CN116626982A - 光掩模的制造方法、光掩模及显示装置用器件的制造方法 - Google Patents

光掩模的制造方法、光掩模及显示装置用器件的制造方法 Download PDF

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Publication number
CN116626982A
CN116626982A CN202310618401.2A CN202310618401A CN116626982A CN 116626982 A CN116626982 A CN 116626982A CN 202310618401 A CN202310618401 A CN 202310618401A CN 116626982 A CN116626982 A CN 116626982A
Authority
CN
China
Prior art keywords
film
correction
semi
photomask
transmittance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202310618401.2A
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English (en)
Chinese (zh)
Inventor
中山憲治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of CN116626982A publication Critical patent/CN116626982A/zh
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72Repair or correction of mask defects
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CN202310618401.2A 2018-07-30 2019-07-29 光掩模的制造方法、光掩模及显示装置用器件的制造方法 Pending CN116626982A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018-142919 2018-07-30
JP2018142919 2018-07-30
CN201910689040.4A CN110780534B (zh) 2018-07-30 2019-07-29 光掩模、其修正方法、制造方法、显示装置用器件的制造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201910689040.4A Division CN110780534B (zh) 2018-07-30 2019-07-29 光掩模、其修正方法、制造方法、显示装置用器件的制造方法

Publications (1)

Publication Number Publication Date
CN116626982A true CN116626982A (zh) 2023-08-22

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
CN201910689040.4A Active CN110780534B (zh) 2018-07-30 2019-07-29 光掩模、其修正方法、制造方法、显示装置用器件的制造方法
CN202310618401.2A Pending CN116626982A (zh) 2018-07-30 2019-07-29 光掩模的制造方法、光掩模及显示装置用器件的制造方法

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Country Status (4)

Country Link
JP (1) JP7353094B2 (ko)
KR (2) KR102254646B1 (ko)
CN (2) CN110780534B (ko)
TW (2) TWI729444B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6741893B1 (ja) * 2020-03-04 2020-08-19 株式会社エスケーエレクトロニクス ハーフトーンマスクの欠陥修正方法、ハーフトーンマスクの製造方法及びハーフトーンマスク
JP7461220B2 (ja) 2020-05-25 2024-04-03 株式会社エスケーエレクトロニクス フォトマスクの修正方法
JP7449187B2 (ja) 2020-07-20 2024-03-13 Hoya株式会社 位相シフトマスクの製造方法、位相シフトマスク、および、表示装置の製造方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05333534A (ja) * 1992-05-30 1993-12-17 Sony Corp 位相シフト・マスクの欠陥修正方法
JP3312702B2 (ja) * 1993-04-09 2002-08-12 大日本印刷株式会社 位相シフトフォトマスク及び位相シフトフォトマスク用ブランクス
JP3354305B2 (ja) * 1993-09-24 2002-12-09 大日本印刷株式会社 位相シフトマスクおよび位相シフトマスクの欠陥修正方法
JPH08314120A (ja) * 1995-03-16 1996-11-29 Hoya Corp マスクパターンの修正方法
JP4442962B2 (ja) * 1999-10-19 2010-03-31 株式会社ルネサステクノロジ フォトマスクの製造方法
KR20040001276A (ko) * 2002-06-27 2004-01-07 삼성전자주식회사 포토마스크의 결함 수정 방법
US6924069B2 (en) * 2003-01-15 2005-08-02 Taiwan Semiconductor Manufacturing Co., Ltd Method for repairing attenuated phase shift masks
JP4752495B2 (ja) * 2005-12-22 2011-08-17 大日本印刷株式会社 階調をもつフォトマスクの欠陥修正方法
KR100956082B1 (ko) * 2006-04-20 2010-05-07 엘지이노텍 주식회사 포토마스크의 리페어 방법
JP4968464B2 (ja) 2006-07-05 2012-07-04 大日本印刷株式会社 階調をもつフォトマスクの欠陥部修正方法および修正箇所の評価方法
JP5036349B2 (ja) * 2007-02-28 2012-09-26 Hoya株式会社 グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法
JP5057866B2 (ja) * 2007-07-03 2012-10-24 Hoya株式会社 グレートーンマスクの欠陥修正方法、グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法
JP2009020312A (ja) * 2007-07-12 2009-01-29 Hoya Corp グレートーンマスクの欠陥修正方法、グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法
JP2010079113A (ja) * 2008-09-28 2010-04-08 Hoya Corp フォトマスクの製造方法及びフォトマスク
KR101079161B1 (ko) * 2008-12-22 2011-11-02 엘지이노텍 주식회사 하프톤 마스크 및 그 제조방법
TWI440964B (zh) 2009-01-27 2014-06-11 Hoya Corp 多調式光罩、多調式光罩之製造方法及圖案轉印方法
JP2012073553A (ja) * 2010-09-30 2012-04-12 Hoya Corp フォトマスクの欠陥修正方法、フォトマスクの製造方法、及びフォトマスク、並びにパターン転写方法
JP6335735B2 (ja) 2014-09-29 2018-05-30 Hoya株式会社 フォトマスク及び表示装置の製造方法
JP6332109B2 (ja) * 2015-03-31 2018-05-30 信越化学工業株式会社 ハーフトーン位相シフト型フォトマスクブランクの製造方法
JP6544300B2 (ja) * 2015-08-31 2019-07-17 信越化学工業株式会社 ハーフトーン位相シフト型フォトマスクブランク、その製造方法、及びハーフトーン位相シフト型フォトマスク
KR20170079742A (ko) * 2015-12-31 2017-07-10 엘지디스플레이 주식회사 하프톤 마스크의 리페어 방법
JP6235643B2 (ja) * 2016-03-25 2017-11-22 Hoya株式会社 パターン修正方法、フォトマスクの製造方法、フォトマスク、及び修正膜形成装置
KR102093103B1 (ko) * 2016-04-01 2020-03-25 (주)에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크, 포토 마스크 및 그의 제조 방법
KR20180066354A (ko) * 2016-12-08 2018-06-19 주식회사 피케이엘 하프톤 마스크의 반투과부 결함 수정 방법 및 그 결함 수정 하프톤 마스크

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Publication number Publication date
TWI729444B (zh) 2021-06-01
KR102439047B1 (ko) 2022-09-02
CN110780534A (zh) 2020-02-11
KR20200013601A (ko) 2020-02-07
TW202013445A (zh) 2020-04-01
KR20210058792A (ko) 2021-05-24
TW202132909A (zh) 2021-09-01
CN110780534B (zh) 2023-06-13
JP2020024406A (ja) 2020-02-13
JP7353094B2 (ja) 2023-09-29
TWI821669B (zh) 2023-11-11
KR102254646B1 (ko) 2021-05-21

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