CN1228999C - 用于在大气压下产生低温等离子体的装置 - Google Patents

用于在大气压下产生低温等离子体的装置 Download PDF

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Publication number
CN1228999C
CN1228999C CNB028048792A CN02804879A CN1228999C CN 1228999 C CN1228999 C CN 1228999C CN B028048792 A CNB028048792 A CN B028048792A CN 02804879 A CN02804879 A CN 02804879A CN 1228999 C CN1228999 C CN 1228999C
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CN
China
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electrode
plasma
dielectric
discharge
power supply
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Expired - Fee Related
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English (en)
Chinese (zh)
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CN1491527A (zh
Inventor
南基锡
李相老
李九铉
罗钟周
金钟国
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SE PLASMA CO Ltd
SE Plasma Inc
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SE PLASMA CO Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32036—AC powered
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/17—Exhaust gases
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/30—Medical applications
    • H05H2245/36—Sterilisation of objects, liquids, volumes or surfaces
CNB028048792A 2001-02-12 2002-02-08 用于在大气压下产生低温等离子体的装置 Expired - Fee Related CN1228999C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR6653/2001 2001-02-12
KR10-2001-0006653A KR100464902B1 (ko) 2001-02-12 2001-02-12 대기압에서 저온 플라즈마를 발생시키는 장치

Publications (2)

Publication Number Publication Date
CN1491527A CN1491527A (zh) 2004-04-21
CN1228999C true CN1228999C (zh) 2005-11-23

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CNB028048792A Expired - Fee Related CN1228999C (zh) 2001-02-12 2002-02-08 用于在大气压下产生低温等离子体的装置

Country Status (6)

Country Link
EP (1) EP1366647A4 (ja)
JP (1) JP3990285B2 (ja)
KR (1) KR100464902B1 (ja)
CN (1) CN1228999C (ja)
TW (1) TWI244879B (ja)
WO (1) WO2002065820A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111773427A (zh) * 2020-07-10 2020-10-16 深圳先进技术研究院 一种等离子体空气消杀处理装置

