CN
China
Prior art keywords
acid
composition
polishing
hard disk
storage hard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 02107700
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English (en)
Chinese (zh)
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CN1379074A (zh
Inventor
安福昇
大脇寿树
横道典孝
平野淳一
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Fujimi Inc
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Fujimi Inc
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Publication of CN1379074A publication Critical patent/CN1379074A/zh
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Publication of CN1234798C publication Critical patent/CN1234798C/zh
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Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CN 02107700 2001-03-29 2002-03-29 研磨用组合物及使用了该组合物的存储硬盘的制造方法 Expired - Fee Related CN1234798C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001096699A JP4439755B2 (ja) 2001-03-29 2001-03-29 研磨用組成物およびそれを用いたメモリーハードディスクの製造方法
JP096699/01 2001-03-29

Publications (2)

Publication Number Publication Date
CN1379074A CN1379074A (zh) 2002-11-13
CN1234798C true CN1234798C (zh) 2006-01-04

Family

ID=18950586

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 02107700 Expired - Fee Related CN1234798C (zh) 2001-03-29 2002-03-29 研磨用组合物及使用了该组合物的存储硬盘的制造方法

Country Status (4)

Country Link
JP (1) JP4439755B2 (ja)
CN (1) CN1234798C (ja)
GB (1) GB2375116B (ja)
MY (1) MY131997A (ja)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003170349A (ja) * 2001-09-27 2003-06-17 Fujimi Inc 磁気ディスク用基板の研磨用組成物及びそれを用いた研磨方法
JP3997152B2 (ja) 2002-12-26 2007-10-24 花王株式会社 研磨液組成物
TWI254741B (en) 2003-02-05 2006-05-11 Kao Corp Polishing composition
US6896591B2 (en) * 2003-02-11 2005-05-24 Cabot Microelectronics Corporation Mixed-abrasive polishing composition and method for using the same
JP4202157B2 (ja) * 2003-02-28 2008-12-24 株式会社フジミインコーポレーテッド 研磨用組成物
JP2006021259A (ja) * 2004-07-06 2006-01-26 Fuji Electric Device Technology Co Ltd 磁気ディスク基板の研磨方法および磁気ディスク媒体
JP4954462B2 (ja) * 2004-10-19 2012-06-13 株式会社フジミインコーポレーテッド 窒化シリコン膜選択的研磨用組成物およびそれを用いる研磨方法
US7476620B2 (en) 2005-03-25 2009-01-13 Dupont Air Products Nanomaterials Llc Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers
JP4635694B2 (ja) * 2005-04-15 2011-02-23 日立化成工業株式会社 磁性金属膜と絶縁材料膜とを含む複合膜を研磨するための研磨材および研磨方法
US7435162B2 (en) 2005-10-24 2008-10-14 3M Innovative Properties Company Polishing fluids and methods for CMP
TWI411667B (zh) 2006-04-28 2013-10-11 Kao Corp 磁碟基板用之研磨液組成物
JP4577296B2 (ja) * 2006-10-27 2010-11-10 富士電機デバイステクノロジー株式会社 磁気記録媒体用非金属基板の再生方法
KR101538826B1 (ko) 2008-10-20 2015-07-22 니타 하스 인코포레이티드 질화 규소 연마용 조성물 및 이것을 이용한 선택비의 제어 방법
JP4891304B2 (ja) * 2008-10-23 2012-03-07 花王株式会社 メモリーハードディスク基板の製造方法
US9076480B2 (en) 2010-03-29 2015-07-07 Hoya Corporation Method of producing glass substrate for information recording medium
CN102585707B (zh) * 2012-02-28 2014-01-29 上海华明高纳稀土新材料有限公司 铈基混合稀土抛光粉的制备方法
CN103372809A (zh) * 2012-04-12 2013-10-30 江西赛维Ldk太阳能高科技有限公司 一种改善硅块磨面质量的方法
CN106978087B (zh) * 2017-03-20 2018-10-23 上海大学 一种偏钛酸包覆氧化铝核壳磨粒抛光液组合物及其制备方法
US11186748B2 (en) * 2017-09-28 2021-11-30 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
US10584265B2 (en) * 2017-09-28 2020-03-10 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them
SG10201904669TA (en) 2018-06-28 2020-01-30 Kctech Co Ltd Polishing Slurry Composition
US20200303198A1 (en) * 2019-03-22 2020-09-24 Fujimi Incorporated Polishing composition and polishing method
CN111574927A (zh) * 2020-06-22 2020-08-25 宁波日晟新材料有限公司 一种含还原剂的碳化硅抛光液及其制备方法和应用
CN114952437B (zh) * 2022-05-27 2023-08-18 中国人民解放军国防科技大学 NiP改性层的加工方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5858813A (en) * 1996-05-10 1999-01-12 Cabot Corporation Chemical mechanical polishing slurry for metal layers and films
TW501197B (en) * 1999-08-17 2002-09-01 Hitachi Chemical Co Ltd Polishing compound for chemical mechanical polishing and method for polishing substrate
JP4238951B2 (ja) * 1999-09-28 2009-03-18 株式会社フジミインコーポレーテッド 研磨用組成物およびそれを用いたメモリーハードディスクの製造方法
JP2001187878A (ja) * 1999-12-28 2001-07-10 Nec Corp 化学的機械的研磨用スラリー
US6355075B1 (en) * 2000-02-11 2002-03-12 Fujimi Incorporated Polishing composition

Also Published As

Publication number Publication date
CN1379074A (zh) 2002-11-13
JP2002294225A (ja) 2002-10-09
GB0206036D0 (en) 2002-04-24
GB2375116A (en) 2002-11-06
MY131997A (en) 2007-09-28
JP4439755B2 (ja) 2010-03-24
GB2375116B (en) 2004-10-20

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