MY131997A - Method of polishing a substrate and method for producing a memory hard disk - Google Patents

Method of polishing a substrate and method for producing a memory hard disk

Info

Publication number
MY131997A
MY131997A MYPI20021016A MY131997A MY 131997 A MY131997 A MY 131997A MY PI20021016 A MYPI20021016 A MY PI20021016A MY 131997 A MY131997 A MY 131997A
Authority
MY
Malaysia
Prior art keywords
acid
hard disk
memory hard
polishing
producing
Prior art date
Application number
Inventor
Noboru Yasufuku
Toshiki Owaki
Noritaka Yokomichi
Junichi Hirano
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY131997A publication Critical patent/MY131997A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

A POLISHING COMPOSITION FOR A MEMORY HARD DISK, WHICH COMPRISES WATER, SILICON DIOXIDE, AN OXIDIZING AGENT , AND AT LEAST ONE ORGANIC ACID SELECTED FROM THE GROUP CONSISTING OF MALIC ACID, MALEIC ACID, LACTIC ACID, AETIC ACID, CITRIC ACID, SUCCINIC ACID, MALONIC ACID, GLYCOLIC ACID, ADIPIC ACID, ASCORBIC ACID, ITACONIC ACID, IMINODIACETIC ACID, FORMIC ACID, ACRYLIC ACID, CROTONIC ACID, NICOTINIC ACID, CITRACONIC ACID AND TARTARIC ACID, AND WHICH HAS A PH OF AT LEAST 1 AND LESS THAN 7 AND CONTAINS SUBSTANTIALLY NO METAL IONS.
MYPI20021016 2001-03-29 2002-03-22 Method of polishing a substrate and method for producing a memory hard disk MY131997A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001096699A JP4439755B2 (en) 2001-03-29 2001-03-29 Polishing composition and method for producing memory hard disk using the same

Publications (1)

Publication Number Publication Date
MY131997A true MY131997A (en) 2007-09-28

Family

ID=18950586

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20021016 MY131997A (en) 2001-03-29 2002-03-22 Method of polishing a substrate and method for producing a memory hard disk

Country Status (4)

Country Link
JP (1) JP4439755B2 (en)
CN (1) CN1234798C (en)
GB (1) GB2375116B (en)
MY (1) MY131997A (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003170349A (en) * 2001-09-27 2003-06-17 Fujimi Inc Composition for polishing of substrate for magnetic disc and polishing method using it
JP3997152B2 (en) 2002-12-26 2007-10-24 花王株式会社 Polishing liquid composition
TWI254741B (en) 2003-02-05 2006-05-11 Kao Corp Polishing composition
US6896591B2 (en) * 2003-02-11 2005-05-24 Cabot Microelectronics Corporation Mixed-abrasive polishing composition and method for using the same
JP4202157B2 (en) * 2003-02-28 2008-12-24 株式会社フジミインコーポレーテッド Polishing composition
JP2006021259A (en) * 2004-07-06 2006-01-26 Fuji Electric Device Technology Co Ltd Polishing method of magnetic disk base board and magnetic disk medium
JP4954462B2 (en) * 2004-10-19 2012-06-13 株式会社フジミインコーポレーテッド Composition for selective polishing of silicon nitride film and polishing method using the same
US7476620B2 (en) 2005-03-25 2009-01-13 Dupont Air Products Nanomaterials Llc Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers
JP4635694B2 (en) * 2005-04-15 2011-02-23 日立化成工業株式会社 Polishing material and polishing method for polishing a composite film including a magnetic metal film and an insulating material film
US7435162B2 (en) 2005-10-24 2008-10-14 3M Innovative Properties Company Polishing fluids and methods for CMP
TWI411667B (en) 2006-04-28 2013-10-11 Kao Corp Polishing composition for magnetic disk substrate
JP4577296B2 (en) * 2006-10-27 2010-11-10 富士電機デバイステクノロジー株式会社 Reproduction method of non-metallic substrate for magnetic recording medium
KR101538826B1 (en) 2008-10-20 2015-07-22 니타 하스 인코포레이티드 Composition for polishing silicon nitride and method for controlling selectivity using same
JP4891304B2 (en) * 2008-10-23 2012-03-07 花王株式会社 Manufacturing method of memory hard disk substrate
US9076480B2 (en) 2010-03-29 2015-07-07 Hoya Corporation Method of producing glass substrate for information recording medium
CN102585707B (en) * 2012-02-28 2014-01-29 上海华明高纳稀土新材料有限公司 Preparation method of cerium-based mixed rare earth polishing powder
CN103372809A (en) * 2012-04-12 2013-10-30 江西赛维Ldk太阳能高科技有限公司 Method for improving silicon block ground surface quality
CN106978087B (en) * 2017-03-20 2018-10-23 上海大学 A kind of metatitanic acid coated aluminum oxide nucleocapsid abrasive grain polishing solution composition and preparation method thereof
US11186748B2 (en) * 2017-09-28 2021-11-30 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
US10584265B2 (en) * 2017-09-28 2020-03-10 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them
SG10201904669TA (en) 2018-06-28 2020-01-30 Kctech Co Ltd Polishing Slurry Composition
US20200303198A1 (en) * 2019-03-22 2020-09-24 Fujimi Incorporated Polishing composition and polishing method
CN111574927A (en) * 2020-06-22 2020-08-25 宁波日晟新材料有限公司 Silicon carbide polishing solution containing reducing agent and preparation method and application thereof
CN114952437B (en) * 2022-05-27 2023-08-18 中国人民解放军国防科技大学 Processing method of NiP modified layer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5858813A (en) * 1996-05-10 1999-01-12 Cabot Corporation Chemical mechanical polishing slurry for metal layers and films
TW501197B (en) * 1999-08-17 2002-09-01 Hitachi Chemical Co Ltd Polishing compound for chemical mechanical polishing and method for polishing substrate
JP4238951B2 (en) * 1999-09-28 2009-03-18 株式会社フジミインコーポレーテッド Polishing composition and method for producing memory hard disk using the same
JP2001187878A (en) * 1999-12-28 2001-07-10 Nec Corp Slurry for chemical mechanical polishing
US6355075B1 (en) * 2000-02-11 2002-03-12 Fujimi Incorporated Polishing composition

