JPWO2021140757A1 - - Google Patents

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Publication number
JPWO2021140757A1
JPWO2021140757A1 JP2021569748A JP2021569748A JPWO2021140757A1 JP WO2021140757 A1 JPWO2021140757 A1 JP WO2021140757A1 JP 2021569748 A JP2021569748 A JP 2021569748A JP 2021569748 A JP2021569748 A JP 2021569748A JP WO2021140757 A1 JPWO2021140757 A1 JP WO2021140757A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021569748A
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Japanese (ja)
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JP7719370B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2021140757A1 publication Critical patent/JPWO2021140757A1/ja
Application granted granted Critical
Publication of JP7719370B2 publication Critical patent/JP7719370B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C12/00—Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C1/00—Pressure vessels, e.g. gas cylinder, gas tank, replaceable cartridge
    • F17C1/10—Pressure vessels, e.g. gas cylinder, gas tank, replaceable cartridge with provision for protection against corrosion, e.g. due to gaseous acid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2203/00—Vessel construction, in particular walls or details thereof
    • F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
    • F17C2203/0602—Wall structures; Special features thereof
    • F17C2203/0607—Coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Chemical Vapour Deposition (AREA)
JP2021569748A 2020-01-06 2020-11-19 金属材料、金属材料の製造方法、半導体処理装置のパッシベーション方法、半導体デバイスの製造方法、および、充填済み容器の製造方法 Active JP7719370B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020000352 2020-01-06
JP2020000352 2020-01-06
PCT/JP2020/043200 WO2021140757A1 (ja) 2020-01-06 2020-11-19 金属材料、金属材料の製造方法、半導体処理装置のパッシベーション方法、半導体デバイスの製造方法、および、充填済み容器の製造方法

Publications (2)

Publication Number Publication Date
JPWO2021140757A1 true JPWO2021140757A1 (https=) 2021-07-15
JP7719370B2 JP7719370B2 (ja) 2025-08-06

Family

ID=76787827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021569748A Active JP7719370B2 (ja) 2020-01-06 2020-11-19 金属材料、金属材料の製造方法、半導体処理装置のパッシベーション方法、半導体デバイスの製造方法、および、充填済み容器の製造方法

Country Status (6)

Country Link
US (1) US12378659B2 (https=)
JP (1) JP7719370B2 (https=)
KR (1) KR102905173B1 (https=)
CN (1) CN114981481A (https=)
TW (1) TWI891684B (https=)
WO (1) WO2021140757A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6013074A (ja) * 1983-07-05 1985-01-23 Canon Inc プラズマｃｖｄ装置
JPH04342423A (ja) * 1991-05-17 1992-11-27 Central Glass Co Ltd ６フッ化タングステンの精製法
JP2001172020A (ja) * 1999-12-16 2001-06-26 Stella Chemifa Corp 高純度六フッ化タングステンの精製方法
JP2014086579A (ja) * 2012-10-19 2014-05-12 Applied Materials Inc 真空チャンバ用反射部材
WO2019012841A1 (ja) * 2017-07-14 2019-01-17 セントラル硝子株式会社 酸フッ化金属の処理方法及びクリーニング方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS519265B2 (https=) 1972-08-30 1976-03-25
JP2867376B2 (ja) * 1988-12-09 1999-03-08 ステラケミファ株式会社 フッ化不動態膜が形成された金属材料、その金属材料を用いたガス装置、並びに該フッ化不動態膜の形成方法
US5009963A (en) 1988-07-20 1991-04-23 Tadahiro Ohmi Metal material with film passivated by fluorination and apparatus composed of the metal material
JP2002263972A (ja) 2001-03-13 2002-09-17 Micron Seimitsu Kk 工作機械ベッド構造、および工作機械ベッドの構成方法
JP3995546B2 (ja) 2002-07-16 2007-10-24 ステラケミファ株式会社 金属酸化フッ化皮膜が形成された金属材料
JP4516284B2 (ja) 2003-05-14 2010-08-04 ニッポン高度紙工業株式会社 固体電解質及び該固体電解質を使用した電気化学システム
KR101830780B1 (ko) * 2011-08-05 2018-04-05 삼성전자주식회사 박막의 제조방법, 박막, 박막의 제조장치 및 전자소자
CN103952677B (zh) 2014-05-12 2016-06-22 北京航空航天大学 一种电子增强等离子体放电管内壁涂层的方法
CN108431994A (zh) 2015-08-11 2018-08-21 工业研究与发展基金会有限公司 金属氟化物涂覆的嵌锂材料和其制备方法及其用途
KR102652512B1 (ko) 2015-11-10 2024-03-28 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 에칭 반응물 및 이를 사용한 플라즈마-부재 옥사이드 에칭 공정
US11572617B2 (en) * 2016-05-03 2023-02-07 Applied Materials, Inc. Protective metal oxy-fluoride coatings
CN110832106B (zh) 2017-08-01 2022-04-15 中央硝子株式会社 已完成填充的容器的制造方法以及已完成填充的容器

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6013074A (ja) * 1983-07-05 1985-01-23 Canon Inc プラズマｃｖｄ装置
JPH04342423A (ja) * 1991-05-17 1992-11-27 Central Glass Co Ltd ６フッ化タングステンの精製法
JP2001172020A (ja) * 1999-12-16 2001-06-26 Stella Chemifa Corp 高純度六フッ化タングステンの精製方法
JP2014086579A (ja) * 2012-10-19 2014-05-12 Applied Materials Inc 真空チャンバ用反射部材
WO2019012841A1 (ja) * 2017-07-14 2019-01-17 セントラル硝子株式会社 酸フッ化金属の処理方法及びクリーニング方法

Also Published As

Publication number Publication date
WO2021140757A1 (ja) 2021-07-15
TW202130833A (zh) 2021-08-16
KR102905173B1 (ko) 2025-12-30
US12378659B2 (en) 2025-08-05
TWI891684B (zh) 2025-08-01
JP7719370B2 (ja) 2025-08-06
CN114981481A (zh) 2022-08-30
US20230029787A1 (en) 2023-02-02
KR20220124154A (ko) 2022-09-13

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