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6821379B2 (en) * 2001-12-21 2004-11-23 The Procter & Gamble Company Portable apparatus and method for treating a workpiece
US6841201B2 (en) 2001-12-21 2005-01-11 The Procter & Gamble Company Apparatus and method for treating a workpiece using plasma generated from microwave radiation
KR100482554B1 (ko) * 2002-03-06 2005-04-14 현대자동차주식회사 유전체에 돌출부가 형성된 평행 평판형 타입 플라즈마반응기
TWI273143B (en) * 2002-06-10 2007-02-11 Konica Corp Layer formation method, and substrate with a layer formed by the method
JP4472372B2 (ja) 2003-02-03 2010-06-02 株式会社オクテック プラズマ処理装置及びプラズマ処理装置用の電極板
DE60313864T2 (de) * 2003-08-14 2008-01-17 Fujifilm Manufacturing Europe B.V. Anordnung, Verfahren und Elektrode zur Erzeugung eines Plasmas
KR100601394B1 (ko) * 2004-08-20 2006-07-13 연세대학교 산학협력단 공기정화장치
KR200371074Y1 (ko) * 2004-09-17 2004-12-29 주식회사 다원시스 대기압 플라즈마를 이용한 모발 염색장치
US7256296B2 (en) 2004-09-22 2007-08-14 Symyx Technologies, Inc. Heterocycle-amine ligands, compositions, complexes, and catalysts
KR100691875B1 (ko) * 2005-03-25 2007-03-09 최진문 대기압 플라즈마 유전체 세정장치
US8168130B2 (en) 2005-09-16 2012-05-01 Toyo Advanced Technologies Co., Ltd. Plasma generation system and plasma generation method
JP4963360B2 (ja) * 2006-01-31 2012-06-27 国立大学法人茨城大学 携帯型大気圧プラズマ発生装置
DE102006011312B4 (de) 2006-03-11 2010-04-15 Fachhochschule Hildesheim/Holzminden/Göttingen - Körperschaft des öffentlichen Rechts - Vorrichtung zur Plasmabehandlung unter Atmosphärendruck
CN100434935C (zh) * 2006-12-28 2008-11-19 河北大学 一种产生具有三种折射率的等离子体光子晶体的方法
JP4792604B2 (ja) * 2007-04-17 2011-10-12 国立大学法人佐賀大学 プラズマ滅菌装置
KR100861559B1 (ko) * 2007-06-04 2008-10-02 (주)에스이 플라즈마 전원 인가 전극에 결합되는 유전체 하면에 복수개의 분할전극이 부착된 구조의 전극부를 갖는 대기압 플라즈마발생장치
CN101376980B (zh) * 2007-08-27 2011-09-21 宝山钢铁股份有限公司 一种改善带钢润湿性的工艺
DE102008028167A1 (de) * 2008-06-12 2009-12-31 Maschinenfabrik Reinhausen Gmbh Vorrichtung zur Erzeugung eines Plasma-Jets
KR101046335B1 (ko) 2008-07-29 2011-07-05 피에스케이 주식회사 할로우 캐소드 플라즈마 발생방법 및 할로우 캐소드플라즈마를 이용한 대면적 기판 처리방법
CN101720163B (zh) * 2008-10-10 2012-12-19 河南理工大学 大气压下介质阻挡类辉光放电反应器
CN101772253B (zh) * 2008-12-26 2013-06-26 中国科学院空间科学与应用研究中心 一种等离子体产生装置
KR20100081068A (ko) * 2009-01-05 2010-07-14 삼성전기주식회사 플라즈마 발생장치
KR100924112B1 (ko) * 2009-02-10 2009-10-29 한국과학기술원 중공 전극을 가지는 방전셀에서 플라즈마를 발생하는 소자
KR101193380B1 (ko) * 2009-07-13 2012-10-23 글로벌텍 주식회사 플라즈마 발생 장치
EP2475230A4 (en) * 2009-09-02 2015-04-01 Korea Basic Science Inst DEVICE FOR TAKING A LIQUID PLASMA DISCHARGE
KR101151277B1 (ko) * 2009-12-01 2012-06-14 성균관대학교산학협력단 대기압 플라즈마를 이용한 기판의 이중 패터닝 방법
KR101160906B1 (ko) * 2010-03-17 2012-06-28 최대규 용량 결합 플라즈마 반응기
KR101163643B1 (ko) 2010-05-04 2012-07-06 (주)에스이피 대기압 플라즈마 장치
KR101307111B1 (ko) * 2010-08-24 2013-09-11 닛신 이온기기 가부시기가이샤 플라즈마 발생 장치
CN102026468A (zh) * 2010-11-23 2011-04-20 中国科学院等离子体物理研究所 一种介质阻挡电晕放电反应器
CN102036460B (zh) * 2010-12-10 2013-01-02 西安交通大学 平板式等离子体发生装置
DE102011000261A1 (de) * 2011-01-21 2012-07-26 Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen Dielektrische Koplanarentladungsquelle für eine Oberflächenbehandlung unter Atmosphärendruck
US8760067B2 (en) * 2011-04-04 2014-06-24 Federal-Mogul Ignition Company System and method for controlling arc formation in a corona discharge ignition system
CN102215626B (zh) * 2011-05-23 2012-12-12 中国科学院物理研究所 一种可在较低电压条件下产生放电等离子体的装置
EP2744307A4 (en) * 2011-08-11 2015-01-14 Korea Mach & Materials Inst PLASMA GENERATING DEVICE, METHOD FOR PRODUCING ROTATING ELECTRODES FOR THE PLASMA GENERATING DEVICE, METHOD FOR PLASMA TREATMENT OF A SUBSTRATE AND METHOD FOR PRODUCING A THIN FILM FROM A MIXTURE STRUCTURE BY MEANS OF THE PLASMA
KR101241951B1 (ko) * 2011-08-11 2013-03-11 한국기계연구원 플라즈마 발생장치 및 기판의 플라즈마 처리방법
JP2012140970A (ja) * 2012-04-25 2012-07-26 Nissan Motor Co Ltd エンジン点火制御装置
WO2014007472A1 (en) * 2012-07-03 2014-01-09 Plasmart Inc. Plasma generation apparatus and plasma generation method