Also Published As

Publication number Publication date
CN1379074A (en) 2002-11-13
JP2002294225A (en) 2002-10-09
GB0206036D0 (en) 2002-04-24
GB2375116A (en) 2002-11-06
JP4439755B2 (en) 2010-03-24
GB2375116B (en) 2004-10-20
CN1234798C (en) 2006-01-04

Similar Documents

Publication Publication Date Title
MY131997A (en) Method of polishing a substrate and method for producing a memory hard disk
MY122895A (en) Polishing composition for a substrate for a magnetic disk and polishing method employing it
MY143678A (en) Polishing composition for noble metals
WO2001079461A3 (en) Polypeptides having haloperoxidase activity
DE50311199D1 (en) ANTI-INFECTIOUS, BIOCOMPATIBLE TITANIUM OXIDE COATINGS FOR IMPLANTS AND METHOD FOR THE PRODUCTION THEREOF
TWI256966B (en) Chemical mechanical polishing slurry useful for copper substrates
MXPA01007451A (en) Substituted porphyrins.
MY121165A (en) Polishing composition and method for producing a memory hard disk.
TW200510927A (en) Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition
WO2001079459A3 (en) Polypeptides having haloperoxidase activity
MX9802017A (en) Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions.
RS95404A (en) Thiazolidinones and the use thereof as polo-like kinase inhibitors
MXPA04001224A (en) Agents for enhancing the immune response.
TW200610752A (en) Alphahydroxyacids with ultra-low metal concentration
WO2002060248A3 (en) Methods and compositions for controlling plant pathogen
WO2005028665A3 (en) Campylobacter polypeptides and methods of use
EP1559677A3 (en) Mixed metal oxide layer and method of manufacture
AU2003283300A1 (en) Coating composition, particularly for glass surfaces, and methods for the production and use thereof
MY146039A (en) Polishing composition and polishing method
WO2003033557A3 (en) Copolymers containing fluorine, method for the production and use thereof
AU5923000A (en) Incipient wetness method for making metal-containing cyanide catalysts
AU2003276712A1 (en) Composition for polishing metal, polishing method for metal layer, and production method for wafer
EP1306466A3 (en) Electroless gold plating composition
UA83203C2 (en) Thiazol-(bi)cycloalkyl-carboxanilides and their use for fighting against undesirable microorganisms
EP1285937A3 (en) Water based intercoat coating composition and multi-layer coating film-forming method by use of the same