CN114981481A - 金属材料、金属材料的制造方法、半导体处理装置的钝化方法、半导体器件的制造方法及已填充的容器的制造方法 - Google Patents

金属材料、金属材料的制造方法、半导体处理装置的钝化方法、半导体器件的制造方法及已填充的容器的制造方法 Download PDF

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Publication number
CN114981481A
CN114981481A CN202080092086.9A CN202080092086A CN114981481A CN 114981481 A CN114981481 A CN 114981481A CN 202080092086 A CN202080092086 A CN 202080092086A CN 114981481 A CN114981481 A CN 114981481A
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CN
China
Prior art keywords
mof
metal material
metal
chamber
processing apparatus
Prior art date
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Pending
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CN202080092086.9A
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English (en)
Chinese (zh)
Inventor
菊池亚纪应
野村凉马
吉村亮太
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
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Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of CN114981481A publication Critical patent/CN114981481A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C12/00—Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C1/00—Pressure vessels, e.g. gas cylinder, gas tank, replaceable cartridge
    • F17C1/10—Pressure vessels, e.g. gas cylinder, gas tank, replaceable cartridge with provision for protection against corrosion, e.g. due to gaseous acid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2203/00—Vessel construction, in particular walls or details thereof
    • F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
    • F17C2203/0602—Wall structures; Special features thereof
    • F17C2203/0607—Coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Chemical Vapour Deposition (AREA)
CN202080092086.9A 2020-01-06 2020-11-19 金属材料、金属材料的制造方法、半导体处理装置的钝化方法、半导体器件的制造方法及已填充的容器的制造方法 Pending CN114981481A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020000352 2020-01-06
JP2020-000352 2020-01-06
PCT/JP2020/043200 WO2021140757A1 (ja) 2020-01-06 2020-11-19 金属材料、金属材料の製造方法、半導体処理装置のパッシベーション方法、半導体デバイスの製造方法、および、充填済み容器の製造方法

Publications (1)

Publication Number Publication Date
CN114981481A true CN114981481A (zh) 2022-08-30

Family

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CN202080092086.9A Pending CN114981481A (zh) 2020-01-06 2020-11-19 金属材料、金属材料的制造方法、半导体处理装置的钝化方法、半导体器件的制造方法及已填充的容器的制造方法

Country Status (6)

Country Link
US (1) US12378659B2 (https=)
JP (1) JP7719370B2 (https=)
KR (1) KR102905173B1 (https=)
CN (1) CN114981481A (https=)
TW (1) TWI891684B (https=)
WO (1) WO2021140757A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02263972A (ja) * 1988-12-09 1990-10-26 Hashimoto Kasei Kogyo Kk フッ化不動態膜が形成された金属材料、その金属材料を用いたガス装置、並びに該フッ化不動態膜の形成方法
JPH04342423A (ja) * 1991-05-17 1992-11-27 Central Glass Co Ltd ６フッ化タングステンの精製法
JP2001172020A (ja) * 1999-12-16 2001-06-26 Stella Chemifa Corp 高純度六フッ化タングステンの精製方法
JP2004051999A (ja) * 2002-07-16 2004-02-19 Stella Chemifa Corp 金属酸化フッ化皮膜が形成された金属材料
WO2019012841A1 (ja) * 2017-07-14 2019-01-17 セントラル硝子株式会社 酸フッ化金属の処理方法及びクリーニング方法
WO2019026682A1 (ja) * 2017-08-01 2019-02-07 セントラル硝子株式会社 充填済み容器の製造方法、及び、充填済み容器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
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JPS519265B2 (https=) 1972-08-30 1976-03-25
JPH0615716B2 (ja) * 1983-07-05 1994-03-02 キヤノン株式会社 プラズマｃｖｄ装置
US5009963A (en) 1988-07-20 1991-04-23 Tadahiro Ohmi Metal material with film passivated by fluorination and apparatus composed of the metal material
JP2002263972A (ja) 2001-03-13 2002-09-17 Micron Seimitsu Kk 工作機械ベッド構造、および工作機械ベッドの構成方法
JP4516284B2 (ja) 2003-05-14 2010-08-04 ニッポン高度紙工業株式会社 固体電解質及び該固体電解質を使用した電気化学システム
KR101830780B1 (ko) * 2011-08-05 2018-04-05 삼성전자주식회사 박막의 제조방법, 박막, 박막의 제조장치 및 전자소자
JP2014086579A (ja) * 2012-10-19 2014-05-12 Applied Materials Inc 真空チャンバ用反射部材
CN103952677B (zh) 2014-05-12 2016-06-22 北京航空航天大学 一种电子增强等离子体放电管内壁涂层的方法
CN108431994A (zh) 2015-08-11 2018-08-21 工业研究与发展基金会有限公司 金属氟化物涂覆的嵌锂材料和其制备方法及其用途
KR102652512B1 (ko) 2015-11-10 2024-03-28 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 에칭 반응물 및 이를 사용한 플라즈마-부재 옥사이드 에칭 공정
US11572617B2 (en) * 2016-05-03 2023-02-07 Applied Materials, Inc. Protective metal oxy-fluoride coatings

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02263972A (ja) * 1988-12-09 1990-10-26 Hashimoto Kasei Kogyo Kk フッ化不動態膜が形成された金属材料、その金属材料を用いたガス装置、並びに該フッ化不動態膜の形成方法
JPH04342423A (ja) * 1991-05-17 1992-11-27 Central Glass Co Ltd ６フッ化タングステンの精製法
JP2001172020A (ja) * 1999-12-16 2001-06-26 Stella Chemifa Corp 高純度六フッ化タングステンの精製方法
JP2004051999A (ja) * 2002-07-16 2004-02-19 Stella Chemifa Corp 金属酸化フッ化皮膜が形成された金属材料
WO2019012841A1 (ja) * 2017-07-14 2019-01-17 セントラル硝子株式会社 酸フッ化金属の処理方法及びクリーニング方法
WO2019026682A1 (ja) * 2017-08-01 2019-02-07 セントラル硝子株式会社 充填済み容器の製造方法、及び、充填済み容器

Also Published As

Publication number Publication date
WO2021140757A1 (ja) 2021-07-15
TW202130833A (zh) 2021-08-16
KR102905173B1 (ko) 2025-12-30
US12378659B2 (en) 2025-08-05
TWI891684B (zh) 2025-08-01
JPWO2021140757A1 (https=) 2021-07-15
JP7719370B2 (ja) 2025-08-06
US20230029787A1 (en) 2023-02-02
KR20220124154A (ko) 2022-09-13

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