CN102755819B (zh) * 2012-08-02 2014-04-16 桂林市世环废气处理设备有限公司 低温等离子氧化器及低温等离子除臭系统
CN103269556A (zh) * 2013-05-14 2013-08-28 哈尔滨工业大学 大面积大气等离子体均匀放电电极
KR101439926B1 (ko) 2013-06-11 2014-09-17 한국기계연구원 캐필러리부가 구비된 판상형 전극을 이용한 롤투롤 플라즈마 처리 시스템
CN104619106B (zh) * 2015-01-15 2018-04-20 合肥工业大学 一种实现大气压下空气中均匀辉光放电的装置
CN105792495B (zh) * 2016-05-03 2018-11-06 河北大学 一种产生大气压均匀等离子体刷的装置和方法
CN105951034A (zh) * 2016-05-28 2016-09-21 上海大学 一种弹簧钢在低温等离子体下渗碳的方法
CN105951035A (zh) * 2016-05-28 2016-09-21 上海大学 一种弹簧钢在低温等离子体下发蓝的方法
CN106577982A (zh) * 2016-12-23 2017-04-26 浙江海洋大学 一种鱿鱼丝保鲜的方法
KR101941860B1 (ko) * 2017-06-09 2019-01-25 한국과학기술연구원 기체 방전 살균 및 제독 기능을 가진 차량용 외장재, 이를 포함하는 차량 및 차량의 살균 및 제독을 위한 소독 시스템
EP3675991B1 (en) * 2017-09-01 2022-06-08 Somnio Global Holdings, LLC Free radical generator and methods of use
AT520858A1 (de) 2018-01-30 2019-08-15 Gerald Boehm Vorrichtung und Verfahren zum Bilden eines Temperaturgradienten
CN108601191B (zh) * 2018-05-21 2020-09-15 王逸人 一种阵列式双介质阻挡放电装置
CN109494147B (zh) * 2018-11-13 2020-10-30 中国科学院微电子研究所 基于交流电压下微波等离子体的碳化硅氧化方法
CN109545687B (zh) * 2018-11-13 2020-10-30 中国科学院微电子研究所 基于交流电压下微波等离子体氧化的凹槽mosfet器件制造方法
EP3900014A1 (en) * 2018-12-21 2021-10-27 Evatec AG Vacuum treatment apparatus and method for vacuum plasma treating at least one substrate or for manufacturing a substrate
CN109779948B (zh) * 2019-01-17 2021-01-05 沈阳航空航天大学 一种用于提高轴流风机性能的等离子式叶顶间隙密封方法
CN109688689A (zh) * 2019-02-20 2019-04-26 北京卓昱科技有限公司 一种宽间隙电子诱导等离子发生器
CN111389189A (zh) * 2020-03-11 2020-07-10 北京化工大学 一种可穿戴式等离子体降解危险化学品的装置及方法
TWI826900B (zh) * 2021-03-03 2023-12-21 日商斯庫林集團股份有限公司 電漿產生裝置及基板處理裝置
CN113099599B (zh) * 2021-04-26 2022-04-26 北京农学院 一种滑动弧放电反应装置及杀菌方法
KR102574829B1 (ko) * 2021-05-11 2023-09-06 박영희 섬유 원단의 표면 개질을 위한 저온진공 플라스마장치의 전극구조
CN114551194B (zh) * 2022-02-18 2024-02-06 四川大学 一种等离子体刻蚀装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04167481A (ja) * 1990-10-31 1992-06-15 Hitachi Cable Ltd 気体レーザ
JP3121105B2 (ja) * 1992-03-03 2000-12-25 株式会社きもと グロー放電プラズマ発生用電極及びこの電極を用いた反応装置
KR0130733B1 (ko) * 1994-04-21 1998-04-14 문재덕 저온 플라즈마 발생용 방전장치
JPH07296993A (ja) * 1994-04-26 1995-11-10 Shimada Phys & Chem Ind Co Ltd プラズマ発生装置
JP3078466B2 (ja) * 1995-05-24 2000-08-21 松下電工株式会社 大気圧プラズマ発生装置及びその装置を用いた大気圧プラズマ発生方法
JPH0950898A (ja) * 1995-08-08 1997-02-18 Hitachi Ltd プラズマ処理装置
JP3288228B2 (ja) * 1996-05-24 2002-06-04 積水化学工業株式会社 放電プラズマ処理方法
JPH10172792A (ja) * 1996-12-05 1998-06-26 Tokyo Electron Ltd プラズマ処理装置
US5872426A (en) * 1997-03-18 1999-02-16 Stevens Institute Of Technology Glow plasma discharge device having electrode covered with perforated dielectric
US6147452A (en) * 1997-03-18 2000-11-14 The Trustees Of The Stevens Institute Of Technology AC glow plasma discharge device having an electrode covered with apertured dielectric
JPH11106531A (ja) * 1997-10-06 1999-04-20 Sekisui Chem Co Ltd 放電プラズマ処理装置
US6027616A (en) * 1998-05-01 2000-02-22 Mse Technology Applications, Inc. Extraction of contaminants from a gas
JP2000008296A (ja) * 1998-06-19 2000-01-11 Oji Paper Co Ltd 着色紙
US6118218A (en) * 1999-02-01 2000-09-12 Sigma Technologies International, Inc. Steady-state glow-discharge plasma at atmospheric pressure
US6632323B2 (en) * 2001-01-31 2003-10-14 Plasmion Corporation Method and apparatus having pin electrode for surface treatment using capillary discharge plasma

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111773427A (zh) * 2020-07-10 2020-10-16 深圳先进技术研究院 一种等离子体空气消杀处理装置

Also Published As

Publication number Publication date
EP1366647A1 (en) 2003-12-03
KR100464902B1 (ko) 2005-01-05
JP2004527073A (ja) 2004-09-02
JP3990285B2 (ja) 2007-10-10
CN1491527A (zh) 2004-04-21
WO2002065820A1 (en) 2002-08-22
EP1366647A4 (en) 2007-08-08
TWI244879B (en) 2005-12-01
KR20020066467A (ko) 2002-08-19

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